1-[1-(3-Methoxyphenyl)ethyl]piperazine | 517856-21-2

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯酚醚
• 英文名称: 1-[1-(3-Methoxyphenyl)ethyl]piperazine
• CAS: 517856-21-2
• 化学式: C₁₃H₂₀N₂O
• mdl: MFCD05187338
• 分子量: 220.31
• InChiKey: WQVUGNKAOOHKAL-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.5
• 重原子数：
  16
• 可旋转键数：
  3
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.538
• 拓扑面积：
  24.5
• 氢给体数：
  1
• 氢受体数：
  3

文献信息

• Pyrazolo[3,4-b]pyridine compounds, and their use as a PDE4 inhibitors
  申请人：Edlin Christopher David

  公开号：US20090131431A1

  公开（公告）日：2009-05-21

  The invention provides a compound of formula (I) or a salt thereof: wherein R 2 is H, C 1-3 alkyl, n-butyl, C 1-2 fluoroalkyl, cyclopropyl, cyclobutyl, (cyclopropyl)methyl-, —CN, or —CH 2 OH; R 3 is inter alia optionally substituted C 4-7 cycloalkyl or an optionally substituted heterocyclic group (aa), (bb) or (cc); R a is H, methyl or ethyl; R b is H or methyl; R 4 is H, methyl, ethyl, n-propyl, —C(O)-Me, or —C(O)—C 1 fluoroalkyl; and R 5 is: —C(O)—(CH 2 ) n —Ar, —C(O)-Het, —C(O)—C 1-6 alkyl, —C(O)—C 1 fluoroalkyl, —C(O)—(CH 2 ) 2 —C(O)—NR 15b NR 15b , —C(O)—CH 2 —C(O)—NR 15b NR 15b , —C(O)—NR 15b —(CH 2 )m 1 —Ar, —C(O)—NR 15b —Het, —C(O)—NR 15b —C 1-6 alkyl, —C(O)—NR 5a R 5b , —S(O) 2 —(CH 2 ) m 2 —Ar, —S(O) 2 -Het, —S(O) 2 —C 1-6 alkyl, or —CH 2 —Ar; or R 4 and R 5 taken together are —(CH 2 ) p 1 —, —(CH 2 ) 2 —X 5 —(CH 2 ) 2 —, —C(O)—(CH 2 ) p 2 —, —C(O)—N(R 15 )—(CH 2 ) p 3 —; or NR 4 R 5 is of sub-formula (y), (y1), (y2) or (y3). The invention provides the use of the compounds as inhibitors of phosphodiesterase type IV (PDE4) and/or for the treatment and/or prophylaxis of inflammatory and/or allergic diseases such as COPD and the like.

  该发明提供了化合物的结构式(I)或其盐：其中R2为H、C1-3烷基、正丁基、C1-2氟烷基、环丙基、环丁基、(环丙基)甲基、—CN或— OH；R3为可选择地取代的C4-7环烷基或可选择地取代的杂环基(aa)、(bb)或(cc)；R为H、甲基或乙基；R为H或甲基；R为H、甲基、乙基、正丙基、—C(O)-甲基或—C(O)—C1氟烷基；以及R为：—C(O)—(CH2)n—Ar、—C(O)-Het、—C(O)—C1-6烷基、—C(O)—C1氟烷基、—C(O)—( )2—C(O)—NR15bNR15b、—C(O)— —C(O)—NR15bNR15b、—C(O)—NR15b—( )m1—Ar、—C(O)—NR15b—Het、—C(O)—NR15b—C1-6烷基、—C(O)—NR5aR5b、—S(O)2—( )m2—Ar、—S(O)2-Het、—S(O)2—C1-6烷基或— —Ar；或R和R5一起为—( )p1—、—( )2—X5—( )2—、—C(O)—( )p2—、—C(O)—N(R15)—( )p3—；或NR4R5为子式(y)、(y1)、(y2)或(y3)。该发明提供了这些化合物作为磷酸二酯酶IV型(PDE4)的抑制剂以及用于治疗和/或预防炎症和/或过敏性疾病，如慢性阻塞性肺病(COPD)等的用途。
• Chemical mechanical planarization for tungsten-containing substrates
  申请人：AIR PRODUCTS AND CHEMICALS, INC.

  公开号：EP2779217A2

  公开（公告）日：2014-09-17

  Chemical mechanical polishing (CMP) compositions for polishing tungsten or tungsten-containing substrates comprise an abrasive, at least one solid catalyst, a chemical additive selected from the groups consisting of piperazine derivatives, salts of cyanate, and combinations thereof; and a liquid carrier. Systems and processes use the aqueous formulations for polishing tungsten or tungsten-containing substrates.

  用于抛光钨或含钨基材的化学机械抛光（CMP）组合物包括磨料、至少一种固体催化剂、一种选自哌嗪衍生物、氰酸盐及其组合的化学添加剂；以及一种液体载体。系统和工艺使用水性制剂抛光钨或含钨基材。
• US20140273458A1
  申请人：——

  公开号：US20140273458A1

  公开（公告）日：2014-09-18