10-Methyl-[9]anthrol | 60047-77-0

• 分子结构分类: 有机化合物 - 苯类化合物 - 蒽
• 英文名称: 10-Methyl-[9]anthrol
• 英文别名: 10-Oxy-9-methyl-anthracen；10-Methyl-anthranol；10-Methylanthracen-9-ol
• CAS: 60047-77-0
• 化学式: C₁₅H₁₂O
• mdl: MFCD24393723
• 分子量: 208.26
• InChiKey: ISOZUJJTJOFANY-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4.4
• 重原子数：
  16
• 可旋转键数：
  0
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.066
• 拓扑面积：
  20.2
• 氢给体数：
  1
• 氢受体数：
  1

反应信息

• 作为反应物：
  描述：

  10-Methyl-[9]anthrol 、 N-甲基马来酰亚胺 生成 1-hydroxy-8,17-dimethyl-17-azapentacyclo[6.6.5.02,7.09,14.015,19]nonadeca-2,4,6,9,11,13-hexaene-16,18-dione
  参考文献：
  名称：

  RIGAUDY J.; CUONG N. K.; ALBOUY J.-P.; CHETRIT A., TETRAHEDRON LETT. , 1976, NO 14, 1089-1092

  摘要：

  DOI：
• 作为产物：
  描述：

  o-α-Methyl-benzyl-benzoesaeure 在 硫酸 作用下， 生成 10-Methyl-[9]anthrol
  参考文献：
  名称：

  10-Methyl-10-acetoxyanthrone¹

  摘要：

  DOI：

  10.1021/ja01157a024

文献信息

• PHOTOREACTIVE COMPOUNDS
  申请人：Lincker Frederic

  公开号：US20140192305A1

  公开（公告）日：2014-07-10

  The present invention relates to photoreactive compounds that are particularly useful in materials for the alignment of liquid crystals.

  本发明涉及光反应性化合物，特别适用于液晶对准材料的制作。
• Process for production of vinyl chloride polymer
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：EP0172427A2

  公开（公告）日：1986-02-26

  This process is a process for production of a vinyl chloride polymer by suspension polymerization or emulsion polymerization of vinyl chloride monomer or a mixture of vinyl chloride monomer with a vinyl monomer copolymerizable with said vinyl chloride monomer in an aqueous medium, characterized in that the polymerization is carried out in a polymerizer, the inner wall surface and portions of the auxiliary equipment thereof which may come into contact with the monomer during polymerization being previously coated with a scaling preventive comprising at least one selected from dyes, pigments and aromatic or heterocyclic compounds having at least 5 conjugated π bonds, while controlling the chloride ion concentration in the reaction mixture to not higher than 100 ppm. According to said process, scaling onto the inner wall surface of a polymerizer, etc. during polymerization can be prevented effectively and surely.

  该工艺是通过氯乙烯单体或氯乙烯单体与可与所述氯乙烯单体共聚的乙烯基单体混合物在水介质中进行悬浮聚合或乳液聚合来生产氯乙烯聚合物的工艺，其特征在于聚合是在聚合器中进行的、内壁表面及其辅助设备中可能在聚合过程中与单体接触的部分事先涂上一层防垢剂，该防垢剂至少包括一种选自染料、颜料和至少有 5 个共轭 π 键的芳香族或杂环化合物的防垢剂，同时控制反应混合物中的氯离子浓度不高于 100 ppm。根据上述工艺，可有效、可靠地防止聚合过程中聚合器等内壁表面结垢。
• 509. The action of benzoyl peroxide on polycyclic aromatic hydrocarbons
  作者：Ivan M. Roitt、William A. Waters

  DOI：10.1039/jr9520002695

  日期：——
• AROMATIC POLYCARBONATE, ELECTROPHOTOGRAPHIC PHOTORECEPTOR, AND IMAGE FORMING APPARATUS
  申请人：KIHARA Akiko

  公开号：US20080199215A1

  公开（公告）日：2008-08-21

  In an electrophotographic photoreceptor including a conductive substrate and a single layer type photosensitive layer, the aromatic polycarbonate is contained to a single layer type photosensitive layer, which aromatic polycarbonate includes a constituent unit represented by the following general formula (1) derived from a compound having a basic asymmetric bishydroxy enamine skeleton represented by the general formula: Accordingly, the electrophotographic photoreceptor is obtained which is excellent in charge transportability, mechanical strength, electric property, durability, etc. and can form good images for a long time.
• HIGH ETCH RESISTANT UNDERLAYER COMPOSITIONS FOR MULTILAYER LITHOGRAPHIC PROCESSES
  申请人：De Binod B.

  公开号：US20080206667A1

  公开（公告）日：2008-08-28

  An etch resistant thermally curable Underlayer for use in a multiplayer liyhographic process to produce a photolithographic bilayer coated substrate, the composition having: (a) at least one cycloolefin polymer comprising at least one repeating unit of Structure (I), and at least one repeating unit of Structure (II), and optionally at least one repeating unit of Structure (III) with the proviso that neither Structure (I) nor Structure (II) nor Structure (III) contains acid sensitive groups. b) at least one cross-linking agent selected from the group consisting of an amino or phenolic cross-linking agent; c) a least one thermal acid generator (TAG); d) at lest one solvent; and e) optionally, at least one surfactant.