申请人:Masuda Yasuo
公开号:US20060166131A1
公开(公告)日:2006-07-27
A positive photoresist composition comprising an alkali-soluble novolak resin (A) containing a structural unit (a1) represented by a general formula (I) shown below, and a structural unit (a2) represented by a general formula (II) shown below, and a photosensitizer (B).
一种正性光刻胶组合物,包括一种碱溶性酚醛树脂(A),其中含有由下图所示通式(I)表示的结构单元(a1)和由下图所示通式(II)表示的结构单元(a2),以及一种光敏剂(B)。