NOVEL SULFONATE AND ITS DERIVATIVE, PHOTOSENSITIVE ACID GENERATOR, AND RESIST COMPOSITION AND PATTERNING PROCESS USING THE SAME
申请人:OHASHI Masaki
公开号:US20100209827A1
公开(公告)日:2010-08-19
There is disclosed a sulfonate shown by the following general formula (2).
R
1
—COOC(CF
3
)
2
—CH
2
SO
3
−
M
+
(2)
(In the formula, R
1
represents a linear, a branched, or a cyclic monovalent hydrocarbon group having 1 to 50 carbon atoms optionally containing a hetero atom. M
+
represents a cation.) There can be provided: a novel sulfonate which is effective for a chemically amplified resist composition having a sufficiently high solubility (compatibility) in a resist solvent and a resin, a good storage stability, a PED stability, a further wider depth of focus, a good sensitivity, in particular a high resolution and a good pattern profile form; a photosensitive acid generator; a resist composition using this; a photomask blank, and a patterning process.
本发明揭示了一种磺酸盐,其通式如下(2)所示。 R1-COOC(CF3)2-CH2SO3-M+(2)(其中,R1表示具有1至50个碳原子的线性、分支或环状单价碳氢基团,可选含有杂原子。M+表示一个阳离子)。本发明可以提供:一种新型磺酸盐,其在抗蚀剂溶剂和树脂中具有足够高的溶解度(相容性),良好的储存稳定性,PED稳定性,进一步扩大焦点深度,良好的灵敏度,特别是高分辨率和良好的图案轮廓形态;一种光敏酸发生剂;使用该组合物的抗蚀剂组合物;一种光掩膜空白,以及一种制图工艺。