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4-Ethyl-2-methylnon-2-enoic acid

中文名称
——
中文别名
——
英文名称
4-Ethyl-2-methylnon-2-enoic acid
英文别名
4-ethyl-2-methylnon-2-enoic acid
4-Ethyl-2-methylnon-2-enoic acid化学式
CAS
——
化学式
C12H22O2
mdl
——
分子量
198.3
InChiKey
XFENOITWFIQGLC-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    4.5
  • 重原子数:
    14
  • 可旋转键数:
    7
  • 环数:
    0.0
  • sp3杂化的碳原子比例:
    0.75
  • 拓扑面积:
    37.3
  • 氢给体数:
    1
  • 氢受体数:
    2

文献信息

  • CROSSLINKABLE COMPOSITION CROSSLINKABLE WITH A LATENT BASE CATALYST
    申请人:Brinkhuis Richard Hendrikus Gerrit
    公开号:US20130041091A1
    公开(公告)日:2013-02-14
    The present invention relates to a crosslinkable composition comprising at least one crosslinkable component crosslinkable by a latent base crosslinking catalyst comprising a substituted carbonate salt according to formula 1 wherein X + represents a cation and wherein R is hydrogen, alkyl, aryl or aralkyl group, and wherein the crosslinkable composition comprises 0.1-10 wt %, preferably 0.1-5, more preferably 0.2-3 and most preferably 0.5-1.5 wt % water (relative to total weight of the crosslinkable composition). The invention further relates to a coating composition comprising the crosslinkable composition according to the invention, a novel catalyst composition and to the use of said catalyst composition according to the invention as a latent base crosslinking catalyst in coating compositions, preferably in RMA crosslinkable compositions.
    本发明涉及一种交联组合物,其包括至少一种可交联组分,可由一种潜在碱交联催化剂交联,该交联催化剂包括根据式1的取代碳酸盐,其中X+代表阳离子,R为氢、烷基、芳基或芳基烷基,且所述交联组合物包括0.1-10重量%,优选0.1-5,更优选0.2-3,最优选0.5-1.5重量%的(相对于交联组合物的总重量)。本发明还涉及一种包括根据本发明的交联组合物的涂料组合物,一种新型催化剂组合物以及所述催化剂组合物的使用作为潜在碱交联催化剂在涂料组合物中的用途,优选在RMA可交联组合物中。
  • Cyano-oligomer compositions and processes thereof
    申请人:GAF CORPORATION
    公开号:EP0003021A1
    公开(公告)日:1979-07-25
    A novel ultra-violet absorber comprising a cyano-oligomer of Formula I of Figure 1 of the drawings wherein (Ar),, (Ar)2, R1, R2. R3. R4 and Y are organic radicals is given. A radiation curable coating composition with the novel cyano-oligomer, urethane oligomers and vinyl monomers is also given. A process for curing the coating is also disclosed.
    一种新型紫外吸收剂包括图1中的化学式I的基寡聚物,其中(Ar)n,(Ar)2,R1,R2,R3,R4和Y均为有机基团。还提供了含有新型基寡聚物、基寡聚物和乙烯基单体的辐射固化涂料组合物。还公开了一种固化涂层的工艺。
  • Radiation curable coating composition and a process for coating a substrate therewith
    申请人:GAF CORPORATION
    公开号:EP0002676A1
    公开(公告)日:1979-07-11
    A radiation curable coating comprising: A. an oligomer of Formula I: wherein: R1 is hydrogen or methyl; Y is a divalent urethane residue; B. an acrylic ultra-violet light absorber of Formula IV: wherein R4 is alkyl or hydroxy alkylene. Preferably the coating composition contains a vinyl monomer copolymerizable with the oligomer. The process for curing the coating and laminates containing the coating are also disclosed.
    一种可辐射固化的涂层,包括: A. 式 I 的低聚物:其中:R1 是氢或甲基;Y 是二价聚酯残基; B. 式 IV 的丙烯酸紫外线吸收剂:其中 R4 是烷基或羟基亚烷基。 涂层组合物最好含有可与低聚物共聚的乙烯基单体。 还公开了固化涂层的工艺和含有涂层的层压板。
  • Radiation curable coating composition comprising an oligomer, and an ultra-violet absorber
    申请人:GAF CORPORATION
    公开号:EP0002837A2
    公开(公告)日:1979-07-11
    A radiation curable coating comprising: A. An oligomer of Formula 1: wherein: R1 is hydrogen or methyl; Y is a divalent urethane residue; B. A benzylidene acid ester of Formula IV: wherein R4 is independently alkyl or hydroxy alkylene. Preferably the coating composition contains a vinyl monomer copolymerizable with the oligomer. The process for curing the coating is also disclosed.
    辐射固化涂层,包括 A.式 1 的低聚物 其中 R1 是氢或甲基 Y 是二价氨基甲酸乙酯残基; B.式 IV 的亚苄基酸酯: 其中 R4 独立地为烷基或羟基亚烷基。涂层组合物最好含有可与低聚物共聚的乙烯基单体。还公开了固化涂层的工艺。
  • Radiation curable coating composition and process for coating a substrate therewith
    申请人:GAF CORPORATION
    公开号:EP0026339A1
    公开(公告)日:1981-04-08
    What is described herein is a radiation curable coating composition comprising: A. An oligomer of Formula 1: wherein: R1 is hydrogen or methyl; and Y is a divalent urethane residue; and B. a copolymerizable ultra-violet light absorber which is a copolymerizable (2-cyano-3, 3-diphenylacryloxy) alkylene acrylic acid ester of Formula IV: where (Ar)1 and (Ar)2 are aromatic carbocylic nuclei of the benzene and naphthalene series; X is alkylene, C2-C17, unsubstituted or substituted; and Y is a copolymerizable radical selected from acryloyl, alkylacryloyl, acryloxyalkyl, acryloxyhydroxyalkyl, or alkylacryloxyhydroxyalkyl, having from C3-C12 carbon atoms, or-RCR'=CHR, where R is alkylene, C1-C10, oxyalkylene, C1-C10, alkyleneoxyalkylene, C1-C10 or phenylene, C1-C10, unsubstituted or substituted with hydroxy, and R' and R" are independently hydrogen or alkyl, C1-C6. Preferably the coating composition contains a vinyl monomer, such as N-vinyl-2-pyrrolidone or an acrylic acid ester, which is copolymerizable with the oligomer. The process for curing the composition also is disclosed.
    本文所述的辐射固化涂层组合物包括 A.式 1 的低聚物 其中 R1 是氢或甲基;以及 Y 是二价氨基甲酸乙酯残基;以及 B. 可共聚的紫外线吸收剂,它是式 IV 的可共聚(2-基-3, 3-二苯基丙烯酰氧基)亚烷基丙烯酸酯: 其中(Ar)1 和(Ar)2 是苯系列和系列的芳香碳核; X 为未取代或取代的 C2-C17 亚烷基; Y 是可共聚的基团,选自丙烯酰基、烷基丙烯酰基、丙烯酰氧基烷基、丙烯酰氧基羟基烷基或烷基丙烯酰氧基羟基烷基,具有 C3-C12 碳原子,或-RCR'=CHR,其中 R 是亚烷基、C1-C10、氧基亚烷基、C1-C10、亚烷氧基亚烷基、C1-C10 或未取代或被羟基取代的 C1-C10 亚苯基,以及 R' 和 R" 独立地为氢或 C1-C6 烷基。 涂层组合物最好含有乙烯基单体,如 N-乙烯基-2-吡咯烷酮丙烯酸酯,可与低聚物共聚。 此外,还公开了固化组合物的工艺。
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