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9-蒽磺酸 | 22582-76-9

中文名称
9-蒽磺酸
中文别名
——
英文名称
anthracene-9-sulfonic acid
英文别名
Anthracen-9-sulfonsaeure;Anthracen-4-sulfonsaeure
9-蒽磺酸化学式
CAS
22582-76-9
化学式
C14H10O3S
mdl
——
分子量
258.298
InChiKey
SKLLBGQUBYTKMR-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    3.3
  • 重原子数:
    18
  • 可旋转键数:
    1
  • 环数:
    3.0
  • sp3杂化的碳原子比例:
    0.0
  • 拓扑面积:
    62.8
  • 氢给体数:
    1
  • 氢受体数:
    3

安全信息

  • 海关编码:
    2904100000

SDS

SDS:ecd75c9f785d4a3ec16af11ecada9f8b
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反应信息

  • 作为反应物:
    描述:
    参考文献:
    名称:
    Minajew; Fedorow, Chemische Berichte, 1929, vol. 62, p. 2490
    摘要:
    DOI:
  • 作为产物:
    描述:
    二氧化硫 作用下, 以 正己烷 为溶剂, 生成 9-蒽磺酸
    参考文献:
    名称:
    电荷转移络合物及蒽与二氧化硫在各种溶剂中的光化学反应
    摘要:
    蒽与二氧化硫的 1:1 电荷转移络合物形成的平衡常数 K 已通过分光光度测量估计在四氯化碳中 15°C 为 0.33。已推导出ΔH (-4.8 kcal.mol-1) 和ΔS° (-19 cal.deg-1mol-1) 的值。在较长波长区域估计时,K 值几乎为零,表明涉及接触电荷转移复合物。在苯中也观察到一种蒽-SO2 的接触电荷转移络合物。已经用在各种溶剂中的二氧化硫用高压汞灯照射蒽。在正己烷、四氯化碳等与二氧化硫无相互作用的溶剂中,蒽生成含硫物质,如蒽-9-磺酸(I)和二蒽基-(9. 9')-磺酸-(10)(II)。相反,在苯或二硫化碳中,不产生磺酸、蒽的二聚体或内过氧化物等产物,...
    DOI:
    10.1246/bcsj.39.868
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文献信息

