申请人:MASUYAMA Tatsuro
公开号:US20110091808A1
公开(公告)日:2011-04-21
The present invention provides a photoresist composition comprising a compound capable of generating an acid and a base by irradiation, a resin having an acid-labile group and being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid, and an acid generator.