1,1-bis-(4-hydroxyphenyl)-cycloheptane | 73008-79-4

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: 1,1-bis-(4-hydroxyphenyl)-cycloheptane
• 英文别名: 4,4'-(cycloheptylidene)diphenol；4-(1-(4-hydroxyphenyl)cycloheptyl)phenol；4,4'-(Cycloheptane-1,1-diyl)diphenol；4-[1-(4-hydroxyphenyl)cycloheptyl]phenol
• CAS: 73008-79-4
• 化学式: C₁₉H₂₂O₂
• 分子量: 282.382
• InChiKey: LPKVNNDYZRCVQR-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  6
• 重原子数：
  21
• 可旋转键数：
  2
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.37
• 拓扑面积：
  40.5
• 氢给体数：
  2
• 氢受体数：
  2

反应信息

• 作为反应物：
  描述：

  1,1-bis-(4-hydroxyphenyl)-cycloheptane 在 sodium hydroxide 、 苄基三乙基氯化铵 、 对苯二酚 作用下， 以 异丙醇 为溶剂， 反应 0.33h， 生成 1,1-bis[4-(3-methacryloyloxy-2-hydroxypropoxy)phenyl]cycloheptane
  参考文献：
  名称：

  New Acrylic Esters, Derivatives of Some Diglycidyl Ethers as Main Components of Lacquer Compositions

  摘要：

  DOI：

  10.1080/10587250008023599
• 作为产物：
  描述：

  苯酚 、 环庚酮 在 盐酸 、 硫代乳酸 作用下， 反应 30.0h， 生成 1,1-bis-(4-hydroxyphenyl)-cycloheptane
  参考文献：
  名称：

  New Acrylic Esters, Derivatives of Some Diglycidyl Ethers as Main Components of Lacquer Compositions

  摘要：

  DOI：

  10.1080/10587250008023599

文献信息

• NOVEL DIAZONAPHTHOQUINONESULFONIC ACID BISPHENOL DERIVATIVE USEFUL IN PHOTO LITHOGRAPHIC SUB MICRON PATTERNING AND A PROCESS FOR PREPARATION THEREOF
  申请人：Reddy Vummadi Venkat

  公开号：US20100081084A1

  公开（公告）日：2010-04-01

  The present invention provides novel diazonaphthoquinonesulfonic acid bisphenol derivatives. More particularly, the present invention relates to photo restive coating comprising alkali-soluble resin, a photoactive compound and a surfactant. The photoresist film prepared has less then one micron. The photoactive compound is soluble or swellable in aqueous alkaline solutions and is diazonaphthoquinonesulfonic bisphenol esters of the general formula (A), wherein DNQ represents a 2-Diazo-1-naphthoquinone-4-sulfonyl, 2-Diazo-1-naphthoquinone-5-sulfonyl, 1-Diazo-2-naphthoquinone-4-sulfonyl groups and R1 R1 represents an alkyl, aryl and substituted aryl groups. The invention also provides a process for coating and imaging the light-sensitive composition.

  本发明提供了新型二氮基萘醌磺酸双酚衍生物。更具体地说，本发明涉及包括碱溶性树脂、光敏化合物和表面活性剂的光敏涂层。制备的光刻膜厚度小于1微米。光敏化合物在水性碱性溶液中可溶或可膨胀，是一般式（A）中的二氮基萘醌磺酸双酚酯，其中DNQ代表2-二氮基-1-萘醌-4-磺酰基、2-二氮基-1-萘醌-5-磺酰基、1-二氮基-2-萘醌-4-磺酰基基团，R1代表烷基、芳基和取代芳基基团。本发明还提供了一种涂覆和成像光敏组合物的方法。
• Polycarbonate composition having resistance to high heat distortion
  申请人：General Electric Company

  公开号：US04180651A1

  公开（公告）日：1979-12-25

  Resistance to high heat distortion is imparted to high molecular weight aromatic polycarbonate resins by controlling the degree to which particular diphenols are halogenated so that there are obtained either highly pure dihalogenated diphenols or predetermined statistical mixtures comprising predominantly mono- and dihalogenated diphenols together with some unreacted diphenol.

