申请人:SHIN-ETSU CHEMICAL CO., LTD.
公开号:US10509314B2
公开(公告)日:2019-12-17
A resist composition comprising a base polymer and a sulfonium or iodonium salt of sulfonic acid containing a cyclic hydrocarbon-substituted amino group offers dimensional stability on PPD and a satisfactory resolution.
一种抗蚀剂组合物由基质聚合物和磺酸的锍盐或碘盐组成,磺酸含有环烃取代的氨基,在 PPD 上具有尺寸稳定性和令人满意的分辨率。