RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND ACID GENERATOR
申请人:TOKYO OHKA KOGYO CO., LTD.
公开号:US20190361345A1
公开(公告)日:2019-11-28
A resist composition containing a compound represented by the general formula (bd1-1), (bd1-2) or (bd1-3); in the formula, Rx
1
to Rx
4
represent a hydrocarbon group or a hydrogen atom or may be mutually bonded to form a ring structure; Ry
1
to Ry
2
represent a hydrocarbon group or a hydrogen atom or may be mutually bonded to form a ring structure, Rz
1
to Rz
4
represent a hydrocarbon group or a hydrogen atom or may be mutually bonded to form a ring structure. At least one of Rx
1
to Rx
4
, Ry
1
to Ry
2
and Rz
1
to Rz
4
has an anion group, M
1
m+
represents a sulfonium cation having a sulfonyl group, R
001
to R
003
each independently represent a monovalent organic group; provided that at least one of R
001
to R
003
is an organic group having an acid dissociable group; and M
3
m+
represents an m-valent organic cation having an electron-withdrawing group.
一种包含由通式(bd1-1)、(bd1-2)或(bd1-3)表示的化合物的抗蚀组合物;在该式中,Rx1到Rx4代表一个烃基或氢原子,或者它们可以相互连接形成环状结构;Ry1到Ry2代表一个烃基或氢原子,或者它们可以相互连接形成环状结构;Rz1到Rz4代表一个烃基或氢原子,或者它们可以相互连接形成环状结构。Rx1到Rx4、Ry1到Ry2和Rz1到Rz4中的至少一个具有一个阴离子基团,M1m+表示具有磺酰基的亚砜阳离子,R001到R003分别独立表示一价有机基团;但至少R001到R003中的一个是具有酸解离基团的有机基团;M3m+表示具有吸电子基团的m价有机阳离子。