Hydrothiolation of terminal alkynes with diaryl disulfides and diphenyl diselenide: selective synthesis of (Z)-1-alkenyl sulfides and selenides
摘要:
A simple, stereoselective and efficient method for the hydrothiolation of terminal alkynes with diaryl disulfides and diphenyl diselenide has been developed. In the presence of Cul, rongalite, and Cs2CO3, a variety Of disulfides Underwent the reaction of terminal alkynes stereoselectively to afford the corresponding (Z)-1-alkenyl sulfides in moderate to excellent yields. it is noteworthy that hydroselenations of 1,2-diphenyldiselane with alkynes are also conducted smoothly to afford (Z)-1-alkenyl selenides in good yields under the standard conditions. (C) 2008 Elsevier Ltd. All rights reserved.
Received mm-dd-yyyy Accepted mm-dd-yyyy Published on line mm-dd-yyyy Dates to be inserted by editorial office Abstract α-Heterosubstituted silyl derivatives, such as phenylthio-, phenylselenoand benzotriazolyl-stannyl silanes, react with aldehydes under TBAF catalysis, leading to α-substituted-β-hydroxy stannanes, able to behave as precursors of Zand E-olefins, generated by deoxystannylation. This
Highly stereoselective anti-Markovnikov hydrothiolation of alkynes and electron-deficient alkenes by a supported Cu-NHC complex
作者:Yong Yang、Robert M. Rioux
DOI:10.1039/c4gc00642a
日期:——
A robust silica-supported Cu-NHC complex catalyzed highly stereoselective anti-Markovnikov hydrothiolation of alkynes or electron-deficient alkenes to construct C–S bonds.
Photochemical halogen-bonding assisted generation of vinyl and sulfur-centered radicals: stereoselective catalyst-free C(sp<sup>2</sup>)–S bond forming reactions
作者:Helena F. Piedra、Manuel Plaza
DOI:10.1039/d2sc05556b
日期:——
formation of highly reactive vinyl radicals would be a feasible process for the photochemical cross-coupling between thiols and alkenyl halides under basic conditions. The reaction shows indeed a very broad functional group tolerance, is stereoselective, simple and scalable. In-depth mechanistic studies point at the formation of vinyl and sulfur-centered radicals as the intermediates of the reaction and
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUND, AND ACID GENERATOR
申请人:Seshimo Takehiro
公开号:US20110287362A1
公开(公告)日:2011-11-24
A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) represented by general formula (b1-1) shown below (in the formula, R
X
represents a divalent aliphatic group of 3 to 20 carbon atoms; R
Y
represents a monovalent aliphatic group of 3 to 20 carbon atoms having —C(═O)—O— or —S(═O)
2
—; each of R
1
and R
2
independently represents a divalent linking group; and Z
+
represents a monovalent organic cation).
POLYMER, RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
申请人:Utsumi Yoshiyuki
公开号:US20130022911A1
公开(公告)日:2013-01-24
A polymer containing an anion part which generates acid upon exposure on at least one terminal of the main chain, and at least one structural unit selected from the group consisting of a structural unit (a0) containing a —SO
2
-containing cyclic group, a structural unit (a3) containing at least one group selected from the group consisting of —OH, —COOH, —CN, —SO
2
NH
2
and —CONH
2
and a structural unit (a5) which generates acid upon exposure.