Naphthalenetriol | 112117-58-5

• 分子结构分类: 有机化合物 - 苯类化合物 - 萘
• 英文名称: Naphthalenetriol
• 英文别名: naphthalene-1,2,3-triol
• CAS: 112117-58-5
• 化学式: C₁₀H₈O₃
• 分子量: 176.17
• InChiKey: NCIAGQNZQHYKGR-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.6
• 重原子数：
  13
• 可旋转键数：
  0
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.0
• 拓扑面积：
  60.7
• 氢给体数：
  3
• 氢受体数：
  3

反应信息

• 作为产物：
  描述：

  1,2-二羟基萘 、 间萘二酚 、 1,4-二羟基萘 、 1,5-二羟基萘 、 1,6-二羟基萘 、 1,7-二羟基萘 、 1,8-二羟基萘 、 萘酚 生成 Naphthalenetriol
  参考文献：
  名称：

  METHODS FOR PURIFYING SILOXANYL MONOMERS

  摘要：

  本发明涉及在至少一个聚合抑制剂存在下纯化硅氧烷单体的减压蒸馏方法。在进一步的方面，聚合抑制剂可以是烷基对苯二酚或羟基萘的一种。本发明还揭示了通过所述方法纯化的化合物和由此制得的聚合物。本摘要旨在作为特定领域搜索的扫描工具，不限制本发明。

  公开号：

  US20080119627A1

文献信息

• Novolac resin-containing resist underlayer film-forming composition using bisphenol aldehyde
  申请人：NISSAN CHEMICAL INDUSTRIES, LTD.

  公开号：US10017664B2

  公开（公告）日：2018-07-10

  Resist underlayer film-forming composition for forming resist underlayer film with high dry etching resistance, wiggling resistance and exerts good flattening property and embedding property for uneven parts, including resin obtained by reacting organic compound A including aromatic ring and aldehyde B having at least two aromatic hydrocarbon ring groups having phenolic hydroxy group and having structure wherein the aromatic hydrocarbon ring groups are bonded through tertiary carbon atom. The aldehyde B may be compound of Formula (1): The obtained resin may have a unit structure of Formula (2): Ar1 and Ar2 each are C6-40 aryl group. The organic compound A including aromatic ring may be aromatic amine or phenolic hydroxy group-containing compound. The composition may contain further solvent, acid and/or acid generator, or crosslinking agent. Forming resist pattern used for semiconductor production, including forming resist underlayer film by applying the resist underlayer film-forming composition onto semiconductor substrate and baking it.

  用于形成具有高干法蚀刻抗性、抗扭曲性并具有良好的平整性和嵌入性能的抗蚀底层膜形成组合物，包括通过使含有芳香环的有机化合物A和至少具有两个含酚羟基的芳香烃环团的醛B反应而获得的树脂，并具有芳香烃环团通过三级碳原子键合的结构。醛B可以是化合物的化学式（1）： 所得的树脂可能具有化学式（2）的单元结构： Ar1和Ar2各自是C6-40芳基团。含有芳香环的有机化合物A可能是芳香胺或含酚羟基的化合物。该组合物可能进一步含有溶剂、酸和/或酸发生剂，或交联剂。用于半导体生产的形成抗蚀图案，包括通过将抗蚀底层膜形成组合物涂覆在半导体衬底上并对其进行烘烤来形成抗蚀底层膜。
• Optically active compound and photosensitive resin composition
  申请人：——

  公开号：US20030211421A1

  公开（公告）日：2003-11-13

  A photoactive compound is used in combination with a photosensitizer, represented by the following formula (1): A −[( J ) m −( X-Pro )] n (1) wherein A represents a hydrophobic unit comprising at least one kind of hydrophobic groups selected from a hydrocarbon group and a heterocyclic group, J represents a connecting group, X-Pro represents a hydrophilic group protected by a protective group Pro which is removable by light exposure, m represents 0 or 1, and n represents an integer of not less than 1. The protective group Pro may be removable by light exposure in association with the photosensitizer (especially, a photo acid generator), or may be a hydrophobic protective group. The hydrophilic group may be a hydroxyl group or a carboxyl group. The photoactive compound has high sensitivity to a light source of short wavelength beams, for resist application, therefore, the photoactive compound is advantageously used for forming a pattern with high resolution.

