4,4′-oxybis(benzoate)

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: 4,4′-oxybis(benzoate)
• 英文别名: [4-[4-(Dihydroxymethyl)phenoxy]phenyl]methanediol
• 化学式: C₁₄H₁₄O₅
• 分子量: 262.262
• InChiKey: USNJIZHEQRYIOL-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0.6
• 重原子数：
  19
• 可旋转键数：
  4
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.14
• 拓扑面积：
  90.2
• 氢给体数：
  4
• 氢受体数：
  5

反应信息

• 作为反应物：
  描述：

  N,N-二甲基乙酰胺 、 4,4′-oxybis(benzoate) 、 N,N,N′,N′-tetrakis(4-(4-pyridine)-phenyl)-biphenyl-4,4′-diamine 、 水 、 cadmium(II) nitrate 反应 72.0h， 以50%的产率得到{[Cd2(N,N,N′,N′-tetrakis(4-(4-pyridine)-phenyl)-biphenyl-4,4′-diamine )(4,4′-oxybis(benzoate)(-2H))2]·4DMA·8H2O}n
  参考文献：
  名称：

  具有选择性气体吸附和发光特性的互穿金属有机框架

  摘要：

  一种新的2倍互穿的镉金属有机框架{[Cd 2（TPPBDA）（OBA）2 ]·4DMA·8H 2 O} n（1）（Cd-MOF）（TPPBDA = N，N，N '，N通过以下方法合成了'-四（4-（4-吡啶）-苯基）联苯-4,4'-二胺，H 2 OBA = 4,4'-氧双（苯甲酸酯）和DMA = N，N-二甲基乙酰胺。溶剂热反应。化合物1是带有中螺旋链的3D网络。一个显着的结构特征是，在不同的介螺旋通道中，晶格DMA分子的排列方式不同。该材料表现出对CO 2，H 2和CH 4的气体吸附特性。使用基于Langmuir-Freundlich的双中心理想吸附溶液理论，通过单组分等温线计算了CO 2 / CH 4的吸附选择性。此外，研究了Cd-MOF在固态和悬浮在不同有机溶剂中的发光特性。

  DOI：

  10.1021/cg500269h

文献信息

• COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD, CIRCUIT PATTERN FORMATION METHOD AND METHOD FOR PURIFYING RESIN
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：US20200361843A1

  公开（公告）日：2020-11-19

  A compound represented by the following formula (1). (In the formula (1), A is a group containing a heteroatom; R 1 is a 2n-valent group having 1 to 30 carbon atoms and optionally having a substituent; R 2 to R 5 are each independently a linear, branched or cyclic alkyl group having 1 to 30 carbon atoms and optionally having a substituent, an aryl group having 6 to 30 carbon atoms and optionally having a substituent, an alkenyl group having 2 to 30 carbon atoms and optionally having a substituent, an alkynyl group having 2 to 30 carbon atoms and optionally having a substituent, an alkoxy group having 1 to 30 carbon atoms and optionally having a substituent, a halogen atom, a nitro group, an amino group, a carboxylic acid group, a crosslinkable group, a dissociation group, a thiol group or a hydroxy group, wherein the alkyl group, the aryl group, the alkenyl group and the alkoxy group each optionally contain an ether bond, a ketone bond or an ester bond and at least one R 4 and/or at least one R 5 is a hydroxy group and/or a thiol group; m 2 and m 3 are each independently an integer of 0 to 8; m 4 and m 5 are each independently an integer of 0 to 9; n is an integer of 1 to 4; and p 2 to p 5 are each independently an integer of 0 to 2.)

  以下是由以下式子（1）表示的化合物。（在式子（1）中，A是含有杂原子的基团；R1是具有1到30个碳原子并可选地具有取代基的2n价基团；R2至R5分别是线性，支链或环状烷基，具有1到30个碳原子并可选地具有取代基，具有6到30个碳原子并可选地具有取代基的芳基，具有2到30个碳原子并可选地具有取代基的烯基，具有2到30个碳原子并可选地具有取代基的炔基，具有1到30个碳原子并可选地具有取代基的烷氧基，卤素原子，硝基，氨基，羧酸基，交联基，解离基，硫醇基或羟基，其中烷基，芳基，烯基和烷氧基各自可选地包含醚键，酮键或酯键，并且至少有一个R4和/或至少有一个R5是羟基和/或硫醇基；m2和m3分别是0到8的整数；m4和m5分别是0到9的整数；n是1到4的整数；p2到p5分别是0到2的整数。）
• COMPOUND, RESIN, COMPOSITION, METHOD FOR FORMING RESIST PATTERN, METHOD FOR FORMING CIRCUIT PATTERN, AND METHOD FOR PURIFYING RESIN
  申请人：MITSUBISHI GAS CHEMICAL COMPANY, INC.

