The first reversible thermal dissociation of digermanes R<sub>3</sub>Ge–GeR<sub>3</sub>giving germyl radicals R<sub>3</sub>Ge·, and of disilanes R<sub>3</sub>Si–SiR<sub>3</sub>giving silyl radicals R<sub>3</sub>Si·
作者:Wilhelm P. Neumann、Klaus-Dieter Schultz
DOI:10.1039/c39820000043
日期:——
reversibly between –12 and +53°C (ΔHMdiss. 87 ± 8 kJ/mol), and the Si–Si bond in hexamesityldisilane behaves analogously between –60 and –20 °C; above these temperatures, irreversible reactions of the radicals occur.
在Ge-Ge结合在hexamesityldigermane可逆地解离-12和+ 53℃之间(Δ ħ中号迪斯。,和在所述hexamesityldisilane Si-Si键-60之间类似的行为和-20℃; 87±8千焦/摩尔)在这些温度以上,自由基发生不可逆的反应。