Benzenemethanaminium, N,N,N-tripropyl- | 100783-71-9

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: Benzenemethanaminium, N,N,N-tripropyl-
• 英文别名: benzyl(tripropyl)azanium
• CAS: 100783-71-9
• 化学式: C16H28N+
• 分子量: 234.4
• InChiKey: BCCDCNCWUHICFM-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4.5
• 重原子数：
  17
• 可旋转键数：
  8
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.62
• 拓扑面积：
  0
• 氢给体数：
  0
• 氢受体数：
  0

文献信息

• Resist lower-layer composition containing thermal acid generator, resist lower layer film-formed substrate, and patterning process
  申请人：Ohsawa Youichi

  公开号：US20100119970A1

  公开（公告）日：2010-05-13

  There is disclosed a resist lower-layer composition configured to be used by a multi-layer resist method used in lithography to form a layer lower than a photoresist layer acting as a resist upper layer film, wherein the resist lower-layer composition becomes insoluble or poorly-soluble in an alkaline developer after formation of the lower layer, and wherein the resist lower-layer composition comprises, at least, a thermal acid generator for generating an acid represented by the general formula (1) by heating at a temperature of 100° C. or higher. RCOO—CH 2 CF 2 SO 3 − H + (1) There can be provided a resist lower-layer composition in a multi-layer resist method (particularly, a two-layer resist method and a three-layer resist method), which composition is used to form a layer lower than a photoresist layer acting as a resist upper layer film, which composition becomes insoluble or poorly-soluble in an alkaline developer after formation of the lower layer, and which composition is capable of forming a resist lower layer film, intermediate-layered film, and the like having a higher anti-poisoning effect and exhibiting a lower load to the environment.

  揭示了一种抗性下层组合物，配置为在光刻中使用的多层抗性方法中使用，用于形成低于作为抗性上层膜的光刻胶层的一层，其中抗性下层组合物在形成下层后变得不溶解或难溶解于碱性显影剂中，且抗性下层组合物至少包括用于通过在100°C或更高温度下加热生成由通式（1）表示的酸的热酸发生剂。 可以提供一种抗性下层组合物，用于多层抗性方法（特别是双层抗性方法和三层抗性方法），该组合物用于形成低于作为抗性上层膜的光刻胶层的一层，该组合物在形成下层后变得不溶解或难溶解于碱性显影剂中，并且该组合物能够形成具有更高抗毒性效果并表现出对环境负荷较低的抗性下层膜、中间层膜等。
• [EN] LATENT ACIDS AND THEIR USE<br/>[FR] ACIDES LATENTS ET LEUR UTILISATION
  申请人：BASF SE

  公开号：WO2011104127A1

  公开（公告）日：2011-09-01

  The invention pertains to a compound generating an acid of the formula (I) or (II), for instance corresponding sulfonium and iodonium salts, as well as corresponding sulfonyloximes, Formula (I) and Formula (II), wherein X is CH2 or CO; Y is O, NR4, S, O(CO), O(CO)O, O(CO)NR4, OSO2, O(CS), or O(CS)NR4; R1 is for example C1-C18alkyl, C1-C10haloalkyl, C2-C12alkenyl, C4-C30cycloalkenyl, phenyl-C1-C3-alkyl, C3-C30cycloalkyl, C3-C30cycloalkyl-C1-C18alkyl, interrupted C2-C18alkyl, interrupted C3-C30cycloalkyl, interrupted C3-C30cycloalkyl-C1-C18alkyl, interrupted C4-C30cycloalkenyl, phenyl, naphthyl, anthracyl, phenanthryl, biphenylyl, fluorenyl or heteroaryl, all unsubstituted or are substituted; or R1 is NR12R13; R2 and R3 are for example C3-C30cycloalkylene, C3-C30cycloalkyl-C1-C18alkylene, C1-C18alkylene, C1-C10haloalkylene, C2-C12alkenylene, C4-C30cycloalkenylene, phenylene, naphthylene, anthracylene, phenanthrylene, biphenylene or heteroarylene; all unsubstituted or substituted; R4 is for example C3-C30cycloalkyl, C3-C30cycloalkyl-C1-C18alkyl, C1-C18alkyl, C1-C10haloalkyl, C2-C12alkenyl, C4-C30cycloalkenyl, phenyl-C1-C3-alkyl; R12 and R13 are for example C3-C30cycloalkyl, C3-C30cycloalkyl-C1-C18alkyl, C1-C18alkyl, C1-C10haloalkyl, C2-C12alkenyl, C4-C30cycloalkenyl, phenyl-C1-C3-alkyl, Ar, (CO)R15, (CO)OR15 or SO2R15; and Ar is phenyl, biphenylyl, fluorenyl, naphthyl, anthracyl, phenanthryl or heteroaryl, all unsubstituted or substituted.

  该发明涉及一种生成式(I)或(II)的酸的化合物，例如相应的砜和碘砜盐，以及相应的砜酮肟，式(I)和式(II)，其中X为CH2或CO；Y为O、NR4、S、O(CO)、O(CO)O、O(CO)NR4、OSO2、O(CS)或O(CS)NR4；R1例如为C1-C18烷基、C1-C10卤代烷基、C2-C12烯基、C4-C30环烯烃基、苯基-C1-C3-烷基、C3-C30环烷基、C3-C30环烷基-C1-C18烷基、中断的C2-C18烷基、中断的C3-C30环烷基、中断的C3-C30环烷基-C1-C18烷基、中断的C4-C30环烯烃基、苯基、萘基、蒽基、菲基、联苯基、芴基或杂环烯基，全部为未取代或取代；或R1为NR12R13；R2和R3例如为C3-C30环烷基、C3-C30环烷基-C1-C18烷基、C1-C18烷基、C1-C10卤代烷基、C2-C12烯基、C4-C30环烯烃基、苯基、萘基、蒽基、菲基、联苯基或杂环烯基；全部为未取代或取代；R4例如为C3-C30环烷基、C3-C30环烷基-C1-C18烷基、C1-C18烷基、C1-C10卤代烷基、C2-C12烯基、C4-C30环烯烃基、苯基-C1-C3-烷基；R12和R13例如为C3-C30环烷基、C3-C30环烷基-C1-C18烷基、C1-C18烷基、C1-C10卤代烷基、C2-C12烯基、C4-C30环烯烃基、苯基-C1-C3-烷基、Ar、(CO)R15、(CO)OR15或SO2R15；Ar为苯基、联苯基、芴基、萘基、蒽基、菲基或杂环烯基，全部为未取代或取代。
• IONIC LIQUID CONTAINING ALLYLSULFONATE ANION
  申请人：Watahiki Tsutomu

