5-acetyl-5,10-dihydro-10-methylphenazine

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 二氮杂萘
• 英文名称: 5-acetyl-5,10-dihydro-10-methylphenazine
• 英文别名: 1-[10-methylphenazin-5(10H)-yl]ethanone；1-(10-Methylphenazin-5-yl)ethanone
• 化学式: C₁₅H₁₄N₂O
• 分子量: 238.289
• InChiKey: FZYDLWCEXHXKSE-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.8
• 重原子数：
  18
• 可旋转键数：
  0
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.13
• 拓扑面积：
  23.6
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为反应物：
  描述：

  5-acetyl-5,10-dihydro-10-methylphenazine 在 ammonium hexafluorophosphate 、 silver tetrafluoroborate 作用下， 以 乙醇 为溶剂， 反应 0.08h， 以90%的产率得到5-methylphenazinium hexafluorophosphate
  参考文献：
  名称：

  Peraus, Gunfried; Neugebauer, Franz A., Journal of Chemical Research, Miniprint, 1994, # 4, p. 715 - 746

  摘要：

  DOI：
• 作为产物：
  描述：

  N-methyl-N-(2-iodophenyl)-1,2-benzenediamine 在 potassium carbonate 、 N,N'-二甲基乙二胺 作用下， 以 甲苯 为溶剂， 反应 24.0h， 生成 5-acetyl-5,10-dihydro-10-methylphenazine
  参考文献：
  名称：

  Transition-Metal-Free Intramolecular N-Arylations

  摘要：

  N-Substituted phenoxazines and related aza analogs have been prepared from N-acetylated aryloxy anilides by transition-metal-free, base-catalyzed cyclization reactions. In the presence of a mixture of 10 mol % of N,N-dimethylethylenediamine (DMEDA) and 2 equiv of K2CO3 in toluene at 135 degrees C the products are obtained in high yields.

  DOI：

  10.1021/ol3005134

文献信息

• SULFONIUM SALT, RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US20180088464A1

  公开（公告）日：2018-03-29

  On use of a sulfonium salt of specific structure as PAG, acid diffusion is suppressed. A resist composition comprising the sulfonium salt forms a pattern with improved lithography properties including EL, MEF and LWR when processed by lithography.

  使用具有特定结构的磺鎵盐作为PAG时，可以抑制酸扩散。包括EL、MEF和LWR在内的改进的光刻特性的图案可以由含有该磺鎵盐的光阻组成的深紫外光刻胶处理而成。
• Sulfonium salt, resist composition, and patterning process
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US10180626B2

  公开（公告）日：2019-01-15

  On use of a sulfonium salt of specific structure as PAG, acid diffusion is suppressed. A resist composition comprising the sulfonium salt forms a pattern with improved lithography properties including EL, MEF and LWR when processed by lithography.

  使用具有特定结构的锍盐作为 PAG 时，可抑制酸扩散。包含这种锍盐的抗蚀剂组合物在进行光刻处理时可形成具有更好光刻特性的图案，包括 EL、MEF 和 LWR。
• SECONDARY BATTERY AND METHOD FOR PRODUCING SECONDARY BATTERY
  申请人：Murata Manufacturing Co., Ltd.

  公开号：US20150243992A1

  公开（公告）日：2015-08-27

  A secondary battery that includes a positive electrode active material layer, which is mainly composed of an organic compound having a multi-electron system, on a surface of a positive electrode current collector. The surface of the positive electrode active material layer is covered by an ion-conducting thin film that selectively transmits lithium ions. A positive electrode is composed of the positive electrode current collector, the positive electrode active material layer, and the ion-conducting thin film.
• Transition-Metal-Free Intramolecular <i>N</i>-Arylations
  作者：Isabelle Thomé、Carsten Bolm

  DOI：10.1021/ol3005134

  日期：2012.4.6

  N-Substituted phenoxazines and related aza analogs have been prepared from N-acetylated aryloxy anilides by transition-metal-free, base-catalyzed cyclization reactions. In the presence of a mixture of 10 mol % of N,N-dimethylethylenediamine (DMEDA) and 2 equiv of K2CO3 in toluene at 135 degrees C the products are obtained in high yields.
• Peraus, Gunfried; Neugebauer, Franz A., Journal of Chemical Research, Miniprint, 1994, # 4, p. 715 - 746
  作者：Peraus, Gunfried、Neugebauer, Franz A.

  DOI：——

  日期：——