The present invention provides a photoresist composition comprising a compound capable of generating an acid and a base by irradiation, a resin having an acid-labile group and being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid, and an acid generator.
US4748250A
申请人:——
公开号:US4748250A
公开(公告)日:1988-05-31
Klages; Zange, Justus Liebigs Annalen der Chemie, <hi>1957</hi>, vol. 607, p. 35,43