[2-Oxo-2-(2-oxooxolan-3-yl)oxyethyl] 2-tert-butyl-4,4-dimethylpentanoate

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: [2-Oxo-2-(2-oxooxolan-3-yl)oxyethyl] 2-tert-butyl-4,4-dimethylpentanoate
• 英文别名: [2-oxo-2-(2-oxooxolan-3-yl)oxyethyl] 2-tert-butyl-4,4-dimethylpentanoate
• 化学式: C₁₇H₂₈O₆
• 分子量: 328.4
• InChiKey: INTCCHGIFUNUDK-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.9
• 重原子数：
  23
• 可旋转键数：
  9
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.82
• 拓扑面积：
  78.9
• 氢给体数：
  0
• 氢受体数：
  6

文献信息

• Resist composition
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US10795258B2

  公开（公告）日：2020-10-06

  A resist composition which contains a resin (A1) which has a structural unit having a sulfonyl group, a structural unit represented by formula (II) and a structural unit having an acid-labile group, and an acid generator: wherein R1 represents a hydrogen atom, a halogen atom or a C1 to C6 alkyl group that may have a halogen atom, L1 represents a single bond or *-L2-CO—O-(L3-CO—O)g— where * represents a binding position to an oxygen atom, L2 and L3 independently represent a C1 to C12 divalent hydrocarbon group, “g” represents 0 or 1, and R3 represents a C1 to C12 liner or branched alkyl group except for a tertiary alkyl group.

  一种抗蚀剂组合物，其中包含一种树脂 (A1)，该树脂具有具有磺酰基的结构单元、由式 (II) 表示的结构单元和具有耐酸基的结构单元，以及一种酸发生器： 其中 R1 代表氢原子、卤素原子或可能具有卤素原子的 C1 至 C6 烷基，L1 代表单键或 *-L2-CO-O-(L3-CO-O)g-，其中 * 代表与氧原子的结合位置，L2 和 L3 独立地代表 C1 至 C12 二价烃基，"g "代表 0 或 1，R3 代表 C1 至 C12 直链或支链烷基（叔烷基除外）。
• Compound, resin and photoresist composition
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US11119408B2

  公开（公告）日：2021-09-14

  A resin comprising a structural unit represented by formula (I0): wherein A1, A2 and A3 each independently represent a C2-C18 divalent hydrocarbon group, R1, R2, R3 and R4 each independently represent a hydrogen atom or a C1-C6 saturated hydrocarbon group, X1 and X2 each independently represent *—O—CO—, —O—CO—O— or —O—, and * represents a binding site to A2 or A3.

  由式 (I0) 所代表的结构单元组成的树脂： 其中 A1、A2 和 A3 各自独立地代表一个 C2-C18 二价烃基、 R1、R2、R3 和 R4 各自独立地代表氢原子或 C1-C6 饱和烃基、 X1和X2各自独立地代表*-O-CO-、-O-CO-O-或-O-，且*代表与A2或A3的结合位点。
• COMPOUND, RESIN AND PHOTORESIST COMPOSITION
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US20180031969A1

  公开（公告）日：2018-02-01

  A resin comprising a structural unit represented by formula (I0): wherein A 1 , A 2 and A 3 each independently represent a C2-C18 divalent hydrocarbon group, R 1 , R 2 , R 3 and R 4 each independently represent a hydrogen atom or a C1-C6 saturated hydrocarbon group, X 1 and X 2 each independently represent *—O—CO—, —O—CO—O— or —O—, and * represents a binding site to A 2 or A 3 .
• US9562122B2
  申请人：——

  公开号：US9562122B2

  公开（公告）日：2017-02-07
• US9612533B2
  申请人：——

  公开号：US9612533B2

  公开（公告）日：2017-04-04