N-Butyl-N-phenylglycin | 21911-64-8

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: N-Butyl-N-phenylglycin
• 英文别名: 2-(N-Butylanilino)-essigsaeure；n-Butyl-n-phenylglycine；2-(N-butylanilino)acetic acid
• CAS: 21911-64-8
• 化学式: C₁₂H₁₇NO₂
• 分子量: 207.272
• InChiKey: SYFNFQXVWFOEAA-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.9
• 重原子数：
  15
• 可旋转键数：
  6
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.42
• 拓扑面积：
  40.5
• 氢给体数：
  1
• 氢受体数：
  3

反应信息

• 作为反应物：
  描述：

  N-Butyl-N-phenylglycin 、 方酸 在 orthoformate 作用下， 以 异丙醇 为溶剂， 反应 2.0h， 生成 [Butyl-(4-{3-[4-(butyl-carboxymethyl-amino)-phenyl]-2,4-dioxo-cyclobutyl}-phenyl)-amino]-acetic acid
  参考文献：
  名称：

  用于太阳能电池有效远红外和近红外敏化的方酸染料的分子设计

  摘要：

  将短羧基锚定基团引入苯胺基方酸导致纳米晶 TiO2 电极在远红/近红外区域的光敏化大大提高，产生...

  DOI：

  10.1246/cl.2005.554

文献信息

• Photoinitiator and photopolymerizable composition using the same
  申请人：Hitachi Chemical Co., Ltd.

  公开号：EP0295044A2

  公开（公告）日：1988-12-14

  A photoinitiator composition comprising (1) an aminobenzylidene carbonyl compound and (2) an N-­aryl-α-amino acid is suitable for use in a photo­polymerizable composition comprising (a) an addition-­polymerizable compound having a boiling point of 100°C or higher at an atmospheric pressure and (b) said photoinitiator composition.

  由(1)亚氨基苄基羰基化合物和(2)N-芳基-α-氨基酸组成的光引发剂组合物适用于光聚合组合物，该组合物包括(a)在大气压下沸点为 100°C 或更高的可加成聚合的化合物和(b)所述光引发剂组合物。
• Process for the preparation of clavulanic acid
  申请人：SMITHKLINE BEECHAM PLC

  公开号：EP0672670A1

  公开（公告）日：1995-09-20

  A process for the preparation and/or purification of clavulanic acid or a pharmaceutically acceptable salt or ester thereof comprises i) contacting impure clavulanic acid or an alkali metal salt thereof in an organic solvent, with an amine of formula (II) where R¹ is a group of general formula where R⁴ and R⁵ are independently hydrogen, alkyl, amino-substituted alkyl or substituted amino-substituted alkyl, and R² and R³ are independently selected from hydrogen, alkyl, amino- or hydroxy-substituted alkyl or substituted amino-substituted alkyl, and m is zero or an integer 1 to 5; ii) isolating the amine salt of clavulanic acid formed; iii) converting the thus formed salt into clavulanic acid or a pharmaceutically acceptable salt or ester thereof.

  制备和/或纯化克拉维酸或其药学上可接受的盐或酯的工艺包括 i) 将有机溶剂中的不纯克拉维酸或其碱金属盐与式 (II) 的胺接触 其中 R¹ 为通式基团 其中 R⁴ 和 R⁵ 独立地为氢、烷基、氨基取代的烷基或取代的氨基取代的烷基，且 R² 和 R³ 独立地选自氢、烷基、氨基或羟基取代的烷基或取代的氨基取代的烷基，且 m 为零或 1 至 5 的整数； ii) 分离所形成的克拉维酸胺盐； iii) 将由此形成的盐转化为克拉维酸或其药学上可接受的盐或酯。
• Polyamine salts of clavulanic acid
  申请人：SMITHKLINE BEECHAM PLC

  公开号：EP0747383A2

  公开（公告）日：1996-12-11

  A process for the preparation of clavulanic acid or its pharmaceutically acceptable salts and esters in which an amine of formula (II): is used as an intermediate to form a salt with clavulanic acid, R1, R2 and R3 being selected from various substituent atoms and groups.

  一种制备克拉维酸或其药学上可接受的盐和酯的工艺，其中式 (II)： 作为中间体与克拉维酸形成盐，R1、R2 和 R3 选自各种取代原子和基团。
• PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT COMPRISING THE SAME, METHOD FOR PRODUCING RESIST PATTERN, AND METHOD FOR PRODUCING PRINTED WIRING BOARD
  申请人：Hitachi Chemical Company, Ltd.

  公开号：EP1282010A1

  公开（公告）日：2003-02-05

  The present invention provides a photosensitive resin composition for laser scanning exposure, which satisfies the following formula (1):-25≦ E1-E0E0 × 100 ≦ 25 wherein E0 represents an exposure amount in mJ/cm2 at which the photosensitive resin composition is cured at the 21st step of the density 1.00 of a 41-step step tablet having a density range from 0.00 to 2.00, a density step of 0.05, a tablet size of 20 mm × 187 mm and a step size of 3 mm × 12 mm, by irradiation with a full wavelength active light of a high pressure mercury lamp and E1 represents an exposure amount in mJ/cm2 at which the photosensitive resin composition after being left for 2 hours under 40 W non-ultraviolet white lamp is cured at the 21st step of the 41-step step tablet by irradiation with a full wavelength active light from a high pressure mercury lamp.

  本发明提供了一种用于激光扫描曝光的光敏树脂组合物，它满足下式(1)：-25≦ E1-E0E0 × 100 ≦ 25 其中，E0表示光敏树脂组合物在密度范围为0.00至2.00、密度步长为0.E1 表示光敏树脂组合物在 40 W 非紫外线白光灯下放置 2 小时后，通过高压汞灯的全波长有效光照射，在 41 步片剂的第 21 步固化时的曝光量，单位为 mJ/cm2。
• Photosensitive resin composition, photosensitive element using the same, method for producing resist pattern and method for producing printed wiring board
  申请人：Hitachi Chemical Company, Ltd.

  公开号：EP2172806A2

  公开（公告）日：2010-04-07

  The present invention provides a photosensitive resin composition for laser scanning exposure, which satisfies the following formula (1): -25≦E1-E0E0×100≦25 wherein E0 represents an exposure amount in mJ/cm2 at which the photosensitive resin composition is cured at the 21st step of the density 1.00 of a 41-step step tablet having a density range from 0.00 to 2.00, a density step of 0.05, a tablet size of 20 mm × 187 mm and a step size of 3 mm × 12 mm, by irradiation with a full wavelength active light of a high pressure mercury lamp and E1 represents an exposure amount in mJ/cm2 at which the photosensitive resin composition after being left for 2 hours under 40 W non-ultraviolet white lamp is cured at the 21st step of the 41-step step tablet by irradiation with a full wavelength active light from a high pressure mercury lamp.

  本发明提供了一种用于激光扫描曝光的光敏树脂组合物，其满足下式(1)：-25≦E1-E0E0×100≦25 其中 E0 表示光敏树脂组合物在密度范围为 0.00 至 2.00 的 41 步压片密度 1.00 的第 21 步时固化的曝光量（单位：mJ/cm2），密度步长为 0.E1 表示光敏树脂组合物在 40 W 非紫外线白光灯下放置 2 小时后，通过高压汞灯的全波长有效光照射，在 41 步片剂的第 21 步固化时的曝光量，单位为 mJ/cm2。