  公开号：US20120157680A1

  公开（公告）日：2012-06-21

  PROBLEM: Providing a novel ionic liquid, which is low-cost, environment-friendly, and has low viscosity and melting point. MEANS FOR SOLVING THE PROBLEM: The present invention is the invention of the ionic liquid represented by the general formula [1]: wherein, R 1 to R 3 and n pieces of R 4 each independently represent hydrogen atom or alkyl group having 1 to 4 carbon atoms, R 5 to R 7 each independently represent alkyl group, aralkyl group, or aryl group, R 8 represents alkyl group, aralkyl group, aryl group, or the one represented by the general formula [2]: (wherein T represents alkylene chain having 1 to 8 carbon atoms, n represents 1 or 2, and R 1 to R 7 are the same as the above-described), X represents nitrogen atom or phosphorus atom, n represents 1 or 2. When n is 1, R 3 and R 4 are bound and may form cyclohexene ring together with the adjacent carbon atoms. In addition, when X is nitrogen atom, R 5 to R 7 or R 5 to R 6 may form hetero ring with nitrogen atom binding thereto}.

  问题：提供一种新型离子液体，成本低、环保，并具有低粘度和熔点。 解决问题的方法：本发明是一种由通式[1]表示的离子液体的发明：其中，R1到R3和n个R4分别独立表示氢原子或具有1到4个碳原子的烷基基团，R5到R7分别独立表示烷基基团、芳基烷基基团或芳基基团，R8表示烷基基团、芳基烷基基团、芳基基团或由通式[2]表示的基团：（其中T表示具有1到8个碳原子的烷基链，n表示1或2，R1到R7与上述相同），X表示氮原子或磷原子，n表示1或2。当n为1时，R3和R4结合并且可能与相邻碳原子一起形成环己烯环。此外，当X为氮原子时，R5到R7或R5到R6可能与结合在一起的氮原子形成杂环}。
• [EN] NEW TELESCOPING SYNTHESES OF 2-METHOXYMETHYL-P-PHENYLENEDIAMINE<br/>[FR] NOUVELLES SYNTHÈSES TÉLESCOPIQUES DE 2-MÉTHOXYMÉTHYL-P-PHÉNYLÈNEDIAMINE
  申请人：COTY INC

  公开号：WO2021028506A1

  公开（公告）日：2021-02-18

  The invention relates to processes for preparing 2 -methoxymethyl-p-phenylenediamine (I), cosmetically acceptable salts thereof, or mixtures thereof.

  该发明涉及制备2-甲氧甲基-p-苯二胺（I）、其在化妆品中可接受的盐或其混合物的过程。
• CLEAR COAT FORMULATIONS FOR USE OVER NAIL POLISH
  申请人：Elementis Specialties, Inc.

  公开号：US20180353421A1

  公开（公告）日：2018-12-13

  A clear coating composition for use over nail polish. The clear coating composition comprises (a) a crosslinkable coating composition comprising: ingredient A that has at least two protons that can be activated to form a Michael carbanion donor; ingredient B that functions as a Michael acceptor having at least two ethylenically unsaturated functionalities each activated by an electron-withdrawing group; and a dormant carbamate initiator of Formula (1) wherein R 1 and R 2 can be independently selected from hydrogen, a linear or branched substituted or unsubstituted alkyl group having 1 to 22 carbon atoms; 1 to 8 carbon atoms; 1 to 3 carbon atoms; and A n+ is a cationic species or polymer and n is an integer equal or greater than 1 with the proviso that A n+ is not an acidic hydrogen; an ingredient D having one or more reactive protons that are more acidic than the two protons of ingredient A, with respect to pKa; at least one organic solvent; with the proviso that the clear coating composition is free of FD&C or D&C dyes, lakes or pigments. The clear coating composition optionally further comprising ammonium carbamate (H 2 NR 1 R 2 +− OC═ONR 1 R 2 ).

  一种用于在指甲油上使用的清漆组合物。该清漆组合物包括(a) 交联性涂层组合物，包括：成分A，其具有至少两个质子，可被激活形成Michael碳负离子给体；成分B，其作为Michael受体，具有至少两个由电子吸引基激活的烯丙基未饱和官能团；以及式（1）的休眠氨甲酸酯引发剂，其中R1和R2可以独立地选择为氢、具有1至22个碳原子的线性或支链取代或未取代的烷基基团；1至8个碳原子；1至3个碳原子；以及An+是阳离子物种或聚合物，n是大于等于1的整数，但An+不是酸性氢；成分D具有比成分A的两个质子更酸性的一个或多个反应性质子，相对于pKa；至少一种有机溶剂；前提是，该清漆组合物不含FD＆C或D＆C染料、颜料或颜料。该清漆组合物可以进一步包括氨甲酸铵（H2NR1R2 +−OC═ONR1R2）。

表征谱图