3-hydroxyphenyl methacrylate | 110254-11-0

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯酚酯
• 英文名称: 3-hydroxyphenyl methacrylate
• 英文别名: (3-Hydroxyphenyl) 2-methylprop-2-enoate
• CAS: 110254-11-0
• 化学式: C₁₀H₁₀O₃
• 分子量: 178.188
• InChiKey: NTHRHRINERQNSR-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.3
• 重原子数：
  13
• 可旋转键数：
  3
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.1
• 拓扑面积：
  46.5
• 氢给体数：
  1
• 氢受体数：
  3

反应信息

• 作为反应物：
  描述：

  3-hydroxyphenyl methacrylate 以68%的产率得到3-tert-butoxyphenyl methacrylate
  参考文献：
  名称：

  MONOMER, POLYMER, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND PATTERNING PROCESS

  摘要：

  一种聚合物是由一种具有酸敏感基团的羟基苯甲酸甲酯单体合成得到的。该聚合物作为基础树脂的正性光阻组合物具有极高的曝光前后碱溶解速率对比度、高分辨率、曝光后图案的良好轮廓和极小的线边粗糙度、缓慢的酸扩散速率和良好的蚀刻抗性。

  公开号：

  US20110294070A1
• 作为产物：
  描述：

  甲基丙烯酰氯 、 间苯二酚 在 三乙胺 作用下， 以 乙醚 为溶剂， 反应 5.5h， 生成 3-hydroxyphenyl methacrylate
  参考文献：
  名称：

  3D物体打印用活性基团封闭型二异氰酸酯、组合物以及3D物体的打印方法和装置

  摘要：

  本发明提供一种3D物体打印用活性基团封闭型二异氰酸酯、组合物以及3D物体的打印方法和装置。本发明第一方面提供一种3D物体打印用活性基团封闭型二异氰酸酯，所述活性基团封闭型二异氰酸酯具有式1所示的结构；本发明提供的活性基团封闭型二异氰酸酯在光辐射条件下能够参与光聚合反应，可用于3D物体的打印，此外，该化合物有利于提高3D物体的力学性能和尺寸稳定性；

  公开号：

  CN113214114B

文献信息

• RESIST COMPOSITION, PATTERNING PROCESS, AND BARIUM, CESIUM AND CERIUM SALTS
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20170115566A1

  公开（公告）日：2017-04-27

  A resist composition comprising a base resin comprising acid labile group-containing recurring units and preferably acid generator-containing recurring units, and a sodium, magnesium, potassium, calcium, rubidium, strontium, yttrium, cesium, barium or cerium salt of α-fluorinated sulfonic acid bonded to an alkyl, alkenyl, alkynyl or aryl group exhibits a high resolution and sensitivity and forms a pattern of satisfactory profile with minimal LWR after exposure and development.

  一种抗蚀组合物包括基树脂，其中包含含酸敏感基团的重复单元，最好包含含酸发生剂的重复单元，以及与烷基、烯基、炔基或芳基结合的α-氟磺酸的钠、镁、钾、钙、铷、锶、钇、铯、钡或铈盐，表现出高分辨率和灵敏度，并在曝光和显影后形成具有最小LWR的满意轮廓图案。
• [EN] [7,6]-FUSED BICYCLIC ANTIDIABETIC COMPOUNDS<br/>[FR] COMPOSÉS ANTIDIABÉTIQUES BICYCLIQUES [7,6]-FUSIONNÉS
  申请人：MERCK SHARP & DOHME

  公开号：WO2016019863A1

  公开（公告）日：2016-02-11

  Novel compounds of the structural formula (I), and the pharmaceutically acceptable salts thereof, are agonists of G-protein coupled receptor 40 (GPR40) and may be useful in the treatment, prevention and suppression of diseases mediated by the G-protein-coupled receptor 40. The compounds of the present invention may be useful in the treatment of Type 2 diabetes mellitus, and of conditions that are often associated with this disease, including obesity and lipid disorders, such as mixed or diabetic dyslipidemia, hyperlipidemia, hypercholesterolemia, and hypertriglyceridemia.

