6-(Ethylamino)-2-methylhex-2-enoic acid

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 脂肪酰基
• 英文名称: 6-(Ethylamino)-2-methylhex-2-enoic acid
• 英文别名: 6-(ethylamino)-2-methylhex-2-enoic acid
• 化学式: C₉H₁₇NO₂
• 分子量: 171.24
• InChiKey: ATBCZOAYXZVOJG-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  -1.1
• 重原子数：
  12
• 可旋转键数：
  6
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.67
• 拓扑面积：
  49.3
• 氢给体数：
  2
• 氢受体数：
  3

文献信息

• Protective film for optical disks
  申请人：Lintec Corporation

  公开号：EP1327978A1

  公开（公告）日：2003-07-16

  A protective film for optical disks comprising an acrylic adhesive layer disposed on one face of a light transmitting substrate film, wherein a change in transmittance (X) expressed by equation [1] is 10% or smaller and the amount of elution of halogen ions and the amount of alkaline ions from an acrylic adhesive constituting the acrylic adhesive layer are each 10 ppm or smaller; and an optical disk using the protective film.X(%)=[(Ta-Tb)/Ta]×100 (Ta: an initial transmittance of light of 405 nm through the protective film, Tb: a transmittance of light of 405 nm through the protective film after the protective film is left standing at 80°C in 85% RH for 1,000 hours) The protective film is used for protecting the information recording layer of the optical disk and the functions of recording and regeneration of the optical disk are not adversely effected.

  一种用于光盘的保护膜，包括设置在透光基底薄膜的一个面上的丙烯酸粘合剂层，其中用等式[1]表示的透射率变化（X）为 10%或更小，构成丙烯酸粘合剂层的丙烯酸粘合剂的卤素离子洗脱量和碱性离子量各为 10 ppm 或更小；以及使用该保护膜的光盘。X(%)=[(Ta-Tb)/Ta]×100（Ta：保护膜的初始透光率 405 纳米，Tb：保护膜在 85% 相对湿度下于 80°C 条件下放置 1,000 小时后保护膜的透光率 405 纳米）。 保护膜用于保护光盘的信息记录层，不会对光盘的记录和再生功能产生不利影响。
• Wässriges Bindemittel für körnige und/oder faserförmige Substrate
  申请人：BASF SE

  公开号：EP2177563A1

  公开（公告）日：2010-04-21

  Wässrige Bindemittel für körnige und faserförmige Substrate auf Basis hydrophob modifizierter Polymerisate.

  基于疏水改性聚合物的颗粒状和纤维状基材水性粘合剂。
• NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATION FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：EP3951499A1

  公开（公告）日：2022-02-09

  The present invention is a negative photosensitive resin composition including: (A) an alkali-soluble resin containing at least one or more structures selected from a polyimide structure, a polybenzoxazole structure, a polyamide-imide structure, and a precursor structure thereof; (B) a crosslinkable polymer compound containing a structural unit represented by the following general formula (1) and having a group crosslinked with the component (A); (C) a compound that generates an acid by light; and (D) a heat crosslinking agent. An object of the present invention is to provide a negative photosensitive resin composition that enables formation of a fine pattern with high rectangularity and high resolution, has excellent mechanical characteristics even when cured at low temperatures, and furthermore, has no degradation in adhesive force between before and after a high temperature and high humidity test.

  本发明是一种负感光树脂组合物，包括：(A)一种碱溶性树脂，其中至少含有一种或多种结构，这些结构选自聚酰亚胺结构、聚苯并恶唑结构、聚酰胺-酰亚胺结构及其前体结构；(B)一种可交联聚合物化合物，其中含有由下式(1)表示的结构单元，并具有与组分(A)交联的基团；(C)一种在光照下生成酸的化合物；以及(D)一种热交联剂。本发明的目的是提供一种负感光树脂组合物，它能形成具有高矩形度和高分辨率的精细图案，即使在低温下固化也具有优异的机械特性，而且在高温高湿试验前后粘合力不会下降。
• POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, POSITIVE PHOTOSENSITIVE DRY FILM, METHOD FOR PRODUCING POSITIVE PHOTOSENSITIVE DRY FILM, PATTERNING PROCESS, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATION FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：EP3951498A1

  公开（公告）日：2022-02-09

  The present invention is a positive photosensitive resin composition including: (A) an alkali-soluble resin containing at least one or more structures selected from a polyimide structure, a polybenzoxazole structure, a polyamide-imide structure, and a precursor structure thereof; (B) a crosslinkable polymer compound containing a structural unit represented by the following general formula (1) and having a group crosslinked with the component (A); and (C) a compound having a quinonediazide structure for serving as a photosensitizer to generate an acid by light and increase a dissolution speed to an alkaline aqueous solution. An object of the present invention is to provide a positive photosensitive resin composition and a positive photosensitive dry film that enable formation of a fine pattern and high resolution, have excellent mechanical characteristics even when cured at low temperatures, and have no degradation in adhesive force between before and after a high temperature and high humidity test.

  本发明是一种正性光敏树脂组合物，包括(A)一种碱溶性树脂，含有至少一种或多种选自聚酰亚胺结构、聚苯并恶唑结构、聚酰胺-酰亚胺结构及其前体结构的结构；(B)一种可交联聚合物化合物，含有由下式(1)表示的结构单元，并具有与组分(A)交联的基团；以及(C)一种具有喹酮噻嗪结构的化合物，用作光敏剂，通过光产生酸，并提高对碱性水溶液的溶解速度。本发明的目的是提供一种正感光树脂组合物和一种正感光干膜，这种组合物和干膜能形成精细的图案和高分辨率，即使在低温下固化也具有优良的机械特性，而且在高温高湿试验前后粘合力不会下降。
• VERFAHREN ZUR HERSTELLUNG EINER WÄSSRIGEN DISPERSION VON AUS POLYMERISAT UND FEINTEILIGEM ANORGANISCHEN FESTSTOFF AUFGEBAUTEN PARTIKELN
  申请人：BASF AKTIENGESELLSCHAFT

  公开号：EP1235869B1

  公开（公告）日：2004-12-01