3,4,4′-trihydroxybenzophenone | 74697-54-4

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: 3,4,4′-trihydroxybenzophenone
• 英文别名: 3,4,4'-trihydroxy-benzophenone；3,4,4'-Trihydroxy-benzophenon；(3,4-Dihydroxyphenyl)(4-hydroxyphenyl)methanone；(3,4-dihydroxyphenyl)-(4-hydroxyphenyl)methanone
• CAS: 74697-54-4
• 化学式: C₁₃H₁₀O₄
• 分子量: 230.22
• InChiKey: UFUDAGZTGYQJOT-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.2
• 重原子数：
  17
• 可旋转键数：
  2
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.0
• 拓扑面积：
  77.8
• 氢给体数：
  3
• 氢受体数：
  4

反应信息

• 作为产物：
  描述：

  3,4,4'-trimethoxybenzophenone 在 三溴化硼 作用下， 以 二氯甲烷 为溶剂， 以88 %的产率得到3,4,4′-trihydroxybenzophenone
  参考文献：
  名称：

  Exploration of Novel Urolithin C Derivatives as Non-Competitive Inhibitors of Liver Pyruvate Kinase

  摘要：

  肝脏丙酮酸激酶是一种脂肪在肝脏中逐渐积累并最终导致肝硬化的疾病，抑制肝脏丙酮酸激酶有助于阻止或逆转非酒精性脂肪肝。最近，有报道称尿石素 C 是开发肝丙酮酸激酶（PKL）异位抑制剂的新支架。本研究对尿石素 C 进行了全面的结构-活性分析。我们合成了 50 多种类似物，并测试了这些类似物所具有的化学特征。这些数据可为开发更强效、更具选择性的 PKL 异位抑制剂铺平道路。

  DOI：

  10.3390/ph16050668

文献信息

• Radiation-sensitive positive resist composition
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：EP0461654A2

  公开（公告）日：1991-12-18

  A positive resist composition comprising a radiation-sensitive component, an alkali-soluble resin and a phenol compound of the formula: wherein R is a hydrogen atom, a lower alkyl group or a phenyl group, R' is an alkyl group or an alkoxy group, and n is a number of 0 to 3, which has well balanced good properties such as sensitivity, resolution, heat resistance and adhesiveness.

  一种阳离子抗蚀剂组合物，由辐射敏感成分、碱溶性树脂和式中的苯酚化合物组成： 其中 R 是氢原子、低级烷基或苯基，R'是烷基或烷氧基，n 是 0 至 3 的数字，它具有良好的平衡特性，如敏感性、分辨率、耐热性和粘合性。
• Positive type resist composition
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：EP0559204A1

  公开（公告）日：1993-09-08

  A positive type resist composition comprising an alkali-soluble resin and a quinonediazide compound, wherein the alkali-soluble resin containing resin (A) is obtainable through a condensation reaction with at least one phenol compound represented by the following general formula (I): wherein R₁ to R₃ independently of one another each represent a hydrogen atom or an alkyl or alkoxy group having 1-4 carbon atoms and k represents 1 or 2, at least one compound represented by the following general formula (II): wherein R₄ represents a hydrogen atom, an alkyl group having 1-4 carbon atoms or a phenyl group, R₅ to R₇ independently of one another each represent a hydrogen atom or an alkyl or alkoxy group having 1-4 carbon atoms and n represents 1 or 2, and an aldehyde compound. This composition is excellent in the balance between performances such as sensitivity, heat resistance and profile, and is free from scum.

  一种由碱溶性树脂和醌噻嗪化合物组成的正型抗蚀剂组合物，其中含有树脂（A）的碱溶性树脂可通过与至少一种由下式通式（I）代表的苯酚化合物发生缩合反应而获得： 其中 R₁至 R₃各自独立地代表氢原子或具有 1-4 个碳原子的烷基或 烷氧基，k 代表 1 或 2： 其中 R₄ 代表氢原子、具有 1-4 个碳原子的烷基或苯基，R₅ 至 R₇ 各自独立地代表氢原子或具有 1-4 个碳原子的烷基或烷氧基，n 代表 1 或 2，以及醛化合物。这种组合物在灵敏度、耐热性和外形等性能之间具有极佳的平衡性，而且不会产生浮渣。
• PHOTOSENSITIVE POLYSILAZANE COMPOSITION AND METHOD OF FORMING PATTERNED POLYSILAZANE FILM
  申请人：TonenGeneral Sekiyu K.K.

