5-sec-butyl-2-hydroxybenzoic acid | 16094-29-4

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: 5-sec-butyl-2-hydroxybenzoic acid
• 英文别名: 5-sec.-Butylsalicylsaeure；5-sec-butylsalicylic acid；5-(Butan-2-yl)-2-hydroxybenzoic acid；5-butan-2-yl-2-hydroxybenzoic acid
• CAS: 16094-29-4
• 化学式: C₁₁H₁₄O₃
• 分子量: 194.23
• InChiKey: WJWGOUKTYBNQCE-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4.1
• 重原子数：
  14
• 可旋转键数：
  3
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.36
• 拓扑面积：
  57.5
• 氢给体数：
  2
• 氢受体数：
  3

反应信息

• 作为反应物：
  描述：

  5-sec-butyl-2-hydroxybenzoic acid 、 聚合甲醛 、 硫酸 以62%的产率得到
  参考文献：
  名称：

  VESELOVA L. N.; NEMIROVSKIJ V. D.; KOZLOVA L. M.; PONE D. A.; IRGEN L. A., IZV. A LATVSSR, CEP. XIM., 1986, N 6, 742-745

  摘要：

  DOI：
• 作为产物：
  描述：

  2-hydroxy-5-(2-butyl)benzaldehyde 、 2-羟基-5-(三氟甲基)苯甲醛 以to give 5-sec-butyl-2-hydroxybenzoic acid as an orangish-yellow semi-solid的产率得到5-sec-butyl-2-hydroxybenzoic acid
  参考文献：
  名称：

  COMPOUNDS USEFUL FOR THE TREATMENT OF METABOLIC DISORDERS AND SYNTHESIS OF THE SAME

  摘要：

  本发明提供了一些式子为(I)的化合物：其中变量X、Y、Z和R1如本文所述。其中一些化合物是谷氨酸脱氢酶激活剂。本发明还涉及包含这些化合物的药物组合物，以及这些化合物和组合物在治疗代谢性疾病方面的用途以及化合物的合成。

  公开号：

  US20160046560A1

文献信息

• [EN] COMPOUNDS USEFUL FOR THE TREATMENT OF METABOLIC DISORDERS AND SYNTHESIS OF THE SAME<br/>[FR] COMPOSÉS UTILES DANS LE TRAITEMENT DE TROUBLES MÉTABOLIQUES ET LEUR SYNTHÈSE
  申请人：UNIV NORTH CAROLINA

  公开号：WO2014165816A1

  公开（公告）日：2014-10-09

  The present invention provides compounds of Formula (I): wherein variables X, Y, Z and R1 are as described herein. Some of the compounds described herein are glutamate dehydrogenase activators. The invention is also directed to pharmaceutical compositions comprising these compounds, uses of these compounds and compositions in the treatment of metabolic disorders as well as synthesis of the compounds.

  本发明提供了式(I)化合物：其中变量X、Y、Z和R1如本文所述。本文所述的一些化合物是谷氨酸脱氢酶激活剂。本发明还涉及包含这些化合物的药物组合物、这些化合物和组合物在治疗代谢紊乱中的用途以及这些化合物的合成。
• ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MASK BLANK PROVIDED WITH ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, ELECTRONIC DEVICE, AND COMPOUND
  申请人：FUJIFILM Corporation

  公开号：US20160280675A1

  公开（公告）日：2016-09-29

  The actinic ray-sensitive or radiation-sensitive resin composition includes a crosslinking agent having a polarity converting group and an alkali-soluble resin, in which the polarity converting group is a group capable of decomposing by the action of an alkaline aqueous solution to generate a carboxylic acid or sulfonic acid on the side having a crosslinking group.

  感光树脂或辐射敏感树脂组合物包括具有极性转换基团和可溶于碱性树脂的交联剂，其中极性转换基团是一种能够通过碱性水溶液作用分解并在具有交联基团的侧面生成羧酸或磺酸的基团。
• Color developer for pressure-sensitive recording paper
  申请人：Sumitomo Durez Company, Ltd.

