2,6-dichloroterephthaloyl dichloride | 63192-67-6

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: 2,6-dichloroterephthaloyl dichloride
• 英文别名: 2,6-Dichloroterephthalyl dichloride；2,6-dichlorobenzene-1,4-dicarbonyl chloride
• CAS: 63192-67-6
• 化学式: C₈H₂Cl₄O₂
• 分子量: 271.915
• InChiKey: MTXHFUVQMVKXRP-UHFFFAOYSA-N

物化性质

• 沸点：
  341.7±42.0 °C(Predicted)
• 密度：
  1.636±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  4.2
• 重原子数：
  14
• 可旋转键数：
  2
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.0
• 拓扑面积：
  34.1
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为反应物：
  描述：

  2,6-dichloroterephthaloyl dichloride 、 4,5,6,7-四氯邻苯二甲酰亚胺 在 吡啶 作用下， 以 苯 为溶剂， 生成 1,3-bis-(3,4,5,6-tetrachlorophthalimidocarbonyl)-2,6-dichlorobenzene 、 1,4-bis-(3,4,5,6-tetrachlorophthalimidocarbonyl)-2,6-dichlorobenzene
  参考文献：
  名称：

  Bis-(tetrahalophthalimidocarbonyl)-benzene

  摘要：

  这项发明揭示了化学化合物的结构式如下：其中X为氯或溴，Y.sup.1、Y.sup.2、Y.sup.3和Y.sup.4中的每一个为氢、氯或溴。进一步揭示了在可燃聚合物中，含有上述描述的化合物的阻燃量。

  公开号：

  US04001179A1

文献信息

• PROCESS FOR PRODUCING PHTHALIC ACID COMPOUND INCLUDING CHLORINATED AROMATIC RING
  申请人：Souda Hiroshi

  公开号：US20120035395A1

  公开（公告）日：2012-02-09

  Provided is a process for producing a phthalic acid compound whose aromatic ring has been chlorinated, the process reacting a phthalic acid compound and chlorine in a mixture of chlorosulfonic acid and thionyl chloride in the presence of an iodine compound.

  提供了一种生产邻苯二甲酸化合物的过程，其芳香环已被氯化。该过程在氯磺酸和亚砜氯化物的混合物中，通过在碘化合物存在下，使邻苯二甲酸化合物与氯反应。
• Magnetic recording medium
  申请人：TORAY INDUSTRIES, INC.

  公开号：EP0090499A2

  公开（公告）日：1983-10-05

  A magnetic recording medium comprises a film of an aromatic polyamide having at least 50 mole % of recurring units represented by the following general formula: wherein m and n are integers of from 0 to 4, with the proviso that the case where both of m and n are 0 is excluded, and at least one high performance magnetic layer of a metal or metal compound vacuum-deposited on the aromatic polyamide film. This magnetic recording medium shows a reduced dimensional change and is substantially free of curling or breakage due to elongation, and is excellent in flatness and adhesive strength between the base film and the magnetic layer. Accordingly, this magnetic recording medium is suitable for high-density magnetic recording.

  一种磁记录介质包括一层芳香族聚酰胺薄膜，其中至少 50 摩尔%的递归单元由以下通式表示：其中 m 和 n 为 0 至 4 的整数，但不包括 m 和 n 均为 0 的情况，以及至少一层真空沉积在芳香族聚酰胺薄膜上的金属或金属化合物高性能磁层。 这种磁记录介质的尺寸变化较小，基本上不会因伸长而卷曲或断裂，而且基膜和磁层之间的平整度和粘合强度极佳。 因此，这种磁记录介质适用于高密度磁记录。
• FLAME-RETARDANT RESIN COMPOSITION, FLAME-RETARDANT FIBER, FLAME-RETARDANT CLOTH, AND HEAT-RESISTANT PROTECTIVE CLOTHING
  申请人：Teijin Techno Products Limited

  公开号：EP2256168A1

  公开（公告）日：2010-12-01

  [Problems] To provide a resin composition having excellent flame retardancy and a fiber having excellent flame retardancy, without deteriorating conventional mechanical properties by adding a small amount of a flame-retardant additive. [Means for Resolution] A flame-retardant resin composition comprising a resin and composite particles in an amount of 1% by weight or more based on the resin, which are mainly composed of titanium dioxide and silicon dioxide and have a titanium dioxide content of 10 to 30% by weight and a silicon dioxide content of 70 to 90% by weight, a flame-retardant fiber obtained by fiberizing this flameretardant resin composition, a heat-resistant cloth using this flame-retardant fiber, and further, protective clothing using this cloth.

  [问题]通过添加少量阻燃添加剂，提供一种具有优异阻燃性能的树脂组合物和一种具有优异阻燃性能的纤维，同时不降低常规机械性能。 [解决方法] 一种阻燃性树脂组合物，包括树脂和复合颗粒（以树脂为基准，用量在 1%（重量）以上），复合颗粒主要由二氧化钛和二氧化硅组成，二氧化钛的含量为 10%至 30%（重量），二氧化硅的含量为 70%至 90%（重量）；一种阻燃性纤维，通过将这种阻燃性树脂组合物纤维化而获得；一种耐热布，使用这种阻燃性纤维；以及一种防护服，使用这种布。
• POLISHING COMPOSITION, AND POLISHING METHOD USING SAME
  申请人：Fujimi Incorporated

  公开号：EP3124569A1

  公开（公告）日：2017-02-01

  The present invention provides a polishing composition with which differences in height of a SiN film can be sufficiently removed. The present invention is a polishing composition for use in polishing a polishing object having a surface which is positively charged at a pH of less than 6, containing water, abrasive grains, and an anionic copolymer having a specific unit structure, and having a pH of less than 6, wherein the anionic copolymer has at least two acidic groups having different acidities.

  本发明提供了一种抛光组合物，使用该组合物可以充分消除 SiN 膜的高度差异。 本发明是一种抛光组合物，用于抛光表面在 pH 值小于 6 时带正电荷的抛光对象，其中含有水、磨粒和具有特定单元结构且 pH 值小于 6 的阴离子共聚物，其中阴离子共聚物具有至少两个酸度不同的酸性基团。
• Polishing composition and polishing method using the same
  申请人：FUJIMI INCORPORATED

  公开号：US10406652B2

  公开（公告）日：2019-09-10

  The present invention provides a polishing composition with which differences in height of a SiN film can be sufficiently removed. The present invention is a polishing composition for use in polishing a polishing object having a surface which is positively charged at a pH of less than 6, containing water, abrasive grains, and an anionic copolymer having a specific unit structure, and having a pH of less than 6, wherein the anionic copolymer has at least two acidic groups having different acidities.

  本发明提供了一种抛光组合物，使用该组合物可以充分消除 SiN 膜的高度差异。 本发明是一种抛光组合物，用于抛光表面在 pH 值小于 6 时带正电荷的抛光对象，其中含有水、磨粒和具有特定单元结构且 pH 值小于 6 的阴离子共聚物，其中阴离子共聚物具有至少两个酸度不同的酸性基团。