4,4'-di[(1-ethoxy)ethoxy]biphenyl | 119291-28-0

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: 4,4'-di[(1-ethoxy)ethoxy]biphenyl
• 英文别名: 1-(2-Ethoxyethoxy)-4-[4-(2-ethoxyethoxy)phenyl]benzene
• CAS: 119291-28-0
• 化学式: C₂₀H₂₆O₄
• 分子量: 330.424
• InChiKey: GNNTWCKKEAMLPA-UHFFFAOYSA-N

物化性质

• 沸点：
  464.3±45.0 °C(Predicted)
• 密度：
  1.050±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  3.9
• 重原子数：
  24
• 可旋转键数：
  11
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.4
• 拓扑面积：
  36.9
• 氢给体数：
  0
• 氢受体数：
  4

反应信息

• 作为产物：
  描述：

  4,4'-二羟基联苯 生成 4,4'-di[(1-ethoxy)ethoxy]biphenyl
  参考文献：
  名称：

  Optically active compound and photosensitive resin composition

  摘要：

  一种光活性化合物与光敏剂结合使用，由以下公式（1）表示： A −[( J ) m −( X-Pro )] n (1) 其中，A代表至少包括一种从烃基和杂环基中选择的疏水基的疏水单元，J代表连接基团，X-Pro代表由光照可去除的保护基团Pro保护的亲水基团，m代表0或1，n代表不少于1的整数。 保护基团Pro可以与光敏剂（特别是光酸发生剂）一起通过光照可去除，也可以是疏水保护基团。亲水基团可以是羟基或羧基。光活性化合物对短波长光源具有很高的敏感性，用于光刻应用，因此，该光活性化合物有利于形成具有高分辨率的图案。

  公开号：

  US20030211421A1

文献信息

• OPTICALLY ACTIVE COMPOUND AND PHOTOSENSITIVE RESIN COMPOSITION
  申请人：Kansai Research Institute, Inc.

  公开号：EP1375463A1

  公开（公告）日：2004-01-02

  A photoactive compound is used in combination with a photosensitizer, represented by the following formula (1):         A-[(J)m-(X-Pro)]n     (1)    wherein A represents a hydrophobic unit comprising at least one kind of hydrophobic groups selected from a hydrocarbon group and a heterocyclic group, J represents a connecting group, X-Pro represents a hydrophilic group protected by a protective group Pro which is removable by light exposure, m represents 0 or 1, and n represents an integer of not less than 1. The protective group Pro may be removable by light exposure in association with the photosensitizer (especially, a photo acid generator), or may be a hydrophobic protective group. The hydrophilic group may be a hydroxyl group or a carboxyl group. The photoactive compound has high sensitivity to a light source of short wavelength beams, for resist application, therefore, the photoactive compound is advantageously used for forming a pattern with high resolution.

  光活性化合物与光敏剂结合使用，光敏剂由下式（1）表示： A-[(J)m-(X-Pro)]n (1) 其中 A 代表疏水单元，包括至少一种选自烃基和杂环基的疏水基团；J 代表连接基团；X-Pro 代表亲水基团，该亲水基团受保护基团 Pro 的保护，该保护基团可通过光照去除；m 代表 0 或 1；n 代表不小于 1 的整数。 保护基 Pro 可以通过与光敏剂（特别是光酸发生器）一起进行光照射而去除，也可以是疏水保护基。亲水基团可以是羟基或羧基。光活性化合物对短波长光束的光源具有很高的灵敏度，因此在抗蚀剂应用中，光活性化合物可用于形成具有高分辨率的图案。
• MOSLEY, ALAN
  作者：MOSLEY, ALAN

  DOI：——

  日期：——
• CATIONIC RADIATION CURABLE COMPOSITIONS
  申请人：Loccufier Johan

  公开号：US20110195194A1

  公开（公告）日：2011-08-11

  A UV radiation curable composition includes a cationic photoinitiator according to Formula (I) or (II): wherein R1, R2 and R3 independently represent a group selected from the group consisting of an aryl group and a heteroaryl group, with the proviso that R1, R2 and R3 are each substituted by at least one substituent including at least one cationically polymerizable group selected from the group consisting of an alkenyl ether, an epoxide and an oxetane; and P and Q independently represent the necessary atoms to form a substituted or unsubstituted 5 or 6-membered aromatic or heteroaromatic ring, with the proviso that at least one of P, Q and L is substituted by at least one substituent including at least one cationically polymerizable group, selected from the group consisting of an alkenyl ether, an epoxide and an oxetane; and L represents a group selected from the group consisting of a direct bond, O, S, SO, SO2, CR5R6, C(═O), S(═O), C(NR8) and NR7.
• US7534547B2
  申请人：——

  公开号：US7534547B2

  公开（公告）日：2009-05-19
• Optically active compound and photosensitive resin composition
  申请人：——

  公开号：US20030211421A1

  公开（公告）日：2003-11-13

  A photoactive compound is used in combination with a photosensitizer, represented by the following formula (1): A −[( J ) m −( X-Pro )] n (1) wherein A represents a hydrophobic unit comprising at least one kind of hydrophobic groups selected from a hydrocarbon group and a heterocyclic group, J represents a connecting group, X-Pro represents a hydrophilic group protected by a protective group Pro which is removable by light exposure, m represents 0 or 1, and n represents an integer of not less than 1. The protective group Pro may be removable by light exposure in association with the photosensitizer (especially, a photo acid generator), or may be a hydrophobic protective group. The hydrophilic group may be a hydroxyl group or a carboxyl group. The photoactive compound has high sensitivity to a light source of short wavelength beams, for resist application, therefore, the photoactive compound is advantageously used for forming a pattern with high resolution.

  一种光活性化合物与光敏剂结合使用，由以下公式（1）表示： A −[( J ) m −( X-Pro )] n (1) 其中，A代表至少包括一种从烃基和杂环基中选择的疏水基的疏水单元，J代表连接基团，X-Pro代表由光照可去除的保护基团Pro保护的亲水基团，m代表0或1，n代表不少于1的整数。 保护基团Pro可以与光敏剂（特别是光酸发生剂）一起通过光照可去除，也可以是疏水保护基团。亲水基团可以是羟基或羧基。光活性化合物对短波长光源具有很高的敏感性，用于光刻应用，因此，该光活性化合物有利于形成具有高分辨率的图案。