  公开号：US05034370A1

  公开（公告）日：1991-07-23

  A color developer for pressure-sensitive recording paper is produced by admising components comprising: (A) 100 parts by weight of a polyvalent metal salt of a co-condensation product of a substituted salicylic acid, an aromatic hydrocarbon and an aldehyde. Such a co-condensation product is obtained by reacting: (a) a substituted salicylic acid, (b) one or more aromatic hydrocarbons having 4 to 9 carbon atoms, and (c) an aldehyde of 1 to 8 carbon atoms, in the presence of an acidic catalyst; and (B) 5 to 200 parts by weight of one or more members selected from the group consisting of petroleum resins, terpene resins, modified terpene resins, coumaarone resins and modified coumarone resins. The color developer is excellent in color density, resistance to yellow staining, fastness to light of color images and resistance to fading in water of color images, and in addition is capable of forming color images at a markedly increased speed.

  一种用于压敏记录纸的色素显影剂，由以下组分制备而成：（A）100份重量的多价金属盐，其为取代水杨酸、芳香族碳氢化合物和醛的共缩聚产物。这样的共缩聚产物是通过在酸性催化剂存在下反应以下物质得到的：（a）取代水杨酸，（b）一个或多个具有4至9个碳原子的芳香族碳氢化合物，和（c）1至8个碳原子的醛；以及（B）5至200份重量的石油树脂、萜烯树脂、改性萜烯树脂、香豆素树脂和改性香豆素树脂中的一种或多种。该色素显影剂具有优异的色密度、抗黄染性、彩色图像的耐光性和彩色图像在水中的耐褪色性，并且能够以明显增加的速度形成彩色图像。
• ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, AND RESIST FILM, RESIST-COATED MASK BLANKS, RESIST PATTERN FORMING METHOD AND PHOTOMASK EACH USING THE COMPOSITION
  申请人：FUJIFILM CORPORATION

  公开号：US20150010855A1

  公开（公告）日：2015-01-08

  There is provided an actinic ray-sensitive or radiation-sensitive composition containing (α) a compound represented by the formula (αI) capable of generating an acid having a size of 200 Å 3 or more in volume and (β) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, and the formula (αI) is defined as herein, and a resist film formed using the actinic ray-sensitive or radiation-sensitive composition, a resist-coated mask blanks coated with the resist film, a resist pattern forming method comprising exposing the resist film and developing the exposed film, a photomask obtained by exposing and developing the resist-coated mask blanks, a method for manufacturing an electronic device, comprising the resist pattern forming method and an electronic device manufactured by the manufacturing method of an electronic device.

  提供一种感光或辐射敏感的组合物，其中包含(α)一种化合物，其由公式(αI)表示，能够产生大小为200Å3或更大的体积的酸，以及(β)一种化合物，能够在受到光辐射或辐射时产生酸，公式(αI)的定义如本文所述。还提供了使用该感光或辐射敏感组合物形成的光阻膜，涂有光阻膜的光阻涂层掩模坯料，包括曝光光阻膜和显影曝光后膜的光阻图案形成方法，通过曝光和显影涂有光阻涂层的掩模坯料获得的光掩模，以及一种电子器件的制造方法，包括光阻图案形成方法和制造电子器件的电子器件制造方法，以及通过该电子器件制造方法制造的电子器件。
• Compounds useful for the treatment of metabolic disorders and synthesis of the same
  申请人：NORTH CAROLINA CENTRAL UNIVERSITY

  公开号：US10005720B2

  公开（公告）日：2018-06-26

  The present invention provides compounds of Formula (I): wherein variables X, Y, Z and R1 are as described herein. Some of the compounds described herein are glutamate dehydrogenase activators. The invention is also directed to pharmaceutical compositions comprising these compounds, uses of these compounds and compositions in the treatment of metabolic disorders as well as synthesis of the compounds.

  本发明提供了式 (I) 的化合物：其中变量 X、Y、Z 和 R1 如本文所述。本文所述的一些化合物是谷氨酸脱氢酶激活剂。本发明还涉及包含这些化合物的药物组合物、这些化合物和组合物在治疗代谢紊乱中的用途以及化合物的合成。