triethylammonium 2-pivaloyloxy-1,1-difluoroethanesulfonate | 1134641-71-6

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 有机磺酸及其衍生物
• 英文名称: triethylammonium 2-pivaloyloxy-1,1-difluoroethanesulfonate
• 英文别名: Triethylammonium 2-pivaloyloxy-1,1-difluoroethanesulfonate；2-(2,2-dimethylpropanoyloxy)-1,1-difluoroethanesulfonate;triethylazanium
• CAS: 1134641-71-6
• 化学式: C₆H₁₅N*C₇H₁₂F₂O₅S
• 分子量: 347.424
• InChiKey: OLQVYTZMWXSKKC-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0.64
• 重原子数：
  22
• 可旋转键数：
  7
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.92
• 拓扑面积：
  96.3
• 氢给体数：
  1
• 氢受体数：
  7

反应信息

• 作为反应物：
  描述：

  triethylammonium 2-pivaloyloxy-1,1-difluoroethanesulfonate 、 二苯基碘酰氯 以 氯仿 、 水 为溶剂， 生成 diphenyliodonium 2-pivaloyloxy-1,1-difluoroethanesulfonate
  参考文献：
  名称：

  Fluorine-Containing Sulfonate Resin, Resist Composition and Pattern Formation Method

  摘要：

  根据本发明，磺酸盐树脂具有以下通用公式（3）的重复单元：其中X分别表示氢原子或氟原子；n表示1至10的整数；R表示氢原子、卤原子或C1-C3烷基或含氟烷基团；J表示二价连接基团；M+表示一价阳离子。这种磺酸盐树脂在侧链中含有磺酸盐鉮盐，磺酸盐鉮盐的阴离子部分固定在磺酸盐树脂上，因此作为具有良好抗性特性（如DOF、LER、灵敏度和分辨率）的抗性树脂。

  公开号：

  US20120322006A1

文献信息

• Resist lower-layer composition containing thermal acid generator, resist lower layer film-formed substrate, and patterning process
  申请人：Ohsawa Youichi

  公开号：US20100119970A1

  公开（公告）日：2010-05-13

  There is disclosed a resist lower-layer composition configured to be used by a multi-layer resist method used in lithography to form a layer lower than a photoresist layer acting as a resist upper layer film, wherein the resist lower-layer composition becomes insoluble or poorly-soluble in an alkaline developer after formation of the lower layer, and wherein the resist lower-layer composition comprises, at least, a thermal acid generator for generating an acid represented by the general formula (1) by heating at a temperature of 100° C. or higher. RCOO—CH 2 CF 2 SO 3 − H + (1) There can be provided a resist lower-layer composition in a multi-layer resist method (particularly, a two-layer resist method and a three-layer resist method), which composition is used to form a layer lower than a photoresist layer acting as a resist upper layer film, which composition becomes insoluble or poorly-soluble in an alkaline developer after formation of the lower layer, and which composition is capable of forming a resist lower layer film, intermediate-layered film, and the like having a higher anti-poisoning effect and exhibiting a lower load to the environment.

  揭示了一种抗性下层组合物，配置为在光刻中使用的多层抗性方法中使用，用于形成低于作为抗性上层膜的光刻胶层的一层，其中抗性下层组合物在形成下层后变得不溶解或难溶解于碱性显影剂中，且抗性下层组合物至少包括用于通过在100°C或更高温度下加热生成由通式（1）表示的酸的热酸发生剂。 可以提供一种抗性下层组合物，用于多层抗性方法（特别是双层抗性方法和三层抗性方法），该组合物用于形成低于作为抗性上层膜的光刻胶层的一层，该组合物在形成下层后变得不溶解或难溶解于碱性显影剂中，并且该组合物能够形成具有更高抗毒性效果并表现出对环境负荷较低的抗性下层膜、中间层膜等。
• Fluorine-Containing Sulfonates Having Polymerizable Anions and Manufacturing Method Therefor, Fluorine-Containing Resins, Resist Compositions, and Pattern-Forming Method Using Same
  申请人：Masubuchi Takashi

  公开号：US20110177453A1

  公开（公告）日：2011-07-21

  According to the present invention, there is provided a polymerizable fluorine-containing sulfonic acid onium salt of the following general formula (2) and a resin obtained by polymerization thereof. It is possible by the use of this sulfonate resin of the present invention to provide a resist composition with high resolution, board depth of focus tolerance (DOF), small line edge roughness (LER) and high sensitivity. In the formula, Z represents a substituted or unsubstituted C 1 -C 6 straight or branched alkylene group, or a divalent moiety in which substituted or unsubstituted C 1 -C 6 straight or branched alkylene groups are bonded in series to a divalent group obtained by elimination of two hydrogen atoms from an alicyclic or aromatic hydrocarbon; R represents a hydrogen atom, a halogen atom, or a C 1 -C 3 alkyl or fluorine-containing alkyl group; and Q + represents a sulfonium cation or an iodonium cation.

