2,6-Diaminohexanoic acid; hydron; dichloride

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: 2,6-Diaminohexanoic acid; hydron; dichloride
• 英文别名: 2,6-diaminohexanoic acid;hydron;dichloride
• 化学式: C6H16Cl2N2O2
• 分子量: 219.11
• InChiKey: JBBURJFZIMRPCZ-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0.37
• 重原子数：
  12
• 可旋转键数：
  5
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.83
• 拓扑面积：
  89.3
• 氢给体数：
  5
• 氢受体数：
  4

文献信息

• Polyamino acids functionalized by at least one hydrophobic group and the therapeutic application thereof
  申请人：Angot Stephanie

  公开号：US20070160568A1

  公开（公告）日：2007-07-12

  The invention relates to novel materials based on biodegradable polyamino acids that are useful for vectorizing active principle/s (AP). The aim of the invention is to supply a new polymeric raw material that is used for vectorizing AP and optimally fulfills all requirements concerning biocompatibility, biodegradability, the ability to be easily associated with numerous active principles or solubilize said active principles and to release the active principles in vivo. Said polymers can also be readily and economically transformed into particles vectorizing active principles according to the grafting rate of the hydrophobic groups, said particles being able to form stable aqueous colloidal suspensions. Said aim is achieved by the inventive amphiphile polyamino acids comprising aspartic and/or glutamic units that carry grafts which encompass at least one hydrophobic unit and are linked to the aspartic and/or glutamic units via a rotula containing two amide functions, more particularly via a spacer of the lysine or ornithine type. Said amide functions ensure better stability during hydrolysis than comparable products known in prior art. The invention also relates to new pharmaceutical, cosmetic, dietetic, or phytosanitary compositions based on the inventive polyamino acids.

  该发明涉及基于可生物降解的聚氨基酸的新型材料，该材料用于载荷活性成分（AP）。该发明的目的是提供一种新的聚合原料，用于载荷AP，并且在生物相容性、可生物降解性、易于与许多活性成分或溶解这些活性成分以及在体内释放这些活性成分方面都能够最佳地满足所有要求。所述聚合物还可以根据疏水基团的接枝率轻松且经济地转化为载荷活性成分的颗粒，这些颗粒能够形成稳定的水胶体悬浮液。该目的通过包含天冬氨酸和/或谷氨酸单元的创新性两性聚氨基酸实现，这些单元携带涵盖至少一个疏水单元的接枝，并且通过含有两个酰胺功能的转子，更具体地说，通过赖氨酸或鸟氨酸类型的间隔物与天冬氨酸和/或谷氨酸单元连接。所述酰胺功能确保在水解过程中比先前已知的类似产品具有更好的稳定性。该发明还涉及基于创新性聚氨基酸的新药物、化妆品、饮食或植物保健产品组合。
• [EN] CRYSTALLIZATION METHOD AND BIOAVAILABILITY<br/>[FR] PROCÉDÉ DE CRISTALLISATION ET BIODISPONIBILITÉ
  申请人：THAR PHARMACEUTICALS INC

  公开号：WO2017049294A1

  公开（公告）日：2017-03-23

  Preparation and in vitro and in vivo characterization of novel forms of active pharmaceutical ingredients, suitable for pharmaceutical compositions in drug delivery systems for humans.

  准备并进行体外和体内特性评价，研究新型活性药物成分的形式，适用于人体药物输送系统中的药物组合。
• PREPARATION OF AMINO-PROTECTED LYSINE DERIVATIVES
  申请人：——

  公开号：US20020042536A1

  公开（公告）日：2002-04-11

  The invention relates to novel processes for preparing differentially protected lysine derivatives via a novel p-anisaldehyde Schiff base intermediate and the intermediate prepared therein.

  本发明涉及一种通过新型对甲氧基苯甲醛席夫碱中间体及其制备的中间体制备差异保护赖氨酸衍生物的新工艺。
• CHEMICAL MECHANICAL POLISHING AND WAFER CLEANING COMPOSITION COMPRISING AMIDOXIME COMPOUNDS AND ASSOCIATED METHOD FOR USE
  申请人：Lee Wai Mun

  公开号：US20090130849A1

  公开（公告）日：2009-05-21

  A composition and associated method for chemical mechanical planarization (or other polishing) is described. The composition contains an amidoxime compound and water. The composition may also contain an abrasive and a compound with oxidation and reduction potential. The composition is useful for attaining improved removal rates for metal, including copper, barrier material, and dielectric layer materials in metal CMP. The composition is particularly useful in conjunction with the associated method for metal CMP applications.

  本文描述了一种化学机械平整化（或其他抛光）的组合物及其相关方法。该组合物含有一种酰胺肟化合物和水。该组合物还可以含有磨料和具有氧化还原潜力的化合物。该组合物可用于在金属CMP中获得改进的金属去除速率，包括铜、屏障材料和金属CMP中的介电层材料。该组合物在金属CMP应用的相关方法中特别有用。
• COPPER CMP POLISHING PAD CLEANING COMPOSITION COMPRISING OF AMIDOXIME COMPOUNDS
  申请人：Lee Wai Mun

  公开号：US20090137191A1

  公开（公告）日：2009-05-28

  The present invention relates to methods of using amidoxime compositions for cleaning polishing pads, particularly after chemical mechanical planarization or polishing is provided. A polishing pad is cleaned of Cu CMP by-products, subsequent to or during planarizing a wafer, to reduce pad-glazing by applying to the polishing pad surface a composition comprising an aqueous amidoxime compound solution in water.

  本发明涉及使用氨基甲酰肼组合物清洁抛光垫的方法，特别是在化学机械平面化或抛光后提供的方法。在平面化晶片的过程中或之后，通过在抛光垫表面涂布含有水的氨基甲酰肼化合物溶液的组合物，清除铜化学机械抛光副产物，以减少垫面光泽。

表征谱图