2-三溴甲基磺酰基萘 | 85095-67-6

• 分子结构分类: 有机化合物 - 苯类化合物 - 萘
• 中文名称: 2-三溴甲基磺酰基萘
• 英文名称: α,α,α-tribromomethyl 2-naphthyl sulfone
• 英文别名: 2-(Tribromomethanesulfonyl)naphthalene；2-(tribromomethylsulfonyl)naphthalene
• CAS: 85095-67-6
• 化学式: C₁₁H₇Br₃O₂S
• 分子量: 442.953
• InChiKey: QVEZHRZYWJBDJX-UHFFFAOYSA-N

物化性质

• 熔点：
  110-111 °C(Solv: ethanol (64-17-5))
• 沸点：
  468.1±45.0 °C(Predicted)
• 密度：
  2.161±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  3.6
• 重原子数：
  17
• 可旋转键数：
  1
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.09
• 拓扑面积：
  42.5
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为产物：
  描述：

  (2-naphthylsulfonyl)acetic acid 在 吗啉 、 溴 作用下， 以 溶剂黄146 为溶剂， 反应 27.0h， 生成 2-三溴甲基磺酰基萘
  参考文献：
  名称：

  Lisitsyn, V. N.; Kukalenko, L. S.; Sergeeva, N. V., Journal of Organic Chemistry USSR (English Translation), 1982, vol. 18, p. 2279 - 2282

  摘要：

  DOI：

文献信息

• Method and apparatus for inspecting photosensitive material for surface defects
  申请人：FUJI PHOTO FILM CO., LTD.

  公开号：US20030090653A1

  公开（公告）日：2003-05-15

  The surface defect inspection method and apparatus are capable of inspecting a photosensitive material for defective surface portions with efficiency by using a reflex-type optical sensor. The surface defect inspection apparatus has a reflex-type optical sensor. A thermal-developable photosensitive material is irradiated with inspection light from a light source. Reflected light from the photosensitive material is received by a light-receiving portion of the optical sensor and a defective surface portion is detected from the reflected light. A mask is attached to the light-receiving portion to cut out specular reflected light, thereby enabling a change in the quantity of diffuse reflected light to be directly detected. Therefore, even a defective surface portion where only a small diffuse reflectance is recognized can be detected with efficiency.

  表面缺陷检测方法和设备能够通过使用反射式光学传感器，高效地检测光敏材料表面的缺陷部分。表面缺陷检测设备具有一个反射式光学传感器。用来自光源的检测光照射热显影光敏材料。光学传感器的光接收部分接收来自光敏材料的反射光，并从反射光中检测出缺陷表面部分。光接收部分上有一个遮罩，用于遮挡镜面反射光，从而可以直接检测到漫反射光量的变化。因此，即使只识别到很小的漫反射光的缺陷表面部分，也能有效地检测出来。
• LISITSYN, V. N.;KUKALENKO, L. S.;SERGEEVA, N. V., ZH. ORGAN. XIMII, 1982, 18, N 12, 2583-2587
  作者：LISITSYN, V. N.、KUKALENKO, L. S.、SERGEEVA, N. V.

  DOI：——

  日期：——
• Antireflective Film, Method of Manufacturing Antireflective Film, Polarizing Plate and Image Display Device Using the Same
  申请人：Fukushige Yuuichi

  公开号：US20080234461A1

  公开（公告）日：2008-09-25

  An antireflective film comprising: a support; and at least one layer including an antireflective layer, wherein at least one of said at least one layer laminated on the support is a layer formed by ionizing radiation curing of a composition containing a combination of a radical polymerization initiator with at least one compound selected from two or more kinds of initiator assistants and further containing an ionizing radiation curable compound.
• PLANOGRAPHIC PRINTING PLATE MATERIAL, AND CYCLIC UREIDE MOIETY-CONTAINING PHENOLIC RESIN AND ITS SYNTHETIC PROCESS
  申请人：MIYOSHI Masaki

  公开号：US20090075201A1

  公开（公告）日：2009-03-19

  Disclosed is a planographic printing plate material comprising an aluminum support and provided thereon, an image formation layer containing a cyclic ureide moiety-containing phenolic resin in which a phenolic resin has a cyclic ureide moiety through a linkage group, the cyclic ureide moiety being derived from a cyclic ureide and the linkage group being derived from a linkage compound having both a monohalogenated alkyl group and one selected from a vinyl group, a carbonyl group, an ester group and a sulfonic acid ester group.
• LIGHT-SENSITIVE LITHOGRAPHIC PRINTING PLATE MATERIAL
  申请人：Furukawa Akira

  公开号：US20110318689A1

  公开（公告）日：2011-12-29

  An object of the present invention is to provide a light-sensitive lithographic printing plate material having high sensitivity, generating no background stain even when development is carried out by using a neutral developing solution having a pH of less than 9, or an alkali developing solution having a pH in the range of 9 to 12, generating no background stain even when the plate is allowed to stand after developing treatment or during printing for a long period of time, and having excellent in printing endurance and ink transfer property, and it is accomplished by a light-sensitive lithographic printing plate material which comprises a support and a photo-curable light-sensitive layer formed thereon, said photo-curable light-sensitive layer contains a polymer synthesized by using at least a compound represented by the following mentioned general formula I: wherein R 1 , R 2 and R 3 each independently represent an alkyl group or an alkoxy group each having 1 to 10 carbon atoms; provided that at least two of R 1 , R 2 and R 3 represent alkoxy groups; and Y 1 represents an alkylene group having 1 to 10 carbon atoms, and having a polymerizable double bond group and at least one of a carboxyl group and a sulfonate group at a side chain.