  根据本发明，提供了一种可聚合的含氟磺酸盐聚合物，其化学式为(2)，以及通过其聚合获得的树脂。使用本发明的磺酸盐树脂，可以提供具有高分辨率、深度焦点容忍度(DOF)、小线边粗糙度(LER)和高灵敏度的抗蚀剂组合物。在该公式中，Z表示取代或未取代的C1-C6直链或支链烷基，或者是由环烷烃或芳香族碳氢化合物中消除两个氢原子而得到的取代或未取代的C1-C6直链或支链烷基序列键合到二价基团中的一个二价基团；R表示氢原子、卤素原子或C1-C3烷基或含氟烷基；Q+表示磺酸盐阳离子或碘酸盐阳离子。
• Fluorine-Containing Sulfonate Resin, Fluorine-Containing N-Sulfonyloxyimide Resin, Resist Composition and Pattern Formation Method
  申请人：KATO Misugi

  公开号：US20120328985A1

  公开（公告）日：2012-12-27

  According to the present invention, there are provided a fluorine-containing sulfonate salt resin or fluorine-containing sulfonate ester resin having a structure of the following general formula (A) and a fluorine-containing N-sulfonyloxyimide resin having a repeating unit of the general formula (17). It is possible obtain a resist composition using the above resin such that the resist composition can attain high resolution, wide DOF, small LER and high sensitivity and form a good pattern shape.

  根据本发明，提供了具有以下通用式（A）结构的含氟磺酸盐树脂或含氟磺酸酯树脂以及具有通用式（17）重复单元的含氟N-磺酰氧亚胺树脂。可以使用上述树脂制备抗蚀剂组合物，使抗蚀剂组合物能够达到高分辨率、宽DOF、小LER和高灵敏度，并形成良好的图案形状。
• 2-(Alkylcarbonyloxy)-1, 1-Difluoroethanesulfonic Acid Salt and Method for Producing the Same
  申请人：Central Glass Company, Limited

  公开号：US20130317250A1

  公开（公告）日：2013-11-28

  By using an organic base when a carboxylic acid bromodifluoroethyl ester is sulfinated by using a sulfinating agent, there is obtained 2-(alkylcarbonyloxy)-1,1-difluoroethanesulfinic acid ammonium salt. By oxidizing the 2-(alkylcarbonyloxy)-1,1-difluoroethanesulfinic acid ammonium salt, there is obtained 2-(alkylcarbonyloxy)-1,1-difluoroethanesulfonic acid ammonium salt. By using the 2-(alkylcarbonyloxy)-1,1-difluoroethanesulfonic acid ammonium salt as a raw material and exchanging it into an onium salt directly or through saponification/esterification, there can be obtained a 2-alkylcarbonyloxy-1,1-difluoroethanesulfonic acid onium salt.

  在使用亚磺酰化试剂对羧酸溴二氟乙酯进行亚磺酰化反应时，使用有机碱，可以得到2-(烷基羰基氧基)-1,1-二氟乙烷亚磺酸铵盐。通过氧化2-(烷基羰基氧基)-1,1-二氟乙烷亚磺酸铵盐，可以得到2-(烷基羰基氧基)-1,1-二氟乙烷磺酸铵盐。通过直接将2-(烷基羰基氧基)-1,1-二氟乙烷磺酸铵盐或通过皂化/酯化交换成离子盐，可以得到2-烷基羰基氧基-1,1-二氟乙烷磺酸离子盐。
• Fluorine-containing sulfonate resin, fluorine-containing N-sulfonyloxyimide resin, resist composition and pattern formation method
  申请人：Kato Misugi

  公开号：US09221928B2

  公开（公告）日：2015-12-29

  A fluorine-containing sulfonate salt resin or fluorine-containing sulfonate ester resin having a structure of the following general formula (A) and a fluorine-containing N-sulfonyloxyimide resin having a repeating unit of the general formula (17). And a resist composition using the above resin such that the resist composition can attain high resolution, wide DOF, small LER and high sensitivity and form a good pattern shape.

  一种含氟磺酸盐树脂或含氟磺酸酯树脂，其具有以下通式（A）的结构和含有通式（17）的重复单元的含氟N-磺酰氧咪唑树脂。使用上述树脂的光阻组合物，以使光阻组合物能够达到高分辨率、宽深度焦点、小LER和高灵敏度，并形成良好的图案形状。