mesityl 4-bromophenyl sulfone | 137687-23-1

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: mesityl 4-bromophenyl sulfone
• 英文别名: Benzene, 2-[(4-bromophenyl)sulfonyl]-1,3,5-trimethyl-；2-(4-bromophenyl)sulfonyl-1,3,5-trimethylbenzene
• CAS: 137687-23-1
• 化学式: C₁₅H₁₅BrO₂S
• 分子量: 339.253
• InChiKey: IQKFJOHRBZISLE-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4.4
• 重原子数：
  19
• 可旋转键数：
  2
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.2
• 拓扑面积：
  42.5
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为产物：
  描述：

  4-溴苯磺酰氯 、 均三甲苯 在 三氯化铝 作用下， 以 various solvent(s) 为溶剂， 以85%的产率得到mesityl 4-bromophenyl sulfone
  参考文献：
  名称：

  Bulgarevich, S. B.; Movshovich, D. Ya.; Ivanova, N. A., Russian Journal of General Chemistry, 1993, vol. 63, # 3.1, p. 379 - 387

  摘要：

  DOI：

文献信息

• Conformational investigation of diarylsulphones by Kerr effect and dipole moment methods
  作者：S.B. Bulgarevich、D.Ya. Movshovich、N.A. Ivanova、S.E. Filippov、P. Finocchiaro、S. Failla

  DOI：10.1016/0022-2860(91)85080-m

  日期：1991.9

  Molar Kerr constants and electric dipole moments are reported for (C6H5)2SO2, (4-Cl-C6H4) (C6H5)SO2, (2,4,6-Me3C6H2) (4'-BrC6H4)SO2, (4-NO2C6H4)2SO2, (4-MeOC6H4) (4'-NO2C6H4)SO2, (2-MeOC6H4) (4'-NO2C6H4)SO2, (2-NO2C6H4) (4'-MeOC6H4)SO2 and (2-MeOC6H4) (2'-NO2C6H4)SO2 as solutes in dioxane solution at 298 K. The data are analysed in terms of the preferred conformations adopted in solution. In most cases these data are consistent with the presence, in dioxane, of orthogonal or planar-orthogonal conformers, or of a mixture of them. In the orthogonal rotamer both aromatic rings are approximately perpendicular to the C(Ar-) S-C(Ar) molecular reference plane whereas in the planar-orthogonal conformer one ring is coplanar and the other is orthogonal to the reference C(Ar)-S-C(Ar) plane.
• [EN] ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM, METHOD OF FORMING PATTERN USING THE COMPOSITION, PROCESS FOR MANUFACTURING ELECTRONIC DEVICE AND ELECTRONIC DEVICE<br/>[FR] COMPOSITION DE RÉSINE SENSIBLE À UN RAYONNEMENT ACTINIQUE OU AUX RAYONS ACTINIQUES, FILM SENSIBLE À UN RAYONNEMENT ACTINIQUE OU AUX RAYONS ACTINIQUES RÉALISÉ À PARTIR DE CETTE DERNIÈRE, PROCÉDÉ DE FORMATION D'UN MOTIF UTILISANT LA COMPOSITION, PROCÉDÉ DE FABRICATION D'UN DISPOSITIF ÉLECTRONIQUE ET DISPOSITIF ÉLECTRONIQUE
  申请人：FUJIFILM CORP

  公开号：WO2013047911A1

  公开（公告）日：2013-04-04

  Provided is an actinic-ray- or radiation-sensitive resin composition, including any of compounds of general formula (1) below that when exposed to actinic rays or radiation, is decomposed to thereby generate an acid and a resin that when acted on by an acid, is decomposed to thereby increase its solubility in an alkali developer.
• Bulgarevich, S. B.; Movshovich, D. Ya.; Ivanova, N. A., Russian Journal of General Chemistry, 1993, vol. 63, # 3.1, p. 379 - 387
  作者：Bulgarevich, S. B.、Movshovich, D. Ya.、Ivanova, N. A.、Filippov, S. E.、Finocchiaro, P.、Failla, S.

  DOI：——

  日期：——