Propyl 2,4,4-trimethyl-2-propan-2-ylpentanoate

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 脂肪酰基
• 英文名称: Propyl 2,4,4-trimethyl-2-propan-2-ylpentanoate
• 英文别名: propyl 2,4,4-trimethyl-2-propan-2-ylpentanoate
• 化学式: C₁₄H₂₈O₂
• 分子量: 228.37
• InChiKey: SOKOTCYUWJOITF-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4.8
• 重原子数：
  16
• 可旋转键数：
  7
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.93
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  2

文献信息

• RESIST UNDERLAYER FILM-FORMING COMPOSITION FOR LITHOGRAPHY CONTAINING POLYMER HAVING ACRYLAMIDE STRUCTURE AND ACRYLIC ACID ESTER STRUCTURE
  申请人：NISSAN CHEMICAL INDUSTRIES, LTD.

  公开号：US20170045819A1

  公开（公告）日：2017-02-16

  A resist underlayer film-forming composition for lithography capable of being dry-etched during pattern transfer from the upper layer or during substrate processing and capable of being removed with an alkaline aqueous solution after the substrate processing. A resist underlayer film-forming composition for lithography includes a polymer (A) including a unit structure of Formula (1) and a unit structure of Formula (2); a crosslinkable compound (B) having at least two groups selected from blocked isocyanate groups, methylol group, or C 1-5 alkoxy methyl groups; and a solvent (C), characterized in that the polymer (A) is a polymer in which the unit structure of Formula (1) and the unit structure of Formula (2) are copolymerized in a mol % ratio of the unit structure of Formula (1):the unit structure of Formula (2)=25 to 60:75 to 40.