  公开号：EP1164435A1

  公开（公告）日：2001-12-19

  A photosensitive polysilazane which may be used as a positive-tone photoresist, and a method of forming a patterned polysilazane film by use of such a composition are provided. The photosensitive polysilazane composition of the invention is characterized by comprising a polysilazane, particularly polymethylsilazane or polyphenylsilazane, and an optically acid-generating agent. The patterned polysilazane film is obtained by exposing a coating of the photosensitive polysilazane composition of the invention to light in a pattern and dissolving off the exposed portion.

  本发明提供了一种可用作正色调光刻胶的光敏聚硅氮烷，以及使用这种组合物形成图案化聚硅氮烷薄膜的方法。本发明的光敏聚硅氮烷组合物的特点是由一种聚硅氮烷（特别是聚甲基硅氮烷或聚苯基硅氮烷）和一种光学酸生成剂组成。将本发明的光敏聚硅氮烷组合物涂层按一定图案对光照射，然后溶解掉照射部分，即可得到图案化的聚硅氮烷薄膜。
• PHOTOSENSITIVE POLYSILAZANE COMPOSITION, METHOD OF FORMING PATTERN THEREFROM, AND METHOD OF BURNING COATING FILM THEREOF
  申请人：CLARIANT INTERNATIONAL LTD.

  公开号：EP1239332A1

  公开（公告）日：2002-09-11

  A finely patterned silica type ceramic film suitable as an inter-layer dielectric is formed in a short time by applying, onto a substrate, a positive working radiation sensitive polysilazane composition comprising a modified poly(sil sesquiazane) having a number average molecular weight of 100 to 100,000 and containing a basic constituent unit represented by the general formula: -[SiR6(NR7)1.5]- and other constituent units represented by the general formula: -[SiR62NR7]- and/or -[SiR63(NR7)0.5]- (R6 and R7 independently represent a hydrogen atom, a C1-3 alkyl group or a substituted or unsubstituted phenyl group) in a ratio of 0.1 to 100 mol-% to said basic constituent unit, a photo acid generator and preferably a water-soluble compound as a shape stabilizer, then patternwise exposing the resultant coating film, subjecting the exposed part of the coating film to moistening treatment, developing it with an aqueous alkali solution, wholly exposing the coating film to light and moistening treatment again, followed by burning treatment.

  一种适用于层间电介质的精细图案化二氧化硅型陶瓷膜是通过在基底上涂敷一种正工作辐射敏感性聚硅氮烷组合物在短时间内形成的，该组合物包含一种改性聚硅氮烷，其平均分子量为 100 至 100000，并含有由通式表示的基本组成单元：-[SiR6(NR7)1.5]-和由通式代表的其他组成单元：-[SiR62NR7]-和/或-[SiR63(NR7)0.5]-(R6 和 R7 独立地代表氢原子、C1-3 烷基或取代或未取代的苯基)，与所述基本组成单元的比例为 0.然后，将所得涂膜进行图案化曝光，将涂膜的曝光部分进行湿润处理，用碱水溶液显影，将涂膜完全曝光于光并再次进行湿润处理，然后进行灼烧处理。
• PHOTOSENSITIVE COMPOSITION FOR INTERLAYER DIELECTRIC AND METHOD OF FORMING PATTERNED INTERLAYER DIELECTRIC
  申请人：AZ Electronic Materials (Japan) K.K.

  公开号：EP1548499A1

  公开（公告）日：2005-06-29

  There is provided a photosensitive composition which possesses excellent storage stability and can yield an interlayer insulation film with an improved film thickness limit. The photosensitive composition comprises a modified polysilsesquiazane having a weight average molecular weight of 500 to 200,000 comprising basic constitutional units represented by formula -[SiR1(NR2)1.5]- wherein R1's each independently represent an alkyl group having 1 to 3 carbon atoms or a substituted or unsubstituted phenyl group; R2's each independently represent hydrogen, an alkyl group having 1 to 3 carbon atoms, or a substituted or unsubstituted phenyl group, up to 50% by mole of the basic constitutional units having been replaced by a linking group other than the silazane bond; and a photoacid generating agent.

  本发明提供了一种光敏组合物，它具有优异的贮存稳定性，并能产生具有改进的膜厚度极限的层间绝缘膜。该光敏组合物包括一种改性聚硅烷基噻嗪，其重量平均分子量为 500 至 200,000，包含由式-[SiR1(NR2)1.5]-其中 R1 各自独立地代表具有 1 至 3 个碳原子的烷基或取代或未取代的苯基；R2 各自独立地代表氢、具有 1 至 3 个碳原子的烷基或取代或未取代的苯基，以摩尔计最多有 50%的基本构型单元被硅烷键以外的连接基团取代；以及一种光酸生成剂。