2-Methylhexahydro-1h-4,7-epoxyisoindole-1,3(2h)-dione | 7741-81-3

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 异吲哚及其衍生物
• 英文名称: 2-Methylhexahydro-1h-4,7-epoxyisoindole-1,3(2h)-dione
• 英文别名: 2-methyl-3a,4,5,6,7,7a-hexahydro-4,7-epoxyisoindole-1,3-dione
• CAS: 7741-81-3
• 化学式: C₉H₁₁NO₃
• 分子量: 181.19
• InChiKey: QSASUQOUORMUIV-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  -0.5
• 重原子数：
  13
• 可旋转键数：
  0
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.78
• 拓扑面积：
  46.6
• 氢给体数：
  0
• 氢受体数：
  3

反应信息

• 作为反应物：
  描述：

  2-Methylhexahydro-1h-4,7-epoxyisoindole-1,3(2h)-dione 、 乙腈 以28%的产率得到
  参考文献：
  名称：

  MARUYAMA KAZUHIRO; ISHITOKU TAKESHI; KUBO YOSUO, J. ORG. CHEM., 1981, 46, NO 1, 27-34

  摘要：

  DOI：
• 作为产物：
  描述：

  3a,4,7,7a-tetrahydro-2-Methyl-4,7-Epoxy-1H-isoindole-1,3(2H)-dione 生成 2-Methylhexahydro-1h-4,7-epoxyisoindole-1,3(2h)-dione
  参考文献：
  名称：

  MARUYAMA KAZUHIRO; ISHITOKU TAKESHI; KUBO YOSUO, J. ORG. CHEM., 1981, 46, NO 1, 27-34

  摘要：

  DOI：

文献信息

• Compound for Photoacid Generator, Resist Composition Using the Same, and Pattern-Forming Method
  申请人：Central Glass Company, Limited

  公开号：US20130130175A1

  公开（公告）日：2013-05-23

  A sulfonic acid onium salt represented by the following formula (1) useful as a superior radiosensitive acid generator for resist compositions. It is possible to form a good pattern by using a resist composition containing this sulfonic acid onium salt corresponding to the formula (1): in which R 1 represents a monovalent organic group, and Q + represents a sulfonium cation or iodonium cation.

  以下是用作优良的辐射敏感性酸发生剂的磺酸醋銨盐的化学式（1）。通过使用含有与化学式（1）对应的磺酸醋銨盐的抗蚀组合物，可以形成良好的图案： 其中R1代表一价有机基团，Q+代表磺銨阳离子或碘銨阳离子。
• Novel Sulfonic Acid Salt and Derivative thereof, Photo-Acid Generator, and Process for Production of Sulfonic Acid Salt
  申请人：Nagamori Masashi

  公开号：US20110112306A1

  公开（公告）日：2011-05-12

  A fluorine-containing sulfonic acid salt or a compound having a fluorine-containing sulfonic acid group, either of which having a structure represented by the following general formula (1), is provided. Such a salt or compound can act as a suitable photo-acid generator, and can form a resist pattern having excellent sensitivity, resolution and mask-dependence. [In general formula (1), R represents a substituted or unsubstituted linear or branched monovalent hydrocarbon group having 1 to 30 carbon atoms, a substituted or unsubstituted monovalent hydrocarbon group having 3 to 30 carbon atoms and a cyclic or a partially cyclic structure, a substituted or unsubstituted aryl group having 6 to 30 carbon atoms, or a substituted or unsubstituted monovalent heterocyclic organic group having 4 to 30 carbon atoms.]

  提供一种含氟磺酸盐或含有含氟磺酸基团的化合物，其结构由下列通式（1）表示。这种盐或化合物可以作为合适的光酸发生剂，并且可以形成具有优异敏感度、分辨率和掩模依赖性的光阻图案。[在通式（1）中，R代表取代或未取代的具有1至30个碳原子的线性或支链一价碳氢基团，取代或未取代的具有3至30个碳原子且具有环状或部分环状结构的一价碳氢基团，取代或未取代的具有6至30个碳原子的芳基团，或取代或未取代的具有4至30个碳原子的一价杂环有机基团。]
• Fluorine-Containing Sulfonate Resin, Fluorine-Containing N-Sulfonyloxyimide Resin, Resist Composition and Pattern Formation Method
  申请人：KATO Misugi

  公开号：US20120328985A1

  公开（公告）日：2012-12-27

  According to the present invention, there are provided a fluorine-containing sulfonate salt resin or fluorine-containing sulfonate ester resin having a structure of the following general formula (A) and a fluorine-containing N-sulfonyloxyimide resin having a repeating unit of the general formula (17). It is possible obtain a resist composition using the above resin such that the resist composition can attain high resolution, wide DOF, small LER and high sensitivity and form a good pattern shape.

  根据本发明，提供了具有以下通用式（A）结构的含氟磺酸盐树脂或含氟磺酸酯树脂以及具有通用式（17）重复单元的含氟N-磺酰氧亚胺树脂。可以使用上述树脂制备抗蚀剂组合物，使抗蚀剂组合物能够达到高分辨率、宽DOF、小LER和高灵敏度，并形成良好的图案形状。
• Novel Sulfonic Acid Salt and Derivative Thereof, Photoacid Generator Agent, and Resist Material and Pattern Formation Method Using the Photoacid Generator Agent
  申请人：Maeda Kazuhiko

  公开号：US20100304303A1

  公开（公告）日：2010-12-02

  Disclosed is a fluorinated sulfonic acid salt or fluorinated sulfonic acid group-containing compound having a structure represented by the following general formula (A). In the formula, n indicates an integer of 1 to 10; R indicates a substituted or unsubstituted C 1 -C 20 linear, branched or cyclic alkyl group, a substituted or unsubstituted C 1 -C 20 linear, branched or cyclic alkenyl group, a substituted or unsubstituted C 6 -C 15 aryl group, or a C 4 -C 15 heteroaryl group; and a indicates 1 or 0. A photoacid generator containing the above fluorinated sulfonic acid salt or fluorinated sulfonic acid group-containing compound shows high sensitivity to an ArF excimer laser or the like, presents no concerns about human body accumulation, can generate an acid (photoacid) of sufficiently high acidity, and exhibits high solubility in a resist solvent and good compatibility with a resist resin.

  本发明揭示了一种含有以下通式（A）所表示的结构的氟磺酸盐或含氟磺酸基的化合物。在公式中，n表示1到10的整数；R表示取代或未取代的C1-C20线性、支链或环烷基，取代或未取代的C1-C20线性、支链或环烯基，取代或未取代的C6-C15芳基，或C4-C15杂环基；a表示1或0。含有上述氟磺酸盐或含氟磺酸基的光酸发生剂对ArF准分子激光等具有高灵敏度，不存在人体积累的问题，能够产生足够高酸度的酸（光酸），并且在抗蚀剂溶剂中具有高溶解度和良好的与抗蚀树脂的相容性。
• Amide compound
  申请人：TAKEDA PHARMACEUTICAL COMPANY LIMITED

  公开号：US10472376B2

  公开（公告）日：2019-11-12

  The present invention relates to compound (I) or a salt thereof which has a RORγt inhibitory action. In the formula (I), each symbol is as defined in the specification.

  本发明涉及具有 RORγt 抑制作用的化合物 (I) 或其盐。式（I）中，各符号如说明书中所定义。