  公开号：EP3747857A1

  公开（公告）日：2020-12-09

  A compound represented by the following formula (1). (In the formula (1), A is a group containing a heteroatom; R1 is a 2n-valent group having 1 to 30 carbon atoms and optionally having a substituent; R2 to R5 are each independently a linear, branched or cyclic alkyl group having 1 to 30 carbon atoms and optionally having a substituent, an aryl group having 6 to 30 carbon atoms and optionally having a substituent, an alkenyl group having 2 to 30 carbon atoms and optionally having a substituent, an alkynyl group having 2 to 30 carbon atoms and optionally having a substituent, an alkoxy group having 1 to 30 carbon atoms and optionally having a substituent, a halogen atom, a nitro group, an amino group, a carboxylic acid group, a crosslinkable group, a dissociation group, a thiol group or a hydroxy group, wherein the alkyl group, the aryl group, the alkenyl group and the alkoxy group each optionally contain an ether bond, a ketone bond or an ester bond and at least one R4 and/or at least one R5 is a hydroxy group and/or a thiol group; m2 and m3 are each independently an integer of 0 to 8; m4 and m5 are each independently an integer of 0 to 9; n is an integer of 1 to 4; and p2 to p5 are each independently an integer of 0 to 2.)

  下式(1)所代表的化合物。 (在式 (1) 中，A 是含有一个杂原子的基团；R1 是具有 1 至 30 个碳原子并可选择具有一个取代基的 2n 价基团；R2 至 R5 各自独立地为具有 1 至 30 个碳原子且可选具有取代基的直链、支链或环状烷基、具有 6 至 30 个碳原子且可选具有取代基的芳基、具有 2 至 30 个碳原子且可选具有取代基的烯基、具有 2 至 30 个碳原子且可选具有取代基的炔基、具有 1 至 30 个碳原子且可选具有取代基的烷氧基、卤素原子、硝基、氨基、羧基、可交联基团、离解基团、硫醇基团或羟基，其中烷基、芳基、烯基和烷氧基各自可选择含有醚键、酮键或酯键，且至少一个 R4 和/或至少一个 R5 是羟基和/或硫醇基团；m2和m3各自独立地为0至8的整数；m4和m5各自独立地为0至9的整数；n为1至4的整数；p2至p5各自独立地为0至2的整数。)
• UNDERLAYER FILM-FORMING COMPOSITION
  申请人：MITSUBISHI GAS CHEMICAL COMPANY, INC.

  公开号：EP3832390A1

  公开（公告）日：2021-06-09

  An object of the present invention is to provide a useful underlayer film forming composition. The following underlayer film forming composition can solve the problem described above. An underlayer film forming composition comprising: a compound having a constituent unit represented by the following formula (1); and a solvent, wherein the weight average molecular weight of the compound is 1,000 to 30,000 as the molecular weight in terms of polystyrene, and the solubility of the compound in propylene glycol monomethyl ether acetate is 10% by mass at 23°C: wherein A is a single bond or a divalent group; each R1 is independently a linear, branched, or cyclic alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, an alkynyl group having 2 to 10 carbon atoms, a thiol group, or a hydroxy group; each R2 is independently a linear, branched, or cyclic alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, an alkynyl group having 2 to 10 carbon atoms, a thiol group, or a hydroxy group, where at least one R2 is a hydroxy group and/or a thiol group; each m1 is independently an integer of 0 to 5; each m2 is independently an integer of 0 to 8; and each p2 is independently an integer of 0 to 2.

  本发明的目的是提供一种有用的底层成膜组合物。下述底层成膜组合物可以解决上述问题。一种底层成膜组合物包括： 具有下式（1）代表的组成单元的化合物；和溶剂，其中 以聚苯乙烯的分子量计，该化合物的重量平均分子量为 1 000 至 30 000，以及 23°C 时，化合物在丙二醇单甲醚醋酸酯中的溶解度为 10%（质量分数）： 其中 A 是单键或二价基团； 每个 R1 独立地是具有 1 至 10 个碳原子的直链、支链或环状烷基、具有 6 至 10 个碳原子的芳基、具有 2 至 10 个碳原子的烯基、具有 2 至 10 个碳原子的炔基、硫醇基或羟基； 每个 R2 独立地是具有 1 至 10 个碳原子的直链、支链或环状烷基、具有 6 至 10 个碳原子的芳基、具有 2 至 10 个碳原子的烯基、具有 2 至 10 个碳原子的炔基、硫醇基或羟基、 其中至少一个 R2 是羟基和/或硫醇基； 每个 m1 独立地为 0 至 5 的整数； 每个 m2 独立地为 0 至 8 的整数；以及 每个 p2 独立地为 0 至 2 的整数。
• NOVEL BI- AND TRI-CYCLIC AZA COMPOUNDS AND THEIR USES
  申请人：Georgetown University

  公开号：EP1102751A1

  公开（公告）日：2001-05-30
• EP1102751A4
  申请人：——

  公开号：EP1102751A4

  公开（公告）日：2005-06-22