2,2',3,3',5,5'-Hexamethyl-4,4'-dihydroxydiphenylmethan | 29366-02-7

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: 2,2',3,3',5,5'-Hexamethyl-4,4'-dihydroxydiphenylmethan
• 英文别名: 4,4'-Methylenebis(2,3,6-trimethylphenol)；4-[(4-hydroxy-2,3,5-trimethylphenyl)methyl]-2,3,6-trimethylphenol
• CAS: 29366-02-7
• 化学式: C₁₉H₂₄O₂
• 分子量: 284.398
• InChiKey: AKRWBYMONJDTKS-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  5.3
• 重原子数：
  21
• 可旋转键数：
  2
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.37
• 拓扑面积：
  40.5
• 氢给体数：
  2
• 氢受体数：
  2

安全信息

• 海关编码：
  2907299090

反应信息

• 作为反应物：
  描述：

  2,2',3,3',5,5'-Hexamethyl-4,4'-dihydroxydiphenylmethan 在 甲醇 、 sodium methylate 作用下， 生成 2,3,6-三甲基苯酚 、 2,3,4,6-四甲基苯酚
  参考文献：
  名称：

  133. 3：5-二甲基苯酚的核甲基化

  摘要：

  DOI：

  10.1039/jr9490000624

文献信息

• Optically active compound and photosensitive resin composition
  申请人：——

  公开号：US20030211421A1

  公开（公告）日：2003-11-13

  A photoactive compound is used in combination with a photosensitizer, represented by the following formula (1): A −[( J ) m −( X-Pro )] n (1) wherein A represents a hydrophobic unit comprising at least one kind of hydrophobic groups selected from a hydrocarbon group and a heterocyclic group, J represents a connecting group, X-Pro represents a hydrophilic group protected by a protective group Pro which is removable by light exposure, m represents 0 or 1, and n represents an integer of not less than 1. The protective group Pro may be removable by light exposure in association with the photosensitizer (especially, a photo acid generator), or may be a hydrophobic protective group. The hydrophilic group may be a hydroxyl group or a carboxyl group. The photoactive compound has high sensitivity to a light source of short wavelength beams, for resist application, therefore, the photoactive compound is advantageously used for forming a pattern with high resolution.

  一种光活性化合物与光敏剂结合使用，由以下公式（1）表示： A −[( J ) m −( X-Pro )] n (1) 其中，A代表至少包括一种从烃基和杂环基中选择的疏水基的疏水单元，J代表连接基团，X-Pro代表由光照可去除的保护基团Pro保护的亲水基团，m代表0或1，n代表不少于1的整数。 保护基团Pro可以与光敏剂（特别是光酸发生剂）一起通过光照可去除，也可以是疏水保护基团。亲水基团可以是羟基或羧基。光活性化合物对短波长光源具有很高的敏感性，用于光刻应用，因此，该光活性化合物有利于形成具有高分辨率的图案。
• Curable resin composition
  申请人：Kawabe Masanao

  公开号：US20070129502A1

  公开（公告）日：2007-06-07

  Provided is curable resin composition which gives a cured article excellent in chemical resistance, dielectric properties, low water-absorption, heat resistance, flame retardance, and mechanical properties and which is usable in applications such as dielectric materials, insulating materials, heat-resistant materials, and structural materials. The curable resin composition includes a component (A) which is a polyphenylene ether oligomer having a number-average molecular weight of 700 to 4,000 and having a vinyl group at both end and a component (B) which is a solvent-soluble polyfunctional vinylaromatic copolymer which has structural units derived from monomers including a divinylaromatic compound (a) and an ethylvinylaromatic compound (b) and in which the content of repeating units derived from the divinylaromatic compound (a) is 20 mol % or higher, the ratio of the amount (wt. %) of the component (A) to that (wt. %) of the component (B) being (20 to 98):(2 to 80). The composition can further contain a layered silicate, a halogenated flame retardant, etc.

  提供了一种可治愈的树脂组合物，其使得固化后的制品具有出色的化学耐性、介电性能、低吸水性、耐热性、阻燃性和机械性能，并可用于介电材料、绝缘材料、耐热材料和结构材料等应用。该可治愈的树脂组合物包括以下组分：(A)是一种聚苯醚寡聚体，其具有700至4,000的数量平均分子量，并在两端具有乙烯基；(B)是一种可溶于溶剂的多功能乙烯基芳香族共聚物，其具有从单体中衍生出的结构单元，包括一种二乙烯基芳香族化合物(a)和一种乙基乙烯基芳香族化合物(b)，其中重复单元中来自二乙烯基芳香族化合物(a)的含量为20摩尔%或更高，组分(A)与组分(B)的重量比为(20至98)∶(2至80)。该组合物还可以进一步包含层状硅酸盐、卤素阻燃剂等。
• Tert-butylhydroquinone polycarbonates
  申请人：Kamps Jan Henk

  公开号：US20080097071A1

  公开（公告）日：2008-04-24

  The present invention relates to polycarbonate having repeat units derived from tert-butylhydroquinone (TBHQ). It has herein been found that polycarbonate having repeat units derived from TBHQ has superior properties as compared to polycarbonate having repeat units derived from other dihydroxy (hydroquinone-type) compounds. In one embodiment the present invention provides a polycarbonate having repeat units derived from tert-butylhydroquinone. The polycarbonate has a Mw (PC) of at least 9,000 g/mol.

