申请人:E. R. Squibb & Sons, Inc.
公开号:US04112098A1
公开(公告)日:1978-09-05
Compounds are provided having the structure ##STR1## wherein R.sup.1 is hydrogen, alkyl of 1 to 3 carbons, 1-(hydroxyimino)alkyl, alkanoylamino, amino, or ##STR2## wherein alkyl in the above groups contains 1 to 4 carbons; R.sup.2 is 1-(hydroxyimino)alkyl, alkanoylamino, amino, ##STR3## hydrogen, lower alkyl or phenyl (optionally substituted by R.sup.4) wherein alkyl in the above groups contains 1 to 4 carbons; R.sup.3 is hydrogen, lower alkyl, benzyl or phenyl (optionally substituted with R.sup.4), dialkylaminoalkyl, hydroxyalkyl, ##STR4## (wherein R.sup.6 is hydrogen or alkyl, and R.sup.7 is alkyl); with the proviso that R.sup.1 or R.sup.2 is 1-(hydroxyimino)alkyl, alkanoylamino or amino, when R.sup.3 is hydrogen, lower alkyl, benzyl or phenyl; and R.sup.4 and R.sup.5 are the same or different and represent hydrogen, lower alkyl, lower alkoxy, alkanoyloxy, benzyloxy, hydroxy, halogen (Cl, Br and F), nitro and trifluoromethyl. The above compounds are useful as anti-allergy agents and antiinflammatory agents.
提供的化合物具有以下结构:##STR1## 其中R.sup.1是氢、1至3个碳的烷基、1-(羟亚胺)烷基、烷酰氨基、氨基或##STR2## 其中上述羟亚胺烷基、烷酰氨基和氨基中的烷基含有1至4个碳;R.sup.2是1-(羟亚胺)烷基、烷酰氨基、氨基、##STR3## 氢、低级烷基或苯基(可选地由R.sup.4取代),其中上述羟亚胺烷基、烷酰氨基和氨基中的烷基含有1至4个碳;R.sup.3是氢、低级烷基、苄基或苯基(可选地由R.sup.4取代)、二烷基氨基烷基、羟基烷基、##STR4##(其中R.sup.6是氢或烷基,R.sup.7是烷基);但是当R.sup.3是氢、低级烷基、苄基或苯基时,R.sup.1或R.sup.2是1-(羟亚胺)烷基、烷酰氨基或氨基;R.sup.4和R.sup.5相同或不同,表示氢、低级烷基、低级烷氧基、烷酰氧基、苄氧基、羟基、卤素(Cl、Br和F)、硝基和三氟甲基。上述化合物可用作抗过敏剂和抗炎剂。