  通过控制特定二酚的卤代程度，可以使高分子量芳香族聚碳酸酯树脂具有抗高温变形的抗性，从而获得高度纯净的二卤代二酚或包含主要为单卤代和二卤代二酚以及一些未反应的二酚的预定统计混合物。
• Halogenated bisphenol-Z and derivatives thereof
  申请人：General Electric Company

  公开号：US04223170A1

  公开（公告）日：1980-09-16

  Resistance to high heat distortion is imparted to high molecular weight aromatic polycarbonate resins by controlling the degree to which particular diphenols are halogenated so that there are obtained either highly pure dihalogenated diphenols or predetermined statistical mixtures comprising predominantly mono- and dihalogenated diphenols together with some unreacted diphenol.

  通过控制特定二酚的卤代程度，可以赋予高分子量芳香族聚碳酸酯树脂对高温变形的抵抗力，从而获得高纯度的二卤代二酚或预定的统计混合物，其中主要包括单卤代和双卤代二酚以及一些未反应的二酚。
• Optical parts and sulfur-containing poly (thio)ester (co)polymer
  申请人：——

  公开号：US20030204030A1

  公开（公告）日：2003-10-30

  A poly(thio)ester (co)polymer which comprises a repeating structural unit represented by the formula (1-A) as an essential structural unit: 1 [wherein R 11 is a divalent aliphatic hydrocarbon group which may contain at least one sulfur atom in a sulfide group; R 12 is a mono- or poly-cyclic aliphatic or aromatic dicarboxylic acid residue; and X 11 and X 12 are each independently an oxygen atom or sulfur atom, and when X 11 and X 12 are the oxygen atoms, R 11 is a divalent aliphatic hydrocarbon group containing at least one sulfur atom in the sulfide group]; and an optical component obtainable by molding the poly(thio)ester (co)polymer. The poly(thio)ester (co)polymer is excellent in transparency and optical characteristics (e.g., a higher refractive index, higher Abbe number, and lower birefringence), and has also good mechanical characteristics and thermal characteristics, and further is excellent in melt fluidity and injection moldability.

  一种聚（硫）酯（共）聚合物，其包括由公式（1-A）表示的重复结构单元作为必要的结构单元：1 [其中，R11是一个双价的脂肪族碳氢基团，可以在硫化物基团中含有至少一个硫原子；R12是一个单环或多环的脂肪族或芳香族二羧酸残基；X11和X12分别是氧原子或硫原子，当X11和X12是氧原子时，R11是一个含有至少一个硫原子的双价脂肪族碳氢基团]；以及通过模塑聚（硫）酯（共）聚合物获得的光学组件。该聚（硫）酯（共）聚合物在透明度和光学特性（例如更高的折射率、更高的阿贝数和更低的双折射率）方面表现出色，同时具有良好的机械特性和热特性，并且在熔融流动性和注塑性方面表现出色。
• POLYCARBONATE COPOLYMER, COATING LIQUID USING SAME, AND ELECTROPHOTOGRAPHIC PHOTOSENSITIVE BODY
  申请人：Hikosaka Takaaki

  公开号：US20120100474A1

  公开（公告）日：2012-04-26

  A polycarbonate copolymer includes a repeating unit represented by a formula (1) below and a molar copolymer composition represented by Ar 2 /(Ar 1 +Ar 2 ) in a range of 25 mol % to 50 mol %. In the formula (1): Ar 1 and Ar 2 represent a divalent aromatic group; a chain end is terminated by a monovalent aromatic group or a monovalent fluorine-containing aliphatic group; and n represents an average repeating number of an Ar 1 block and is a numeral of 1.0 to 3.0, provided that Ar 1 and Ar 2 are not the same.

  一种聚碳酸酯共聚物，包括由下式（1）表示的重复单元和在Ar2/（Ar1+Ar2）范围内的摩尔共聚物组成，该组成在25摩尔％至50摩尔％之间。在式（1）中：Ar1和Ar2表示二价芳香基；链端由一价芳香基或含氟一价脂肪基终止；n表示Ar1块的平均重复次数，是1.0到3.0的数字，前提是Ar1和Ar2不相同。