The present teachings relate to a photopatternable composition including a vinylidene fluoride-based polymer, a photosensitive non-nucleophilic base, and a crosslinking agent. The photopatternable composition can be used to prepare a patterned thin film component for use in an electronic, optical, or optoelectronic device such as an organic thin film transistor. The patterned thin film component can be used as a gate dielectric with a high dielectric constant, for example, a dielectric constant greater than 10.
本发明涉及一种光图案化组合物,包括一种亚
乙烯基氟化物基聚合物、一种光敏非亲核碱和一种
交联剂。该光可图案化组合物可用于制备图案化薄膜元件,以用于电子、光学或光电设备,如有机薄膜晶体管。图案化薄膜元件可用作具有高介电常数(例如介电常数大于 10)的栅极电介质。