申请人:Shin-Etsu Chemical Co., Ltd.
公开号:US20180039173A1
公开(公告)日:2018-02-08
A resist composition comprising a base polymer and a sulfonium or iodonium salt of iodinated phenoxy or iodinated phenylalkoxy-containing fluorinated sulfonic acid offers a high sensitivity and minimal LWR or improved CDU independent of whether it is of positive or negative tone.