1-tetradecyl-pyridinium; iodide | 27593-10-8

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 吡啶及其衍生物
• 英文名称: 1-tetradecyl-pyridinium; iodide
• 英文别名: 1-Tetradecyl-pyridinium; Jodid；Tetradecylpyridiniumjodid；1-tetradecylpyridin-1-ium;iodide
• CAS: 27593-10-8
• 化学式: C₁₉H₃₄N*I
• 分子量: 403.39
• InChiKey: KAQUTFQXTBDRNV-UHFFFAOYSA-M

计算性质

• 辛醇/水分配系数(LogP)：
  2.68
• 重原子数：
  21
• 可旋转键数：
  13
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.74
• 拓扑面积：
  3.9
• 氢给体数：
  0
• 氢受体数：
  1

反应信息

• 作为产物：
  描述：

  吡啶 、 十四烷基碘化物 生成 1-tetradecyl-pyridinium; iodide
  参考文献：
  名称：

  121.长链烷基吡啶及其衍生物。液晶的新例子

  摘要：

  DOI：

  10.1039/jr9380000682

文献信息

• Method for the formation of silica film, silica film, insulating film, and semiconductor device
  申请人：JSR Corporation

  公开号：EP1267395A2

  公开（公告）日：2002-12-18

  A method for the formation of a silica film which comprises treating a film in a supercritical medium, the film comprising (A) a siloxane compound and (B) at least one member selected from the group consisting of (B-1) a compound compatible with or dispersible in ingredient (A) and having a boiling or decomposition temperature of from 150 to 500°C and (B-2) a surfactant. The silica film has excellent mechanical strength showing a dielectric constant of generally 2.2 or lower, and hence is useful as a dielectric film in semiconductor devices and the like.

  一种形成二氧化硅薄膜的方法，包括在超临界介质中处理薄膜，该薄膜包括(A)硅氧烷化合物和(B)至少一种选自以下组别的成员：(B-1)与成分(A)相容或可分散在成分(A)中且沸腾或分解温度为 150 至 500°C 的化合物和(B-2)表面活性剂。二氧化硅薄膜具有优异的机械强度，介电常数一般为 2.2 或更低，因此可用作半导体设备等的介电薄膜。
• MICROSTRUCTURE MANUFACTURING METHOD USING TREATMENT LIQUID FOR INHIBITING PATTERN COLLAPSE IN MICROSTRUCTURES
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：EP2615632B1

  公开（公告）日：2019-05-08
• PROCESSING LIQUID FOR SUPPRESSING PATTERN COLLAPSE OF FINE METAL STRUCTURE AND METHOD FOR PRODUCING FINE METAL STRUCTURE USING SAME
  申请人：Ohto Masaru

  公开号：US20120181249A1

  公开（公告）日：2012-07-19

  There are provided a processing liquid for suppressing pattern collapse of a fine metal structure, containing at least one member selected from an imidazolium halide having an alkyl group containing 12, 14 or 16 carbon atoms, a pyridinium halide having an alkyl group containing 14 or 16 carbon atoms, an ammonium halide having an alkyl group containing 14, 16 or 18 carbon atoms, a betaine compound having an alkyl group containing 12, 14 or 16 carbon atoms, and an amine oxide compound having an alkyl group containing 14, 16 or 18 carbon atoms, and a method for producing a fine metal structure using the same.
• TREATMENT LIQUID FOR INHIBITING PATTERN COLLAPSE IN MICROSTRUCTURES, AND MICROSTRUCTURE MANUFACTURING METHOD USING SAID TREATMENT LIQUID
  申请人：Matsunaga Hiroshi

  公开号：US20130165365A1

  公开（公告）日：2013-06-27

  There are provided a processing liquid for suppressing pattern collapse of a microstructure which includes at least one compound selected from the group consisting of an imidazolium halide containing an alkyl group having 12, 14 or 16 carbon atoms, a pyridinium halide containing an alkyl group having 14 or 16 carbon atoms and an ammonium halide containing an alkyl group having 16 or 18 carbon atoms, and water; and a method for producing a microstructure formed of silicon oxide using the processing liquid.
• US4156887A
  申请人：——

  公开号：US4156887A

  公开（公告）日：1979-05-29