  本发明涉及具有源自叔丁基对甲酚（TBHQ）的重复单元的聚碳酸酯。已经发现，与源自其他二羟基（对甲酚型）化合物的重复单元的聚碳酸酯相比，具有源自TBHQ的重复单元的聚碳酸酯具有优越的性能。在一种实施例中，本发明提供了一种具有源自叔丁基对甲酚的重复单元的聚碳酸酯。该聚碳酸酯的分子量（Mw（PC））至少为9,000克/摩尔。
• Electrophotographic photoreceptor
  申请人：MITSUBISHI CHEMICAL CORPORATION

  公开号：EP1286224A1

  公开（公告）日：2003-02-26

  An electrophotographic photoreceptor, comprising a photosensitive layer formed on an electroconductive substrate, wherein the photosensitive layer comprises a resin having repeating units of the following formula (1): where, in the formula (1), A represents a plurality of bivalent groups including at least two members selected from the group consisting of bivalent groups of the following formulae (2), (3) and (4): where, in the formulae (2), (3) and (4), each of R1 to R24 which are independent of one another, represents a hydrogen atom, a substituted or unsubstituted C1-10 alkyl group, a substituted or unsubstituted C1-10 alkoxyl group, a halogen atom, a halogenated alkyl group or a substituted or unsubstituted C6-20 aromatic group, and each of X1, X2 and X3 which may be the same or different, represents a single bond, a bivalent organic group of the formula (5), -O-, -S-, -CO-, -SO2- or -(CH2)s- (wherein S is an integer of from 2 to 5): where, in the formula (5), each of R25 to R29 which are independent of one another, represents a hydrogen atom, a substituted or unsubstituted C1-10 alkyl group, a substituted or unsubstituted C1-10 alkoxyl group, a halogen atom, a halogenated alkyl group or a substituted or unsubstituted C6-20 aromatic group, provided that R25 and R26, and R27 and R28, may be bonded to each other to form a cycle, t is an integer of from 0 to 5, R29 is a C1-10 alkyl group, a C1-10 alkoxyl group, a halogen atom, a halogenated alkyl group or a substituted or unsubstituted C6-20 aromatic group, and u is an integer of from 0 to 4.

  一种电子照相感光器，包括在导电基底上形成的感光层，其中感光层包括具有下式(1)重复单元的树脂： 其中，在式 (1) 中，A 代表多个二价基团，包括至少两个从下式 (2)、(3) 和 (4) 的二价基团组成的组中选出的成员： 其中，在式(2)、(3)和(4)中，彼此独立的 R1 至 R24 各自代表氢原子、取代或未取代的 C1-10 烷基、取代或未取代的 C1-10 烷氧基、卤素原子、卤代烷基或取代或未取代的 C6-20 芳基，且 X1、X2 和 X3 可相同或不同，各自代表单键、式(5)的二价有机基团、 -O-、-S-、-CO-、-SO2- 或-(CH2)s-（其中 S 为 2 至 5 的整数）： 其中，在式 (5) 中，相互独立的 R25 至 R29 分别代表氢原子、取代或未取代的 C1-10 烷基、取代或未取代的 C1-10 烷氧基、卤素原子、卤代烷基或取代或未取代的 C6-20 芳基、t为 0 至 5 的整数，R29 为 C1-10 烷基、C1-10 烷氧基、卤素原子、卤代烷基或取代或未取代的 C6-20 芳基，u 为 0 至 4 的整数。
• OPTICALLY ACTIVE COMPOUND AND PHOTOSENSITIVE RESIN COMPOSITION
  申请人：Kansai Research Institute, Inc.

  公开号：EP1375463A1

  公开（公告）日：2004-01-02

  A photoactive compound is used in combination with a photosensitizer, represented by the following formula (1):         A-[(J)m-(X-Pro)]n     (1)    wherein A represents a hydrophobic unit comprising at least one kind of hydrophobic groups selected from a hydrocarbon group and a heterocyclic group, J represents a connecting group, X-Pro represents a hydrophilic group protected by a protective group Pro which is removable by light exposure, m represents 0 or 1, and n represents an integer of not less than 1. The protective group Pro may be removable by light exposure in association with the photosensitizer (especially, a photo acid generator), or may be a hydrophobic protective group. The hydrophilic group may be a hydroxyl group or a carboxyl group. The photoactive compound has high sensitivity to a light source of short wavelength beams, for resist application, therefore, the photoactive compound is advantageously used for forming a pattern with high resolution.

  光活性化合物与光敏剂结合使用，光敏剂由下式（1）表示： A-[(J)m-(X-Pro)]n (1) 其中 A 代表疏水单元，包括至少一种选自烃基和杂环基的疏水基团；J 代表连接基团；X-Pro 代表亲水基团，该亲水基团受保护基团 Pro 的保护，该保护基团可通过光照去除；m 代表 0 或 1；n 代表不小于 1 的整数。 保护基 Pro 可以通过与光敏剂（特别是光酸发生器）一起进行光照射而去除，也可以是疏水保护基。亲水基团可以是羟基或羧基。光活性化合物对短波长光束的光源具有很高的灵敏度，因此在抗蚀剂应用中，光活性化合物可用于形成具有高分辨率的图案。