SHVO, Y.;ABED, M.;BLUM, Y.;LAINE, R. M., ISR. J. CHEM., 27,(1986) N 3, 267-275
作者:SHVO, Y.、ABED, M.、BLUM, Y.、LAINE, R. M.
DOI:——
日期:——
PHOTORESIST COMPOSITION
申请人:Matsuoka Hiroshi
公开号:US20090035696A1
公开(公告)日:2009-02-05
Disclosed are a photoresist composition characterized by containing a polymer (A) containing a carboxyl group or a hydroxyl group, a polyfunctional alkenyl ether (B) represented by the general formula (I) below, and a photoacid generator (C) and the like. (In the formula, R
1
and R
2
may be the same as or different from each other and respectively represent a substituted or unsubstituted alkyl, a substituted or unsubstituted allyl, or a substituted or unsubstituted aralkyl, or alternatively R
1
and R
2
may form a substituted or unsubstituted alicyclic hydrocarbon ring together with an adjacent carbon atom; X represents a substituted or unsubstituted alkane from which n hydrogen atoms are removed; and n represents an integer of not less than 2.)
Ruthenium-catalyzed direct amination of alcohols with tertiary amines
作者:Jiaying Luo、Mingyue Wu、Fuhong Xiao、Guojun Deng
DOI:10.1016/j.tetlet.2011.03.084
日期:2011.5
A highly selective phosphine-based ruthenium catalyst system efficiently catalyzes the direct amination of alcohols with aliphatic tertiary amines, yielding unsymmetric tertiary amines in yields up to 87%. Ligand and solvent both affect the reaction yields significantly. The reaction can be performed with a wide variety of functionalities.