  一种光活性化合物与光敏剂结合使用，由以下公式（1）表示： A −[( J ) m −( X-Pro )] n (1) 其中，A代表至少包括一种从烃基和杂环基中选择的疏水基的疏水单元，J代表连接基团，X-Pro代表由光照可去除的保护基团Pro保护的亲水基团，m代表0或1，n代表不少于1的整数。 保护基团Pro可以与光敏剂（特别是光酸发生剂）一起通过光照可去除，也可以是疏水保护基团。亲水基团可以是羟基或羧基。光活性化合物对短波长光源具有很高的敏感性，用于光刻应用，因此，该光活性化合物有利于形成具有高分辨率的图案。
• METHOD FOR PRODUCING CYANOGEN-HALIDE, CYANATE ESTER COMPOUND AND METHOD FOR PRODUCING THE SAME, AND RESIN COMPOSITION
  申请人：MITSUBISHI GAS CHEMICAL COMPANY, INC.

  公开号：US20150299110A1

  公开（公告）日：2015-10-22

  A method for efficiently producing a cyanogen halide with suppressed side effects, and a method for producing a high-purity cyanate ester compound at a high yield includes contacting a halogen molecule with an aqueous solution containing hydrogen cyanide and/or a metal cyanide, so that the hydrogen cyanide and/or the metal cyanide is allowed to react with the halogen molecule in the reaction solution to obtain the cyanogen halide, wherein more than 1 mole of the hydrogen cyanide or the metal cyanide is used based on 1 mole of the halogen molecule, and when an amount of substance of an unreacted hydrogen cyanide or an unreacted metal cyanide is defined as mole (A) and an amount of substance of the generated cyanogen halide is defined as mole (B), the reaction is terminated in a state in which (A):(A)+(B) is between 0.00009:1 and 0.2:1.

  一种用于高效生产抑制副作用的氰卤化物，以及以高收率生产高纯度氰酸酯化合物的方法包括将卤素分子与含有氢氰酸和/或金属氰化物的水溶液接触，使得氢氰酸和/或金属氰化物与卤素分子在反应溶液中发生反应以获得氰卤化物，其中基于1摩尔卤素分子使用超过1摩尔的氢氰酸或金属氰化物，当未反应的氢氰酸或未反应的金属氰化物的物质量定义为摩尔(A)，生成的氰卤化物的物质量定义为摩尔(B)，反应在(A)：(A)+(B)介于0.00009:1和0.2:1之间的状态中终止。
• Internal release agent, composition including internal release agent, and process for producing a plastic lens using same composition
  申请人：MITSUI CHEMICALS, INC.

  公开号：US10239239B2

  公开（公告）日：2019-03-26

  An internal release agent includes at least one phosphodiester represented by the following general formula (1). In the formula, R1 and R2 independently represent a hydrocarbon group having 1 to 30 carbon atoms, which is optionally substituted with at least one hydroxyl group, and R3 represents an alkylene group having 2 to 4 carbon atoms. A plurality of R3's may be the same as or different from each other. M represents a hydrogen atom, an ammonium ion, an alkali metal ion, or a monovalent/divalent alkali earth metal ion, and n is an integer of 1 to 60.

  内部释放剂至少包括一个由以下一般式（1）表示的磷酸二酯。在该式中，R1和R2分别表示具有1至30个碳原子的烃基，该烃基可以选择性地取代至少一个羟基，而R3表示具有2至4个碳原子的烷基基团。多个R3可以相同或者彼此不同。M代表氢原子、铵离子、碱金属离子或者一价/二价碱土金属离子，n为1至60的整数。
• PROCESS FOR PRODUCING PENTAERYTHRITOL MERCAPTOCARBOXYLIC ACID ESTER, POLYMERIZABLE COMPOSITION, RESIN, OPTICAL MATERIAL, AND LENS
  申请人：MITSUI CHEMICALS, INC.

  公开号：US20180186733A1

  公开（公告）日：2018-07-05

  A process for producing a pentaerythritol mercaptocarboxylic acid ester of the present invention includes: a step of reacting pentaerythritol with a mercaptocarboxylic acid, in which an absorbance of a 5 wt % aqueous solution of the pentaerythritol at a wavelength of 270 nm, which is measured using a quartz cell having an optical path length of 50 mm, is 0.07 or less.

  本发明的一种生产对羟基羧基巯基脂肪酸酯的工艺包括：将对羟基羧基巯基脂肪酸与对羟基羧基醇反应的步骤，其中在使用光路长度为50毫米的石英池测量的270纳米波长处，对5重量%的对羟基羧基醇水溶液的吸光度为0.07或更低。