  • Sulfonium salts, radiation- sensitive acid generators, and positive radiator-sensitive resin compositions
    申请人:Miyamatsu Takashi
    公开号:US20060141383A1
    公开(公告)日:2006-06-29
    A sulfonium salt compound excelling in transparency to deep ultraviolet rays at a wavelength of 220 nm or less, exhibiting well-balanced excellent performance such as sensitivity, resolution, pattern form, LER, and storage stability when used as a photoacid generator, a photoacid generator comprising the sulfonium salt compound, and a positive-tone radiation-sensitive resin composition containing the photoacid generator. The sulfonium salt compound is shown by the following formula (I), wherein R 1 represents a halogen atom, an alkyl group, a monovalent alicyclic hydrocarbon group, an alkoxyl group, or —OR 3 group, wherein R 3 is a monovalent alicyclic hydrocarbon group, R 2 represents a (substituted)-alkyl group or two or more R 2 groups form a cyclic structure, p is 0-7, q is 0-6, n is 0-3, and X − indicates a sulfonic acid anion. The positive-tone radiation-sensitive resin composition comprises (A) a photoacid generator of the sulfonium-salt compound and (B) an acid-dissociable group-containing resin.
    一种亚砜盐化合物,在波长为220纳米或更短的深紫外线下具有优异的透明度,当用作光酸发生剂时,表现出良好的性能平衡,如灵敏度、分辨率、图案形态、LER和储存稳定性。该光酸发生剂包含亚砜盐化合物,且包含该光酸发生剂的正电调辐射敏感树脂组成物。该亚砜盐化合物由以下公式(I)表示,其中R1表示卤素原子、烷基、一价脂环烃基、烷氧基或-OR3基,其中R3为一价脂环烃基,R2表示(取代)-烷基或两个或更多的R2基形成环状结构,p为0-7,q为0-6,n为0-3,X-表示磺酸根离子。该正电调辐射敏感树脂组成物包括(A)亚砜盐化合物的光酸发生剂和(B)含酸可解离基团的树脂
  • DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS FOR NEGATIVE RESISTS
    申请人:CHEN KUANG-JUNG
    公开号:US20130040238A1
    公开(公告)日:2013-02-14
    A negative developable bottom antireflective coating (NDBARC) material includes a polymer containing an aliphatic alcohol moiety, an aromatic moiety, and a carboxylic acid moiety. The NDBARC composition is insoluble in a typical resist solvent such as propylene glycol methyl ether acetate (PGMEA) after coating and baking. The NDBARC material also includes a photoacid generator, and optionally a crosslinking compound. In the NDBARC material, the carboxylic acid provides the developer solubility, while the alcohol alone, the carboxylic acid alone, or their combination provides the PGMEA resistance. The NDBARC material has resistance to the resist solvent, and thus, intermixing does not occur between NDBARC and resist during resist coating over NDBARC. After exposure and bake, the lithographically exposed portions of both the negative photoresist and the NDBARC layer become insoluble in developer due to the chemically amplified crosslinking of the polymers in negative resist and NDBARC layer in the lithographically exposed portions.
    一种负可展性底部防反射涂层(NDBARC)材料,包括含有脂肪族醇基团、芳香基团和羧酸基团的聚合物。NDBARC组合物在涂覆和烘烤后,不溶于典型的抗蚀剂溶剂,如丙二醇甲醚乙酸酯(PGMEA)。NDBARC材料还包括光酸发生剂,以及可选的交联化合物。在NDBARC材料中,羧酸提供了开发剂的溶解性,而仅有醇,仅有羧酸或它们的组合提供了对PGMEA的抗性。NDBARC材料具有抗抗蚀剂溶剂的性能,因此,在涂覆NDBARC时,NDBARC和抗蚀剂之间不会发生混合。经过曝光和烘烤后,负光刻胶和NDBARC层的光刻曝光部分由于聚合物的化学增强交联而变得不溶于开发剂。
  • DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITION AND PATTERN FORMING METHOD USING THEREOF
    申请人:International Business Machines Corporation
    公开号:US20150050601A1
    公开(公告)日:2015-02-19
    The present invention relates to a developable bottom antireflective coating (BARC) composition and a pattern forming method using the BARC composition. The BARC composition includes a first polymer having a first carboxylic acid moiety, a hydroxy-containing alicyclic moiety, and a first chromophore moiety; a second polymer having a second carboxylic acid moiety, a hydroxy-containing acyclic moiety, and a second chromophore moiety; a crosslinking agent; and a radiation sensitive acid generator. The first and second chromophore moieties each absorb light at a wavelength from 100 nm to 400 nm. In the patterning forming method, a photoresist layer is formed over a BARC layer of the BARC composition. After exposure, unexposed regions of the photoresist layer and the BARC layer are selectively removed by a developer to form a patterned structure in the photoresist layer. The BARC composition and the pattern forming method are especially useful for implanting levels.
    本发明涉及一种可开发的底部抗反射涂层(BARC)组合物及使用该BARC组合物的图案形成方法。该BARC组合物包括第一聚合物,其具有第一羧基酸基团,含羟基的脂环族基团和第一色团基团;第二聚合物,其具有第二羧基酸基团,含羟基的非环族基团和第二色团基团;交联剂;以及辐射敏感的酸发生剂。第一和第二色团基团吸收100纳米至400纳米波长的光线。在图案形成方法中,先形成一层BARC组合物的BARC层,再在其上形成一层光阻层。经曝光后,通过显影剂选择性地去除光阻层和BARC层的未曝光区域,形成光阻层中的图案结构。该BARC组合物和图案形成方法特别适用于植入级别。
  • Fluid analysis technology using fluorescence type sensors
    申请人:Fisher Scientific Company
    公开号:EP0137157A2
    公开(公告)日:1985-04-17
    A fluorescence-based optical sensor includes a membrane immobilized fluorophor secured to one end of a bifurcated fiber optic channel for exposure to the sample to be analyzed. The fiber optic channel also has an input end coupled to a radiation source arranged to supply radiation at two different wavelengths and an output end coupled to a bandwidth limited photosensor. The radiation source alternately excites the fluorophor at a first wavelength that excites an acid form of the fluorophor and at a second wavelength that excites a base form of the fluorophor, and a ratio of the resulting fluorescence intensities is taken as a measure of a characteristic of the sample being analyzed.
    一种基于荧光的光学传感器包括一个固定在分叉光纤通道一端的荧光膜,该光纤通道用于接触待分析的样品。光纤通道还有一个输入端与一个辐射源相连,辐射源可提供两种不同波长的辐射,输出端与一个带宽受限的光传感器相连。辐射源以第一波长和第二波长交替激发荧光体,第一波长激发荧光体的酸性形式,第二波长激发荧光体的碱性形式。
  • SOLID ELECTROLYTIC CAPACITOR AND PROCESS FOR THE PRODUCTION THEREOF
    申请人:Showa Denko K K
    公开号:EP0971382A1
    公开(公告)日:2000-01-12
    A solid electrolytic capacitor includes a valve acting metal having microfine pores, a dielectric film formed on a surface of the valve acting metal, and a solid electrolyte layer provided on the dielectric film, in which at least a portion of the solid electrolyte layer is of a lamellar structure. In particular, a solid electrolytic capacitor includes an electrically conducting polymer having a specified condensed ring structure containing (1) a solid electrolyte layer containing a sulfoquinone anion having a sulfo anion group and a quinone structure and other anion, and (2) a solid electrolyte layer containing an anthracenesulfonate ion and other anion.
    固体电解电容器包括具有微细孔隙的阀门作用属、形成于阀门作用属表面的介电膜以及设置在介电膜上的固体电解质层,其中固体电解质层的至少一部分为片状结构。具体而言,固体电解电容器包括具有特定缩合环结构的导电聚合物,其中包含(1)含有磺醌阴离子的固体电解质层,该阴离子具有磺阴离子基团和醌结构以及其他阴离子;以及(2)含有磺酸离子和其他阴离子的固体电解质层。
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同类化合物

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