申请人:SUMITOMO CHEMICAL COMPANY, LIMITED
公开号:US20220011667A1
公开(公告)日:2022-01-13
Disclosed are a salt represented by formula (I), an acid generator and a resist composition:
wherein R
1
, R
2
and R
3
each represent I or F, R
4
, R
5
, R
6
, R
7
, R
8
and R
9
each represent a halogen atom, a hydroxy group, a haloalkyl group or a hydrocarbon group, X
1
, X
2
and X
3
each represent O or S, m1 and m7 represent an integer of 0 to 5, m2, m3, m4, m5, m6, m8 and m9 represent an integer of 0 to 4, in which 0≤m1+m7≤5, 0≤m2+m8≤4, 0≤m3+m9≤4, at least one of m1, m2, m3 represents an integer of 1 or more, X
4
represents a single bond, —CH
2
—, —O—, —S—, —CO—, —SO— or —SO
2
—, and AI
−
represents an organic anion.
公开了一种由式(I)表示的盐、酸发生剂和抗蚀组合物:
其中,R1、R2和R3各代表I或F,R4、R5、R6、R7、R8和R9各代表卤素原子、羟基、卤代烷基或碳氢基,X1、X2和X3各代表O或S,m1和m7代表0至5的整数,m2、m3、m4、m5、m6、m8和m9代表0至4的整数,其中0≤m1+m7≤5,0≤m2+m8≤4,0≤m3+m9≤4,m1、m2、m3中至少有一个代表1或更多的整数,X4代表单键、—CH2—、—O—、—S—、—CO—、—SO—或—SO2—,AI-代表有机阴离子。