Di-p-fluorphenyl-jodonium | 91290-88-9

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: Di-p-fluorphenyl-jodonium
• 英文别名: Bis(4-fluorophenyl)iodanium
• CAS: 91290-88-9
• 化学式: C₁₂H₈F₂I
• 分子量: 317.097
• InChiKey: PHVCCRNHUOHRPC-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4.5
• 重原子数：
  15
• 可旋转键数：
  2
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.0
• 拓扑面积：
  0
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为反应物：
  描述：

  四苯硼钠 、 Di-p-fluorphenyl-jodonium 在 palladium dichloride sodium carbonate 作用下， 以 水 为溶剂， 反应 1.0h， 生成 4-氟联苯
  参考文献：
  名称：

  Palladium catalyzed cross-coupling of symmetrical diaryliodonium salts with sodium tetraphenylborate in water

  摘要：

  DOI：

  10.1007/bf00702162

文献信息

• SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US20210371376A1

  公开（公告）日：2021-12-02

  A salt represented by formula (I): wherein R 1 and R 2 each independently represent a hydroxy group, —O—R 10 , —O—CO—O—R 10 or —O-L 1 -CO—O—R 10 ; L 1 represents an alkanediyl group having 1 to 6 carbon atoms; R 4 , R 5 , R 7 and R 8 each independently represent a halogen atom, an alkyl fluoride group having 1 to 12 carbon atoms or a hydrocarbon group having 1 to 18 carbon atoms, the hydrocarbon group may have a substituent, and —CH 2 — included in the hydrocarbon group may be replaced by —O—, —CO—, —S— or —SO 2 —; R 10 represents an acid-labile group; X 1 and X 2 each independently represent an oxygen atom or a sulfur atom; m1 represents an integer of 1 to 5, m2 and m8 represent an integer of 0 to 5, m4, m5 and m7 represent an integer of 0 to 4; and AI − represents an organic anion.

  一种由化学式（I）表示的盐：其中R1和R2分别代表一个羟基，-O-R10，-O-CO-O-R10或-O-L1-CO-O-R10；L1代表具有1至6个碳原子的烷二基基团；R4、R5、R7和R8分别独立地表示卤素原子，具有1至12个碳原子的烷基氟基团或具有1至18个碳原子的碳氢基团，碳氢基团可能有取代基，并且碳氢基团中包含的-CH2-可被-O-，-CO-，-S-或-SO2-取代；R10代表一个酸敏感基团；X1和X2分别独立地表示一个氧原子或一个硫原子；m1表示1至5的整数，m2和m8表示0至5的整数，m4、m5和m7表示0至4的整数；AI-代表一个有机阴离子。
• CARBOXYLATE, QUENCHER, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US20210371377A1

  公开（公告）日：2021-12-02

  A carboxylate represented by formula (I), a quencher and a resist composition including the same: wherein R 1 , R 2 and R 3 each represent a halogen atom, an alkyl fluoride group or a hydrocarbon group which may have a substituent, —CH 2 — included in the hydrocarbon group may be replaced by —O—, —CO—, —S— or —SO 2 —, m1 represents an integer of 0 to 5, m2 represents an integer of 0 to 4, m3 represents an integer of 0 to 3, and X 1 represents a single bond, —CH 2 —, —O—, —S—, —CO—, —SO— or —SO 2 —.

  一种以式(I)表示的羧酸盐、淬灭剂和包括该羧酸盐的抗蚀组合物：其中，R1、R2和R3分别表示卤素原子、氟代烷基或烃基，该烃基可以有取代基，烃基中包括的—CH2—可以被—O—、—CO—、—S—或—SO2—替换，m1表示0到5的整数，m2表示0到4的整数，m3表示0到3的整数，X1表示单键、—CH2—、—O—、—S—、—CO—、—SO—或—SO2—。
• COATING COMPOSITION FOR FORMING RESIST UNDERLAYER FILM FOR EUV LITHOGRAPHY PROCESS
  申请人：ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD.

  公开号：US20200133126A1

  公开（公告）日：2020-04-30

  A monomer represented by Chemical Formula (1): wherein, X, Y, and Z are the same as described in the specification, and the polymer including repeat units derived from the monomer.

  一种单体，化学式表示为（1）：其中，X、Y和Z与说明书中描述的相同，且聚合物包括从该单体导出的重复单元。
• ONIUM SALT COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US20210179554A1

  公开（公告）日：2021-06-17

  An onium salt having formula (1) serving as an acid diffusion inhibitor and a chemically amplified resist composition comprising the acid diffusion inhibitor are provided. When processed by lithography, the resist composition exhibits a high sensitivity, and excellent lithography performance factors such as CDU and LWR.

  提供一种具有化学式（1）的醇铵盐，用作酸扩散抑制剂，以及包括该酸扩散抑制剂的化学增强型抗蚀剂组合物。当通过光刻加工时，该抗蚀剂组合物表现出高灵敏度和优异的光刻性能因素，例如CDU和LWR。
• Congeneric, Chlorinated, Brominated And/Or Iodised, Fluorinated Aromatic Compounds Comprising Two Benzol Rings In Their Basic Structure, Method For Their Production And Use Thereof
  申请人：Liu Huiling

  公开号：US20070298501A1

  公开（公告）日：2007-12-27

  Congeneric, halogenated, fluorinated aromatic compounds where A and B are each phenyl radicals, L=oxygen atom, sulfur atom or alkylene radical and p=0 or 1; processes for their preparation and their use.

  同系的，卤代，氟代的芳香化合物，其中A和B分别是苯基，L=氧原子，硫原子或烷基，p=0或1;它们的制备过程和用途。