Bis-ortho-metalation/silylation of unprotected o-phthalic acids. Straightforward access to new silylated N-hydroxyphthalimide (NHPI) analogs
作者:Jérôme Michaux、Bernard Bessières、Jacques Einhorn
DOI:10.1016/j.tetlet.2011.10.114
日期:2012.1
The one pot, in situ ortho-metalation/silylation of unprotected o-phthalic acids using lithium tetramethylpiperidide (LiTMP) and chlorotrimethylsilane is described. This method gives a straightforward access to silylated phthalic anhydrides. These can be easily converted into the corresponding silylated N-hydroxyphthalimide (NHPI) analogs, which are promising new aerobic oxidation catalysts.
所述一个锅,原位邻-metalation /不受保护的甲硅烷基化ø -邻羧酸使用四甲基哌啶锂(LiTMP)和三甲基氯进行说明。该方法可以直接获得甲硅烷基化的邻苯二甲酸酐。这些可以容易地转化成相应的甲硅烷基化的N-羟基邻苯二甲酰亚胺(NHPI)类似物,它们是有前途的新型好氧氧化催化剂。