Development of Potent and Selective Inhibitors of Aldo–Keto Reductase 1C3 (Type 5 17β-Hydroxysteroid Dehydrogenase) Based on N-Phenyl-Aminobenzoates and Their Structure–Activity Relationships
摘要:
Aldo-keto reductase 1C3 (AKR1C3; type 5 17 beta-hydroxysteroid dehydrogenase) is overexpressed in castration resistant prostate cancer (CRPC) and is implicated in the intratumoral biosynthesis of testosterone and 5 alpha-dihydrotestosterone. Selective AKR1C3 inhibitors are required because compounds should not inhibit the highly related AKR1C1 and AKR1C2 isoforms which are involved in the inactivation of Sa-dihydrotestosterone. NSAIDs, N-phenylanthranilates in particular, are potent but nonselective AKR1C3 inhibitors. Using flufenamic acid, 2-{[3-(trifluoromethyl)phenyl]amino}benzoic acid, as lead compound, five classes of structural analogues were synthesized and evaluated for AKR1C3 inhibitory potency and selectivity. Structure-activity relationship (SAR) studies revealed that a meta-carboxylic acid group relative to the amine conferred pronounced AKR1C3 selectivity without loss of potency, while electron withdrawing groups on the phenylamino B-ring were optimal for AKR1C3 inhibition. Lead compounds did not inhibit COX-1 or COX-2 but blocked the AKR1C3 mediated production of testosterone in LNCaP-AKR1C3 cells. These compounds offer promising leads toward new therapeutics for CRPC.
other solvate, for compounds 1, 3 and 8, and one form for the other compounds. The crystalstructures were determined by single-crystal XRD. All the 4-PABAs in the crystalstructures are highly twisted, and all the solvent-free crystals are based on the conventional acid-acid dimer motif, except for 2, which has a rarely observed acid-acid catemer motif. Two of the solvates (1-S and 8-S) have pyridine in
Photosensitive composition and negative working lithographic printing plate
申请人:FUJI PHOTO FILM CO., LTD.
公开号:EP1249731A2
公开(公告)日:2002-10-16
A photosensitive composition comprising a resin containing a repeating unit corresponding to a monomer having a structure represented by formula (I) defined in the specification, and a negative working lithographic printing plate having a negative working photosensitive layer comprising the above-described photosensitive composition.
Light sensitive planographic printing plate material
申请人:Matsumura Toshiyuki
公开号:US20050181301A1
公开(公告)日:2005-08-18
Disclosed is a light sensitive planographic printing plate material comprising a hydrophilic support and provided thereon, a light sensitve layer containing (A) an infrared absorbing dye, (B) a radical generating agent, and (C) a radically polymerizable compound, the light sensitve layer being an outermost layer, wherein the radical generating agent is selected from the group consisting of a sulfonium salt, a iodonium salt and a diazonium salt, and the radically polymerizable compound is a radically polymerizable oxirane compound having an oxirane ring in the molecule.