N-benzyl-N,N-dimethylanilinium tosylate | 121180-84-5

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: N-benzyl-N,N-dimethylanilinium tosylate
• 英文别名: benzyl-dimethyl-phenylazanium;4-methylbenzenesulfonate
• CAS: 121180-84-5
• 化学式: C₇H₇O₃S*C₁₅H₁₈N
• 分子量: 383.511
• InChiKey: KICRTDCSSGPLKR-UHFFFAOYSA-M

计算性质

• 辛醇/水分配系数(LogP)：
  4.35
• 重原子数：
  27
• 可旋转键数：
  3
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.18
• 拓扑面积：
  65.6
• 氢给体数：
  0
• 氢受体数：
  3

反应信息

• 作为产物：
  描述：

  4-甲基苯磺酸苯基甲基酯 、 N,N-二甲基苯胺 以 丙酮 为溶剂， 反应 24.0h， 以91%的产率得到N-benzyl-N,N-dimethylanilinium tosylate
  参考文献：
  名称：

  Yoh, Soo-Dong; Tsuno, Yuho; Fujio, Mizue, Journal of the Chemical Society. Perkin transactions II, 1989, p. 7 - 14

  摘要：

  DOI：

文献信息

• Method for the synthesis of quaternary ammonium salts
  申请人：Nippon Paint Co., Ltd.

  公开号：US05349067A1

  公开（公告）日：1994-09-20

  Provided is a convenient method for the synthesis of quaternary ammonium sulfonate compounds which are useful as curing catalysts for one-part thermosetting resin compositions which maintain storage stability at room temperature. The compounds are synthesized by subjecting in one step a benzyl alcohol optionally having on the benzene ring and/or the .alpha.-position one or more substituent groups to reaction with a corresponding tertiary amine and an organic sulfonic acid chloride.

  提供了一种方便的方法，用于合成季铵磺酸盐化合物，这些化合物可用作一部分热固性树脂组合物的固化催化剂，在室温下保持储存稳定性。该化合物通过将苄醇（苯环和/或α-位置上可选地具有一个或多个取代基）与相应的三级胺和有机磺酸氯在一步反应中进行反应而合成。
• COMPOSITION HAVING REFRACTIVE INDEX SENSITIVELY CHANGEABLE BY RADIATION AND METHOD FOR FORMING REFRACTIVE INDEX PATTERN
  申请人：JSR Corporation

  公开号：EP1235104A1

  公开（公告）日：2002-08-28

  A radiation sensitive refractive index changing composition comprising (A) a decomposable compound, (B) a non-decomposable compound having a lower refractive index than the decomposable compound (A), (C) a radiation sensitive decomposer and (D) a stabilizer. By exposing the composition to radiation through a pattern mask, the above components (C) and (A) of an exposed portion are decomposed and a refractive index difference is made between the exposed portion and unexposed portion, thereby forming a pattern having different refractive indices.

  一种对辐射敏感的折射率变化组合物，包括：（A）可分解化合物；（B）折射率低于可分解化合物（A）的不可分解化合物；（C）对辐射敏感的分解剂；以及（D）稳定剂。通过图案掩膜将组合物暴露在辐射下，暴露部分的上述成分（C）和（A）被分解，暴露部分和未暴露部分之间产生折射率差，从而形成具有不同折射率的图案。
• Radiation sensitive refractive index changing composition and refractive index changing method
  申请人：JSR Corporation

  公开号：EP1323742A2

  公开（公告）日：2003-07-02

  A radiation sensitive refractive index changing composition whose refractive index of a material is changed by a simple method, whose changed refractive index difference is sufficiently large, and which can provide a stable refractive index pattern and a stable optical material regardless of their use conditions. The radiation sensitive refractive index changing composition comprises (A) a polymerizable compound, (B) a non-polymerizable compound having a lower refractive index than the polymer of the polymerizable compound (A), and (C) a radiation sensitive polymerization initiator.

  一种辐射敏感折射率改变组合物，其材料的折射率可通过简单的方法改变，改变后的折射率差足够大，并且无论使用条件如何，都能提供稳定的折射率图案和稳定的光学材料。 辐射敏感折射率变化组合物包括：(A) 可聚合化合物；(B) 折射率低于可聚合化合物 (A) 聚合物的不可聚合化合物；(C) 辐射敏感聚合引发剂。
• RADIATION-SENSITIVE COMPOSITION CHANGING IN REFRACTIVE INDEX AND METHOD OF CHANGING REFRACTIVE INDEX
  申请人：JSR Corporation

  公开号：EP1350814A1

  公开（公告）日：2003-10-08

  A radiation sensitive refractive index changing composition comprising (A) a decomposable compound, (B) a non-decomposable compound having a higher refractive index than the decomposable compound (A), (C) a radiation sensitive decomposer and (D) astabilizer. By exposing this composition to radiation through a pattern mask, the above components (C) and (A) of an exposed portion decompose to create a refractive index difference between the exposed portion and an unexposed portion, thereby forming a pattern having different refractive indices.

  一种对辐射敏感的折射率变化组合物，包括：(A) 可分解化合物；(B) 折射率高于可分解化合物(A)的不可分解化合物；(C) 对辐射敏感的分解剂；(D) 稳定剂。通过图案掩膜将这种组合物暴露在辐射下，暴露部分的上述成分（C）和（A）分解，在暴露部分和未暴露部分之间产生折射率差，从而形成具有不同折射率的图案。
• RADIATION-SENSITIVE COMPOSITION CAPABLE OF HAVING REFRACTIVE INDEX DISTRIBUTION
  申请人：JSR Corporation

  公开号：EP1369459A1

  公开（公告）日：2003-12-10

  A method of forming a refractive index pattern or an optical material stable regardless of use conditions, which provides a sufficiently large change in refractive index by a simple method. The refractive index pattern or optical material is formed by exposing a refractive index changing composition which comprises (A) a decomposable compound, (B) a non-decomposable compound containing inorganic oxide particles and (C) a radiation sensitive decomposer to radiation and then treating it with (D) a stabilizer.

  一种形成折射率图案或光学材料的方法，无论使用条件如何，它都能保持稳定，并能通过简单的方法提供足够大的折射率变化。 折射率图案或光学材料的形成方法是：将由 (A) 可分解化合物、(B) 含无机氧化物颗粒的不可分解化合物和 (C) 辐射敏感分解物组成的折射率变化组合物暴露于辐射中，然后用 (D) 稳定剂处理。