Cobalt imprinted polymer composition for selective removal of cobalt, process for preparation thereof, and process for removal of cobalt
申请人:Kulkarni Gopalkrishna Mohan
公开号:US20050070676A1
公开(公告)日:2005-03-31
The present invention provides a polymer composition for the selective removal of cobalt, a process for the preparation thereof and the process for removal of cobalt, using the said polymer composition. More particularly it relates to a cross-linked polymer composition prepared by the molecular imprinting technique. The preparation of the cross linked polymer involves selection of vinyl monomers bearing functional groups that bind to cobalt, formation of a complex of these monomers with cobalt and subsequent polymerization of the complex in presence of a crosslinker. The process for the removal of cobalt comprises treating the solution containing a mixture of cobalt and other metal ions with the polymer under conditions sufficient for cobalt to form a complex with the polymer and separating the polymer from the cobalt depleted solution.
本发明提供了一种用于选择性除钴的聚合物组合物、其制备工艺以及使用上述聚合物组合物的除钴工艺。本发明尤其涉及一种通过分子印迹技术制备的交联聚合物组合物。交联聚合物的制备包括选择带有与钴结合的官能团的乙烯基单体,形成这些单体与钴的络合物,然后在交联剂存在下使络合物聚合。除钴工艺包括在足以使钴与聚合物形成络合物的条件下,用聚合物处理含有钴和其他金属离子混合物的溶液,并将聚合物从去钴溶液中分离出来。