Hybrid topographical and chemical pre-patterns for directed self-assembly of block copolymers
申请人:International Business Machines Corporation
公开号:US10059820B2
公开(公告)日:2018-08-28
Hybrid pre-patterns were prepared for directed self-assembly of a given block copolymer capable of forming a lamellar domain pattern. The hybrid pre-patterns have top surfaces comprising independent elevated surfaces interspersed with adjacent recessed surfaces. The elevated surfaces are neutral wetting to the domains formed by self-assembly. Material below the elevated surfaces has greater etch-resistance than material below the recessed surfaces in a given etch process. Following other dimensional constraints of the hybrid pre-pattern described herein, a layer of the given block copolymer was formed on the hybrid pre-pattern. Self-assembly of the layer produced a lamellar domain pattern comprising self-aligned, unidirectional, perpendicularly oriented lamellae over the elevated surfaces, and parallel and/or perpendicularly oriented lamellae over recessed surfaces. The domain patterns displayed long range order along the major axis of the pre-pattern. The lamellar domain patterns are useful in forming transfer patterns comprising two-dimensional customized features.
混合预图案的制备是为了定向自组装能够形成片状结构域图案的特定嵌段共聚物。混合预图案的顶面包括独立的隆起表面和相邻的凹陷表面。隆起表面对自组装形成的畴具有中性润湿作用。在特定的蚀刻工艺中,隆起表面以下的材料比凹陷表面以下的材料具有更强的抗蚀刻性。根据本文所述的混合预图案的其他尺寸限制,在混合预图案上形成一层给定的嵌段共聚物。该层的自组装产生了层状结构域图案,包括隆起表面上的自排列、单向、垂直取向的层状结构域,以及凹陷表面上的平行和/或垂直取向的层状结构域。畴图案沿着预图案的主轴显示出长程有序性。片状域图案可用于形成包含二维定制特征的转移图案。