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(2S)-2-azaniumyl-5-{2-[4-(hydroxymethyl)phenyl]hydrazino}-5-oxopentanoate | 2757-90-6

中文名称
——
中文别名
——
英文名称
(2S)-2-azaniumyl-5-{2-[4-(hydroxymethyl)phenyl]hydrazino}-5-oxopentanoate
英文别名
(2S)-2-azaniumyl-5-[2-[4-(hydroxymethyl)phenyl]hydrazinyl]-5-oxopentanoate
(2S)-2-azaniumyl-5-{2-[4-(hydroxymethyl)phenyl]hydrazino}-5-oxopentanoate化学式
CAS
2757-90-6
化学式
C12H17N3O4
mdl
——
分子量
267.28
InChiKey
SRSPQXBFDCGXIZ-JTQLQIEISA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

物化性质

  • 熔点:
    207°C (rough estimate)
  • 比旋光度:
    D25 +7° (c = 0.8)
  • 沸点:
    410.47°C (rough estimate)
  • 密度:
    1.2145 (rough estimate)
  • 物理描述:
    Agaritine appears as colorless glistening crystals. (NTP, 1992)
  • 颜色/状态:
    GLISTENING CRYSTALS FROM DILUTE ALCOHOL
  • 溶解度:
    Very Soluble (NTP, 1992)
  • 旋光度:
    SPECIFIC OPTICAL ROTATION: 7 DEG @ 25 °C/D (CONCN = 0.8 G IN 100 ML WATER); MAX ABSORPTION (WATER): 237.5 NM (E= 12,000), 280 NM (E= 1,400)
  • 解离常数:
    PKA IN WATER: 3.4 & 8.86

计算性质

  • 辛醇/水分配系数(LogP):
    -2.8
  • 重原子数:
    19
  • 可旋转键数:
    7
  • 环数:
    1.0
  • sp3杂化的碳原子比例:
    0.33
  • 拓扑面积:
    125
  • 氢给体数:
    5
  • 氢受体数:
    6

