2-[2-(2-Methylprop-2-enoyloxy)butyl]but-2-enedioic acid

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: 2-[2-(2-Methylprop-2-enoyloxy)butyl]but-2-enedioic acid
• 英文别名: 2-[2-(2-methylprop-2-enoyloxy)butyl]but-2-enedioic acid
• 化学式: C₁₂H₁₆O₆
• 分子量: 256.25
• InChiKey: ZOAGSHYDZSRDGR-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.6
• 重原子数：
  18
• 可旋转键数：
  8
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.42
• 拓扑面积：
  101
• 氢给体数：
  2
• 氢受体数：
  6

文献信息

• Alkali-soluble resin, photosensitive resin composition for color filter containing the same and uses thereof
  申请人：CHI MEI CORPORATION

  公开号：US10088612B2

  公开（公告）日：2018-10-02

  The present invention relates to an alkali-soluble resin (A) and a photosensitive resin composition for a color filter and uses thereof. The photosensitive resin composition includes the alkali-soluble resin (A), a compound (B) containing an ethylenically unsaturated group, a photoinitiator (C) and an organic solvent (D). The photosensitive resin composition according to the present invention can improve the change rate of film thickness in thermal solvent and linearity of pattern with high finesse of the color filter.

  本发明涉及一种碱溶性树脂（A）和一种用于彩色滤光片的感光树脂组合物及其用途。光敏树脂组合物包括碱溶性树脂（A）、含有乙烯不饱和基团的化合物（B）、光引发剂（C）和有机溶剂（D）。根据本发明的感光树脂组合物可以提高热溶剂中膜厚的变化率和图案的线性度，滤色片的精细度也很高。
• ALKALI-SOLUBLE RESIN, PHOTOSENSITIVE RESIN COMPOSITION, COLOR FILTER AND METHOD FOR MANUFACTURING THE SAME, AND LIQUID CRYSTAL DISPLAY APPARATUS
  申请人：CHI MEI CORPORATION

  公开号：US20150226892A1

  公开（公告）日：2015-08-13

  An alkali-soluble resin, a photosensitive resin composition, a color filter and a method for manufacturing the same, and a liquid crystal display apparatus are provided. The photosensitive resin composition includes an alkali-soluble resin (A), a compound (B) containing an ethylenically unsaturated group, a photoinitiator (C), and an organic solvent (D). The photosensitive resin composition contains a specific alkali-soluble resin (A-1), and therefore the photosensitive resin composition has the advantages of high resolution and excellent development resistance.
• PHOTOSENSITIVE RESIN COMPOSITION FOR BLACK MATRIX, BLACK MATRIX, COLOR FILTER AND METHOD FOR MANUFACTURING THE SAME, AND LIQUID CRYSTAL DISPLAY APPARATUS
  申请人：Chi Mei Corporation

  公开号：US20160011509A1

  公开（公告）日：2016-01-14

  A photosensitive resin composition capable of forming a black matrix having good adhesion and good hardness, a black matrix, a color filter and a method for manufacturing the same, and a liquid crystal display apparatus are provided. The photosensitive resin composition includes an alkali-soluble resin (A), a compound (B) having an ethylenically unsaturated group, a photoinitiator (C), a hyperbranched polymer (D), a solvent (E), and a black pigment (F). The alkali-soluble resin (A) includes a first alkali-soluble resin (A-1) represented by formula (1). The hyperbranched polymer (D) is formed by reacting a multi-mercapto compound and a multi-functional (meth)acrylate.
• PHOTOSENSITIVE RESIN COMPOSITION FOR BLACK MATRIX AND APPLICATION THEREOF
  申请人：CHI MEI CORPORATION

  公开号：US20160054651A1

  公开（公告）日：2016-02-25

  The present invention relates to a photosensitive resin composition for a black matrix and an application thereof. The aforementioned photosensitive resin composition includes an alkali-soluble resin (A), a compound having an ethylenically unsaturated group (B), a photo-initiator (C), a solvent (D), a black pigment (E) and an oxetane compound having silicon atom (F). The aforementioned alkali-soluble resin (A) includes a first alkali-soluble resin (A-1) having a fluorine atom. The photosensitive resin composition for the black matrix has excellent development resistance and lower surface resistance.
• ALKALI-SOLUBLE RESIN, PHOTOSENSITIVE RESIN COMPOSITION FOR COLOR FILTER CONTAINING THE SAME AND USES THEREOF
  申请人：CHI MEI CORPORATION

  公开号：US20160139309A1

  公开（公告）日：2016-05-19

  The present invention relates to an alkali-soluble resin (A) and a photosensitive resin composition for a color filter and uses thereof. The photosensitive resin composition includes the alkali-soluble resin (A), a compound (B) containing an ethylenically unsaturated group, a photoinitiator (C) and an organic solvent (D). The photosensitive resin composition according to the present invention can improve the change rate of film thickness in thermal solvent and linearity of pattern with high finesse of the color filter.