  结构式(I)的新化合物及其药用盐是G蛋白偶联受体40（GPR40）的激动剂，并可能在治疗、预防和抑制由G蛋白偶联受体40介导的疾病方面发挥作用。本发明的化合物可能在治疗2型糖尿病以及与该疾病经常相关的病症方面发挥作用，包括肥胖和脂质紊乱，如混合性或糖尿病性脂质代谢异常、高脂血症、高胆固醇血症和高三酰甘油血症。
• NITROGEN-CONTAINING MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：Sagehashi Masayoshi

  公开号：US20120183904A1

  公开（公告）日：2012-07-19

  A chemically amplified positive resist composition of better performance can be formulated using a polymer having a quencher incorporated therein, specifically a polymer comprising recurring units having a carbamate structure which is decomposed with an acid to generate an amino group and optionally recurring units having an acid labile group capable of generating a carboxyl and/or hydroxyl group under the action of an acid. The polymer is highly effective for suppressing diffusion of acid and diffuses little itself, and the composition forms a pattern of rectangular profile at a high resolution.

  一种化学增感正向光阻组合物可以使用具有淬灭剂的聚合物制备，具体来说，该聚合物包含具有碳酸酯结构的重复单元，该碳酸酯结构在酸的作用下分解生成氨基团，并且可以包含具有酸敏感基团的重复单元，该酸敏感基团在酸的作用下能够生成羧基和/或羟基团。该聚合物对于抑制酸的扩散非常有效，并且本身扩散很少，组合物形成高分辨率的矩形剖面图案。
• RESIST COMPOSITION, PATTERNING PROCESS, MONOMER, AND COPOLYMER
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20130309606A1

  公开（公告）日：2013-11-21

  A polymer is obtained from copolymerization of a recurring unit having a carboxyl and/or phenolic hydroxyl group substituted with an acid labile group and a recurring unit having formula (1) wherein R 1 is methyl, ethyl, propyl, methoxy, ethoxy or propoxy, R 2 is H or CH 3 , and m is 1 to 4. The polymer is used as a base resin to formulate a resist composition, which is improved in contrast of alkali dissolution rate before and after exposure, acid diffusion control, resolution, and profile and edge roughness of a pattern after exposure.

  一种聚合物是通过共聚反应获得的，其中具有羧酸和/或酚羟基的重复单元被取代为酸易裂解基团，而具有公式（1）的重复单元的R1为甲基，乙基，丙基，甲氧基，乙氧基或丙氧基，R2为H或CH3，m为1到4。该聚合物用作基础树脂来制备抗蚀剂组合物，该组合物在曝光前后的碱溶解速率对比、酸扩散控制、分辨率以及曝光后图案的轮廓和边缘粗糙度方面得到改善。
• Image forming composition and photosensitive lithographic plate using same
  申请人：Okamoto Chemical Industry Co., Ltd.

  公开号：US20040131967A1

  公开（公告）日：2004-07-08

  The present invention provides image-forming compositions and photosensitive lithographic plates which are excellent in sensitivity to infrared radiation, latitude of development, treatable area in m 2 , and printing durability. Specifically, the present invention provides an image-forming composition comprising (A) a polymeric compound obtainable by the addition reaction of a resinous polymer having one or more phenolic hydroxyl groups with a silane coupling agent of the following general formula (1) or (2), (B) an acid generator, (C) an infrared absorber, and (D) an alkali-soluble resin, and a photosensitive lithographic plate having this image-forming composition applied onto a substrate. 1 wherein X 1 and X 2 each represent a trimethoxysilyl group or the like; G 1 represents O or COO; R 1 and R 2 each independently represents a hydrogen atom or a methoxy group; R 3 represents (CH 2 ) m which may have a hydrocarbon side chain; G 2 represents O or COO; R 4 represents a hydrogen atom or a straight-chain or branched alkyl group; and R 5 represents (CH 2 ) n which may have a hydrocarbon side chain.

  本发明提供了一种成像组合物和感光平版，其对红外辐射的灵敏度、显影的容限、可处理面积和印刷耐久性均表现出优异的特性。具体而言，本发明提供了一种成像组合物，包括（A）通过树脂聚合物具有一个或多个酚羟基与如下一般式（1）或（2）的硅烷偶联剂的加成反应获得的聚合物化合物，（B）酸发生剂，（C）红外吸收剂和（D）碱溶性树脂，并且将该成像组合物应用于基板上的感光平版。其中，X1和X2分别表示三甲氧基基团或类似基团；G1表示O或COO；R1和R2各自独立地表示氢原子或甲氧基；R3表示（CH2）m，可以具有碳氢侧链；G2表示O或COO；R4表示氢原子或直链或支链烷基；R5表示（CH2）n，可以具有碳氢侧链。