安全信息

  • 海关编码:
    2928000090

文献信息

  • Novel Synthesis of Agaritine, a 4-Hydrazinobenzyl-Alcohol Derivative Occurring in Agaricaceae
    作者:Subir Datta、Lienhard Hoesch
    DOI:10.1002/hlca.19870700505
    日期:1987.8.12
    5-2-[4-(hydroxymethyl)phenyl]hydrazide} (11) which upon controlled hydrogenolysis (quinoline-sulfur-poisoned Pd/C catalyst) gave 82% of L-Glutamic acid 5-2-[4-(hydroxymethyl)phenyl] hydrazide} (1), i. e. agaritine, a metabolite of Agaricus bisporus. Without poisoning of the catalyst, hydrogenolysis of (11) yielded L-glutamic acid 5-[2-(4-tolyl)hydrazide] (12).
    通过二碘丁基铝氢化4-肼基苯甲酸甲酯(4)还原4-肼基苄醇(3(58%)),而LiA1H 4或LiBh 4还原4进一步产生(通过中间体3)(4-甲苯基)肼(5)。醇3在无O 2的条件下是稳定的,并且无论是热催化还是H +催化都没有消除H 2 O的趋势。SeO 2氧化3生成4-(羟甲基)苯重氮重离子(8),由其与2-萘酚的偶氮偶合产物9鉴定。在二环己基碳二亚胺的存在下,将3与1-苄基5-氢N-(苄氧羰基)-L-谷氨酸缩合(10),得到81%的N 2-(苄氧羰基)-L-谷氨酸1-(苄基酯)5- 2- [4-(羟甲基)苯基]酰肼}(11),在受控的氢解下(喹啉硫中毒的Pd / C催化剂),得到82%的L-谷氨酸5- 2- [4-(羟甲基)苯基]酰肼}(1),即琼脂碱,双孢蘑菇的代谢产物。不中毒的催化剂,氢解(11)得到L-谷氨酸5- [2-(4-甲苯基)酰肼](12)。
  • Agaritine from Agaricus bisporus is capable of preventing melanin formation
    作者:Juan Carlos Espı́n、Sylvie Jolivet、Arjanne Overeem、Harry J Wichers
    DOI:10.1016/s0031-9422(98)00562-7
    日期:1999.2
    lphenylhydrazine] was isolated and purified from the mushroom Agaricus bisporus. The prevention of melanin formation by agaritine is reported here for the first time. This compound, characteristic for the Agaricus genus, was a nucleophile in its deprotonated state which was able to remove the, either enzymatically or chemically generated, o-quinones from the assay medium. The disappearance of these
    随质子浓度呈非线性下降,且与初始邻醌浓度无关。[Q] 0 显示随初始邻醌浓度线性增加,随质子浓度非线性减少,并且与初始琼脂素浓度无关。考虑到琼脂对邻醌的影响,本文呼吁在邻醌积累实验中使用琼脂时应谨慎。此外,还讨论了鹰嘴豆碱在蘑菇褐变中的可能作用。本文呼吁在邻醌积累实验中使用琼脂素时要谨慎。此外,还讨论了鹰嘴豆碱在蘑菇褐变中的可能作用。本文呼吁在邻醌积累实验中使用琼脂素时要谨慎。此外,还讨论了鹰嘴豆碱在蘑菇褐变中的可能作用。
  • Terpenoid spiro ketal compounds with LXR agonists activity, their use and formulations with them
    申请人:InterMed Discovery GmbH
    公开号:EP2468253A1
    公开(公告)日:2012-06-27
    The invention relates to the use, or methods (especially with regard to animals, especially human, that are in need of such treatment) comprising the use, respectively, of an extract and/or especially one or more natural spiro triterpenoids and derivatives thereof, especially from the blazeispirol family, obtainable from Agaricus species, alone or as supplement, as active ingredient in the prophylactic and/or therapeutic treatment of a disease, disorder or condition that responds to the modulation of Liver X receptor, either in humans or in other mammals, and/or to the use of said extract and/or natural compound(s) or mixtures for the treatment of said disease, disorder or condition, as well as corresponding methods of treatment, or their use in the manufacture of a pharmaceutical or nutraceutical formulation for said treatment. The invention relates also to said extract and/or compound(s) for use in the treatment or in the preparation of a medicament (including a nutraceutical) for the prophylactic and/or therapeutic treatment of said disorder, disorder or condition, as well as their preparation. It also relates to pharmaceutical or nutraceutical formulations comprising said extract and/or natural compound(s) which are useful in said prophylactic and/or therapeutic treatment. They can also be used for non-therapeutic, e.g. cosmetic, purposes only.
    本发明涉及姬松茸提取物和/或特别是一种或多种天然螺三萜类及其衍生物,尤其是从姬松茸中提取的blazeispirol家族中的一种或多种天然螺三萜类及其衍生物的使用或方法(尤其是针对需要此类治疗的动物,特别是人类),作为预防和/或治疗疾病的活性成分、本发明还涉及上述提取物和/或天然化合物或混合物用于治疗上述疾病、紊乱或病症的用途,以及相应的治疗方法,或它们在制造用于上述治疗的药物或保健品配方中的用途。本发明还涉及用于治疗或制备预防和/或治疗上述疾病、失调或病症的药物(包括营养保健品)的上述提取物和/或化合物,以及它们的制备方法。它还涉及包含上述提取物和/或天然化合物的药物或保健品制剂,这些制剂可用于上述预防和/或治疗。它们也可仅用于非治疗目的,如美容。
  • CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION, METHOD AND SYSTEM FOR COBALT-CONTAINING SUBSTRATE
    申请人:Versum Materials US, LLC
    公开号:EP3257910A1
    公开(公告)日:2017-12-20
    Chemical mechanical polishing (CMP) compositions, methods and systems for polish cobalt or cobalt-containing substrates are provided. The CMP compositions comprise α-alanine, abrasive particles, a salt of phosphate, corrosion inhibitor, oxidizer and water. The cobalt chemical mechanical polishing compositions provide high removal rate of Co as well as very high selectivity of Co film vs. dielectric film, such as TEOS, SixNy (with 1.0 < x <3.0, 1.33 < y <4.0), low-k, and ultra low-k films.
    提供了用于抛光钴或含钴基底的化学机械抛光(CMP)组合物、方法和系统。CMP 组合物由 α-丙氨酸、研磨颗粒、磷酸盐、缓蚀剂、氧化剂和水组成。钴化学机械抛光组合物具有很高的钴去除率,以及钴膜与介质膜(如 TEOS、SixNy(1.0 < x <3.0,1.33 < y <4.0)、低-k 和超低-k 膜)的极高选择性。
  • ADDITIVES FOR BARRIER CHEMICAL MECHANICAL PLANARIZATION
    申请人:Versum Materials US, LLC
    公开号:EP3263667A1
    公开(公告)日:2018-01-03
    A barrier chemical mechanical planarization polishing composition is provided that includes suitable chemical additives. The suitable chemical additives are silicate compound and high molecular weight polymers/copolymers. There is also provided a chemical mechanical polishing method using the barrier chemical mechanical planarization polishing composition.
    提供了一种阻隔化学机械平面抛光组合物,其中包括合适的化学添加剂。合适的化学添加剂是硅酸盐化合物和高分子量聚合物/共聚物。还提供了一种使用阻隔化学机械平面抛光组合物的化学机械抛光方法。
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