申请人:——
公开号:US20040106530A1
公开(公告)日:2004-06-03
A composition for removing resist, polymeric material and/or etching residue from a substrate comprising titanium or an alloy thereof, the composition comprising hydroxylamine or a derivative thereof and at least one compound having the general formula (I) wherein: R
1
and R
3
are each independently selected from H, OH, CO
2
H, halogen, C
1
-C
3
alkyl, C
1
-C
3
alkoxy or (CH
2
)
n
OH wherein n is 1, 2 or 3; and R
2
is selected from C
9
-C
16
alkyl, or C
9
-C
16
alkoxy.
1
一种用于从包括钛或其合金的基底上去除抗蚀剂、聚合物材料和/或蚀刻残留物的组合物,该组合物包括羟胺或其衍生物和至少一种具有通式(I)的化合物,其中:R
1
和 R
3
各自独立地选自 H、OH、CO
2
H、卤素、C
1
-C
3
烷基、C
1
-C
3
烷氧基或 (CH
2
)
n
OH 其中 n 为 1、2 或 3;以及 R
2
选自 C
9
-C
16
烷基,或 C
9
-C
16
烷氧基。
1