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N,N-bis(2-cyanoethyl)-2-methylbutanamide

中文名称
——
中文别名
——
英文名称
N,N-bis(2-cyanoethyl)-2-methylbutanamide
英文别名
——
N,N-bis(2-cyanoethyl)-2-methylbutanamide化学式
CAS
——
化学式
C11H17N3O
mdl
——
分子量
207.27
InChiKey
QGGXGZMUIGAXIX-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    0.5
  • 重原子数:
    15
  • 可旋转键数:
    6
  • 环数:
    0.0
  • sp3杂化的碳原子比例:
    0.73
  • 拓扑面积:
    67.9
  • 氢给体数:
    0
  • 氢受体数:
    3

文献信息

  • Method of manufacturing surface metal film material, surface metal film material, method of manufacturing patterned metal material, patterned metal material, and polymer layer-forming composition
    申请人:Nagasaki Hideo
    公开号:US20090155553A1
    公开(公告)日:2009-06-18
    The present invention provides a method of manufacturing capable of readily obtaining a surface metal film material that has excellent adhesiveness of a metal film, reduced variability of adhesion due to humidity changes and excellent heat resistance and flexibility, and a method of manufacturing capable of readily obtaining a patterned metal material excellent in insulation reliability of a region where a patterned metal is not formed, and excellent in heat resistance and flexibility. A method of manufacturing a surface metal film material includes: forming a polymer layer including a polymer that has a cyano group and that chemically bonds directly with a polyimide film, on the polyimide film; imparting a plating catalyst or a precursor thereof to the polymer layer; and performing a plating process on the plating catalyst or the precursor thereof, and a method of manufacturing a patterned metal material including etching a pattern in a plating film of a surface metal film material obtained according to the method of manufacturing a surface metal film material.
  • PHOTOSENSITIVE RESIN COMPOSITION, LAMINATE, METHOD OF PRODUCING METAL PLATED MATERIAL, METAL PLATED MATERIAL, METHOD OF PRODUCING METAL PATTERN MATERIAL, METAL PATTERN MATERIAL AND WIRING SUBSTRATE
    申请人:Nagasaki Hideo
    公开号:US20090266583A1
    公开(公告)日:2009-10-29
    The invention provides a photosensitive resin composition comprising: a polymer comprising a polymerizable group and a functional group that interacts with a plating catalyst or a precursor thereof so as to form a coordination bond; and at least one selected from the group consisting of a synthetic rubber, an epoxy acrylate monomer, and a polymerizable monomer having a benzyl alcohol group; a laminate; a method of producing a metal plated material; a metal plated material; a method of producing a metal pattern material; a metal pattern material; and a wiring substrate.
  • RESIN COMPLEX AND LAMINATE
    申请人:Satou Masataka
    公开号:US20120009385A1
    公开(公告)日:2012-01-12
    A resin complex which is capable of being plated, is highly hydrophobic, and has excellent molding properties and good adhesion to a plated layer, a laminate including a layer of the resin complex, and a method of manufacturing the laminate are provided. The resin complex capable of being plated includes a hydrophobic compound A having a functional group capable of interacting with a plating catalyst, its precursor or a metal, and a hydrophobic resin B incompatible with the hydrophobic compound A. The resin complex has a phase-separated morphology in which the hydrophobic compound A forms a dispersed phase and the hydrophobic resin B forms a continuous phase and the hydrophobic compound A is exposed on at least part of a surface of the resin complex.
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