Aryl sulfonylurea carbamates and thiolcarbamates and salts thereof: herbicidal antidotes
                        
                            
                                申请人:STAUFFER CHEMICAL COMPANY
                            
                            
                                公开号:EP0052856A2
                            
                            
                                公开(公告)日:1982-06-02
                            
                            
Aryl sulfonylureas as new compositions and included in a two-part herbicide system comprising at least one or more thioicarbamate, thiolcarbamate sulfoxide or haloacetanilide herbicide, and as the second part a non-phytotoxic antidotally effective amount of aryl sulfonylurea as an antidote therefor of the formula
in which X is oxygen or sulfur; n is an integer; R is lower alkyl, lower alkylthio, halogen, trifluoromethyl, cyano, nitro, lower alkyl sulfonyl;
R4 is hydrogen, lower alkyl, lower alkoxyalkyl, phenyl and chlorophenyl;
R2 is hydrogen, lower alkyl, alkoxyalkyl and phenyl;
R' is lower alkyl, alkenyl, alkynyl, haloalkyl, alkoxyalkyl, 1-phenylpropenyl, benzyl, chlorobenzyl, haloalkenyl, phenyl and alkyl substituted phenyl; and
AR is phenyl, benzyl, naphthyl, pyridyl or styryl; and the inorganic base salts sodium, potassium, ammonium and other inorganic salts; and organic base salts thereof.
                            作为新组合物的芳基磺酰
脲,包含在由两部分组成的
除草剂体系中,其中包括至少一种或多种
硫代
氨基甲酸酯、
硫代
氨基甲酸酯亚砜或卤代
乙酰苯胺
除草剂,以及作为第二部分的非植物毒性抗毒性有效量的芳基磺酰
脲作为其解毒剂,其式为
其中 X 是氧或
硫;n 是整数;R 是低级烷基、低级烷
硫基、卤素、三
氟甲基、
氰基、硝基、低级烷基磺酰基;
R4 是氢、低级烷基、低级烷氧基烷基、苯基和
氯苯基;
R2 是氢、低级烷基、烷氧基烷基和苯基;
R' 是低级烷基、烯基、炔基、卤代烷基、烷氧基烷基、1-苯基
丙烯基、苄基、
氯代苄基、卤代烯基、苯基和烷基取代的苯基;以及
AR 是苯基、苄基、
萘基、
吡啶基或
苯乙烯基;以及
无机碱盐
钠、
钾、
铵和其他
无机盐;及其有机碱盐。