Improved dry stripper solutions for removing one, two or more photoresist layers from substrates are provided. The stripper solutions comprise dimethyl sulfoxide, a quaternary ammonium hydroxide, and an alkanolamine, an optional secondary solvent and less than about 3 wt.% water and/or a dryness coefficient of at least about 1. Methods for the preparation and use of the improved dry stripping solutions are additionally provided.
提供了用于从基底上去除一层、两层或多层光阻的改进型干法剥离剂溶液。这些剥离剂溶液包括
二甲基亚砜、季
铵氢氧化物、烷醇胺、任选的辅助溶剂和小于约 3 重量百分比的
水和/或干燥系数至少约为 1 的溶液,此外还提供了制备和使用改进型干法剥离溶液的方法。